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المؤلفون: L. Depre, R. La Greca, C. Gardin, J. N. Pena, E. Sungauer
المصدر: Optical Microlithography XXXIII.
مصطلحات موضوعية: Mura, Optical proximity correction, Pixel, Computer science, Metric (mathematics), Hardware_INTEGRATEDCIRCUITS, Process (computing), Node (circuits), Pattern matching, Static random-access memory, Algorithm
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f9f1ab2f4abdad9de62ce9908f369b4c
https://doi.org/10.1117/12.2551896 -
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المؤلفون: L. Depre, J.-G. Simiz, N. Sen, B. Le-Gratiet, P. Fanton, T. Hasan, Amine Lakcher, H. Tien, C. Prentice, Stefan Hunsche, R. La Greca
المصدر: 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
مصطلحات موضوعية: Computer science, 02 engineering and technology, Limiting, 021001 nanoscience & nanotechnology, Chip, computer.software_genre, 01 natural sciences, 010309 optics, Process variation, Micro topography, 0103 physical sciences, Hotspot (geology), Hardware_INTEGRATEDCIRCUITS, Process window, Data mining, 0210 nano-technology, Focus variation, computer
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::db0f07f759096b4f9f1e83415cef3ac4
https://doi.org/10.1109/asmc.2017.7969269 -
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المؤلفون: T. Hasan, B. Le-Gratiet, L. Depre, J.-G. Simiz, R. La Greca, Amine Lakcher, Stefan Hunsche, C. Prentice, P. Fanton
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Computational lithography, Computer science, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, computer.software_genre, 01 natural sciences, Metrology, 010309 optics, Process variation, Metal, visual_art, 0103 physical sciences, Hotspot (geology), Reticle, visual_art.visual_art_medium, Process window, Wafer, Data mining, 0210 nano-technology, computer
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::41e34107949267919c33e4142bbdb7c9
https://doi.org/10.1117/12.2260024 -
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المؤلفون: L. Depre, O. Ndiaye, Frederic Robert, P. Fanton, J. C. Le Denmat, Alice Pelletier, N. Martin, Jonathan Planchot, C. Gardin, C. Gardiola, F. Foussadier, A. Szucs
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Computer science, Computational lithography, 3d model, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, 010309 optics, Metal, Resist, visual_art, 0103 physical sciences, visual_art.visual_art_medium, Electronic engineering, Process window, 0210 nano-technology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::64a18da2edc66534249d401a7aea1e0d
https://doi.org/10.1117/12.2218916 -
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المؤلفون: R. La Greca, L. Depre, P. Fanton, Vivek Kumar Jain, C. Prentice, Stefan Hunsche, Jean Gabriel Simiz, B. Le-Gratiet
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Focus (computing), Scanner, Computer science, Process (computing), Hot spot (veterinary medicine), Hardware_PERFORMANCEANDRELIABILITY, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, 010309 optics, 0103 physical sciences, Electronic engineering, Wafer, Node (circuits), Process window, 0210 nano-technology, Lithography, Simulation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0fd9bb9245727b4b75e92db04f852807
https://doi.org/10.1117/12.2220295 -
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المؤلفون: Jo Finders, Vincent Farys, Dorothe Oorschot, L. Depre, Eleni Psara, Natalia Davydova, Guido Schiffelers, Eelco van Setten
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Scanner, Optics, business.industry, Extreme ultraviolet lithography, Real-time computing, Process window, Performance enhancement, business, Third generation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::635ab6605bced2850a6f3119cb7993de
https://doi.org/10.1117/12.2065945 -
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المؤلفون: P. Van Houtte, T. B. Wu, Youming Liu, L. De Buyser, L. Depre
المصدر: Textures and Microstructures. 35:283-290
مصطلحات موضوعية: Diffraction, Materials science, Tilt (optics), Optics, business.industry, X-ray crystallography, Extrapolation, Bragg's law, Texture (crystalline), Thin film, business, Intensity (heat transfer)
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المؤلفون: A. Szucs, Vincent Farys, L. Depre, Sanjay Kapasi, Emek Yesilada, Cécile Gourgon, Orion Mouraille, Frank A. J. M. Driessen, M. Besacier, Jonathan Planchot
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Process variation, Resist, Computer science, business.industry, Electronic engineering, Process control, Process optimization, Node (circuits), Nanotechnology, Process window, Routing (electronic design automation), 3D modeling, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::17d5b4ae7457893f96ad1c94fcd40068
https://doi.org/10.1117/12.2047281 -
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المؤلفون: Lei Wang, L. Depre, Mu Feng, Jean-Christophe Michel, Frederic Robert, Elodie Sungauer, Sanjay Kapasi, Song Lan, Jean-Christophe Le-Denmat, Emek Yesilada
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Computer science, business.industry, engineering.material, Chip, Optics, Optical proximity correction, Coating, engineering, Calibration, Wafer, Node (circuits), Layer (object-oriented design), business, Lithography, Simulation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d434bfd7df3d58a11dd5244740ec2235
https://doi.org/10.1117/12.2047115 -
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المؤلفون: L. Depre, P. Rusu, Russell Dover, Cécile Gourgon, Jonathan Planchot, C. Alleaume, M. Besacier, Angelique Nachtwein, Vincent Farys, Emek Yesilada, A. Szucs
المساهمون: STMicroelectronics [Crolles] (ST-CROLLES), ASML Brion (CA), Laboratoire des technologies de la microélectronique (LTM), Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS), ASML Netherlands B.V., Will Conley, Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS)
المصدر: Proceedings of SPIE 2013: SPIE Advanced Lithography
Advanced Lithography, SPIE 2013
Advanced Lithography, SPIE 2013, Feb 2013, San Jose, United States. ⟨10.1117/12.2011114⟩
Advanced Lithography, SPIE 2013, Aug 2013, San Diego, United Statesمصطلحات موضوعية: Physics, Wavefront, Scanner, Depth of focus, Computational lithography, business.industry, Best Focus Shift, Depth of Focus, Tachyon SMO-FW, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, 010309 optics, [SPI]Engineering Sciences [physics], Optics, 0103 physical sciences, Reticle, Scanning Electron Microscopy, 0210 nano-technology, Focus (optics), business, FlexWave™, Lithography, Immersion lithography, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::76ef6ac3b50a410d4fb41e3b8676cb24
https://hal.science/hal-00941631
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