المؤلفون: Dong-Kyu Lee, Lee, W.H., Young-Ho Na, Keon-Soo Kim, Kun-Ok Ahn, Kang-Deog Suh, Yonghan Roh

المصدر: 2002 IEEE International Reliability Physics Symposium. Proceedings. 40th Annual (Cat. No.02CH37320) Reliability physics symposium Reliability Physics Symposium Proceedings, 2002. 40th Annual. :354-358 2002

Relation: 2002 IEEE International Reliability Physics Symposium Proceedings. 40th Annual

المؤلفون: Lee, W.H., Dong-Kyu Lee, Young-Min Park, Keon-Soo Kim, Kun-Ok Ahn, Kang-Deog Suh

المصدر: 2001 IEEE International Reliability Physics Symposium Proceedings. 39th Annual (Cat. No.00CH37167) Reliability physics symposium Reliability Physics Symposium, 2001. Proceedings. 39th Annual. 2001 IEEE International. :57-60 2001

Relation: 2001 IEEE International Reliability Physics Symposium Proceedings. 39th Annual

المؤلفون: Lee, W.H., Dong-Kyu Lee, Keon-Soo Kim, Kun-Ok Ahn, Kang-Deog Suh

المصدر: IEEE Transactions on Device and Materials Reliability IEEE Trans. Device Mater. Relib. Device and Materials Reliability, IEEE Transactions on. 1(2):128-132 Jun, 2001

المؤلفون: Hae Soo Kim, Kang Jae Lee, Kwang Hee Han, Seok Won Cho, Se Kyoung Choi, Shin Won Seo, Jae Hyun Chung, Keun Woo Lee, Sung Jae Chung, Keum Hwan Noh, Tae Un Youn, Ju Yeab Lee, Min Kyu Lee, Byeong Il Han, Su Min Yi, Ho Seok Lee, Sung Soon Kim, Wan Sup Shin, Kwang Hyun Yun, Min Sung Ko, Jin Kwan Choi, Sang Wan Lee, Sang Deok Kim, Myung Kyu Ahn, Ki Seog Kim, Young Ho Jeon, Sung Kye Park, Aritome, Seiichi, Jin Woong Kim, Sang Sun Lee, Seok Kiu Lee, Kun Ok Ahn, Sung Joo Hong, Gi Hyun Bae, Sung Wook Park

المصدر: Proceedings of Technical Program of 2012 VLSI Technology, System and Application VLSI Technology, Systems, and Applications (VLSI-TSA), 2012 International Symposium on. :1-2 Apr, 2012

Relation: 2012 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)

المؤلفون: Lee, W.H., Dong-Kyu Lee, Young-Ho Na, Keon-Soo Kim, Kun-Ok Ahn, Kang-Deog Suh, Yonghan Roh

المصدر: IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 23(8):476-478 Aug, 2002

المؤلفون: Kangwoo Park, Kwanho Kim, Cheoljoong Park, Kayoung Cho, Kun-Ok Ahn, Chankeun Kwon, Jong Woo Kim, Hyun Chul Lee, Hyunseok Song, Heonki Kirr, Sunghwa Ok, Yongsoon Park, Juhyeong Lee, Sooyeol Chai, Hyeonsu Nam, Heejoo Lee, Tae-Sung Jung, Sang Kyu Lee, Jayoon Goo, Hwang Huh, Woopyo Jeong, Kangwook Jo, Geonu Kim, Yujin Yang, Jangwon Park, Chanhui Jeong, Yujong Noh, Hanna Cho, Wanik Cho, Jinhaeng Lee

المصدر: ISSCC

مصطلحات موضوعية: 010302 applied physics, Hardware_MEMORYSTRUCTURES, business.industry, Computer science, Nand flash memory, 020208 electrical & electronic engineering, Solid-state, Window (computing), 02 engineering and technology, 01 natural sciences, Non-volatile memory, Memory cell, 0103 physical sciences, 0202 electrical engineering, electronic engineering, information engineering, business, Throughput (business), Computer hardware

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f6a679fe1900f224843b7509806b7dc0
https://doi.org/10.1109/isscc19947.2020.9063117

المؤلفون: Yunbong Lee, Kun-Ok Ahn, Sung Ho Kim, Myeongwon Lee, Jaekwan Lee, Jinwoong Kim, Myoungkwan Cho, Gil-Bok Choi

المصدر: IRPS

مصطلحات موضوعية: Hardware_MEMORYSTRUCTURES, Materials science, Nand flash memory, business.industry, Noise reduction, Electrical engineering, NAND gate, Hardware_PERFORMANCEANDRELIABILITY, Temperature measurement, Threshold voltage, Non-volatile memory, Charge trap flash, Hardware_INTEGRATEDCIRCUITS, Process optimization, Hardware_ARITHMETICANDLOGICSTRUCTURES, business, Hardware_LOGICDESIGN

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8749693dd64682c138d999209c94b4cd
https://doi.org/10.1109/irps.2015.7112811

المؤلفون: Kun-Ok Ahn, Kang-Deog Suh, Dongkyu Lee, Woung-Moo Lee, Keon-Soo Kim

المصدر: IEEE Transactions on Device and Materials Reliability. 1:128-132

مصطلحات موضوعية: business.industry, Chemistry, Oxide, Dielectric, Nitride, Flash memory, Electronic, Optical and Magnetic Materials, Overlayer, chemistry.chemical_compound, Gate oxide, Electronic engineering, Optoelectronics, Electrical and Electronic Engineering, Data retention, Safety, Risk, Reliability and Quality, business, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f31b9fc59030e5f87d7a6f4305f6efbf
https://doi.org/10.1109/7298.956707

المؤلفون: Byung-Kook Kim, Jinwoong Kim, Hye-Eun Heo, Kun-Ok Ahn, Heehyun Chang, Sung-Kye Park, Jong-Wook Kim, Kyoung-Rok Han, Cheol Hoon Yang, Seok-Hee Lee, Byung-Seok Lee, Sanghyun Jang, Eun-Seok Choi, Heeyoul Lee, Ji-Hyun Seo, Seokkiu Lee, Byoung-Ki Lee, Honam Yoo, Joowon Hwang, Tae-Un Youn, Keum-Hwan Noh

المصدر: 2013 IEEE International Electron Devices Meeting.

مصطلحات موضوعية: Process variation, Hardware_MEMORYSTRUCTURES, Logic synthesis, Materials science, P/poly, Charge trap flash, Doping, Process integration, Electronic engineering, NAND gate, Design for manufacturability

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e79291d447c2c98aeaaca574b780b1eb
https://doi.org/10.1109/iedm.2013.6724554

المؤلفون: Myoungkwan Cho, Joong-Jung Kim, I. Kim, D.H. Yoon, YeonJoo Jeong, Hyunyoung Shim, Kun-Ok Ahn

المصدر: Extended Abstracts of the 2013 International Conference on Solid State Devices and Materials.

مصطلحات موضوعية: Materials science, Disturbance (geology), Nand flash memory, Electronic engineering, Mechanism (sociology)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::89dc3d8a3501016fc04043aa95b1f3d9
https://doi.org/10.7567/ssdm.2013.a-1-1