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1دورية أكاديمية
المؤلفون: Kuan Ning Huang, Yueh Chin Lin, Jin Hwa Lee, Chia Chieh Hsu, Jing Neng Yao, Chieh Ying Wu, Chao Hsin Chien, Edward Yi Chang
المصدر: Micro and Nano Engineering, Vol 9, Iss , Pp 100073- (2020)
مصطلحات موضوعية: Tri-gate structure, AlGaN/GaN HEMT, High-k dielectric oxide, HfO2, Tri-gate MOS-HEMT, Subthreshold swing, Electronics, TK7800-8360, Technology (General), T1-995
وصف الملف: electronic resource
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2
المؤلفون: Kazuo Tsutsui, Chao-Hsin Chien, Hiroshi Iwai, Chia Chieh Hsu, Heng-Tung Hsu, Kuniyuki Kakushima, Venkatesan Nagarajan, Chia Hsun Wu, Yueh Chin Lin, Jin Hwa Lee, Kuan Ning Huang, Edward Yi Chang, Jing Neng Yao, Jia Ching Lin
المصدر: Journal of Electronic Materials. 49:1348-1353
مصطلحات موضوعية: 010302 applied physics, Materials science, Annealing (metallurgy), business.industry, Transconductance, Transistor, 02 engineering and technology, High-electron-mobility transistor, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Electronic, Optical and Magnetic Materials, law.invention, Threshold voltage, Amorphous solid, Capacitor, law, 0103 physical sciences, Materials Chemistry, Breakdown voltage, Optoelectronics, Electrical and Electronic Engineering, 0210 nano-technology, business
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3
المؤلفون: Chia Chieh Hsu, Edward Yi Chang, Jing Neng Yao, Yueh Chin Lin, Kuan Ning Huang, Chao-Hsin Chien, Chieh Ying Wu, Jin Hwa Lee
المصدر: Micro and Nano Engineering, Vol 9, Iss, Pp 100073-(2020)
مصطلحات موضوعية: Materials science, Oxide, lcsh:TK7800-8360, Dielectric, High-electron-mobility transistor, chemistry.chemical_compound, lcsh:Technology (General), Breakdown voltage, Tri-gate MOS-HEMT, Electrical and Electronic Engineering, Polarization (electrochemistry), HfO2, High-κ dielectric, Tri-gate structure, business.industry, lcsh:Electronics, Power application, AlGaN/GaN HEMT, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry, Subthreshold swing, lcsh:T1-995, Optoelectronics, High-k dielectric oxide, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::948e1064284aeac75119aae1ae1d915c
https://doi.org/10.1016/j.mne.2020.100073 -
4
المؤلفون: Chia Chieh Hsu, Chao-Hsin Chien, Edward Yi Chang, Jing Neng Yao, Jin Hwa Lee, Yueh Chin Lin, Kuan Ning Huang, Chieh Ying Wu
المصدر: Microelectronic Engineering. :111366
مصطلحات موضوعية: Materials science, Withdrawn Study, business.industry, Optoelectronics, Power application, Algan gan, Electrical and Electronic Engineering, Condensed Matter Physics, business, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials
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5
المؤلفون: Yu Lin Chuang, Chia Hua Chang, Yueh Chin Lin, Kuan Ning Huang, Chien Hua Wu, Tza Yao Kuo, Edward Yi Chang
المصدر: Applied Physics Express. 5:066503
مصطلحات موضوعية: Auger electron spectroscopy, Materials science, Fabrication, Diffusion barrier, business.industry, Annealing (metallurgy), Transistor, General Engineering, General Physics and Astronomy, High-electron-mobility transistor, law.invention, Metal, Si substrate, law, visual_art, visual_art.visual_art_medium, Optoelectronics, business