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المؤلفون: R.S. Postma, P.S.F. Mendes, L. Pirro, A. Banerjee, J.W. Thybaut, L. Lefferts
المساهمون: MESA+ Institute, Catalytic Processes and Materials
المصدر: Chemical Engineering Journal, 454(Part 3):140273. Elsevier
CHEMICAL ENGINEERING JOURNALمصطلحات موضوعية: Technology and Engineering, PYROLYSIS, General Chemical Engineering, UT-Hybrid-D, General Chemistry, Non-oxidative methane conversion, PRESSURE, ETHYLENE, Industrial and Manufacturing Engineering, THERMAL-DECOMPOSITION, AROMATICS, Fe©SiO2, ACTIVATION, CONVERSION, Microkinetic modelling, FLOW REACTOR, AUTOCATALYSIS, Environmental Chemistry, Ethane pyrolysis, TEMPERATURE
وصف الملف: application/pdf
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المؤلفون: Y. Raffel, M. Drescher, R. Olivo, M. Lederer, R. Hoffmann, L. Pirro, T. Chohan, T. Kampfe, K. Seidel, S. De, J. Heitmann
المصدر: 2022 IEEE International Integrated Reliability Workshop (IIRW).
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9fe7dae67a38e0a3d20f605f1c163eec
https://doi.org/10.1109/iirw56459.2022.10032750 -
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المؤلفون: Y. Raffel, R. Olivo, M. Lederer, F. Muller, R. Hoffmann, T. Ali, K. Mertens, L. Pirro, M. Drescher, S. Beyer, T. Kampfe, K. Seidel, L. M. Eng, J. Heitmann
المصدر: 2022 IEEE International Memory Workshop (IMW).
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b7287b9b6abc7697592b56f1b448195e
https://doi.org/10.1109/imw52921.2022.9779277 -
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المساهمون: MESA+ Institute, Integrated Devices and Systems
المصدر: IEEE Transactions on Electron Devices, 68(2):9305941, 497-502. IEEE
مصطلحات موضوعية: Silicon, Current (mathematics), FinFETs, interface states, Silicon on insulator, chemistry.chemical_element, Capacitance, silicon devices, Activation energy, Characterization (mathematics), Transistors, MOS transistors, Hardware_INTEGRATEDCIRCUITS, Electrical and Electronic Engineering, Ideality, Silicon-on-insulator, Traps, Physics, Subthreshold conduction, Subthreshold, Logic gates, traps, Electronic, Optical and Magnetic Materials, chemistry, Trap density, Atomic physics
وصف الملف: application/pdf
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المؤلفون: L. Pirro, A. Zaka, S. Morvan, O. Zimmerhackl, R. Nelluri, T. Hermann, M. Majer, H. Pagel, N. Wu, M. Otto, J. Hoentschel
المصدر: 2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA).
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::54791756f365b1d40b0cdb1ab3cbccae
https://doi.org/10.1109/vlsi-tsa54299.2022.9771046 -
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المؤلفون: L. Pirro, P. Liebscher, C. Brantz, M. Kessler, H. Herzog, O. Zimmerhackl, R. Jain, E. Ebrand, K. Gebauer, M. Otto, A. Zaka, J. Hoentschel
المصدر: 2022 IEEE International Reliability Physics Symposium (IRPS).
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b728204296c21fac0ffecd6e806444b9
https://doi.org/10.1109/irps48227.2022.9764532 -
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المؤلفون: Tristan Meunier, Mikael Casse, Fred Gaillard, Silvano De Franceschi, Maud Vinet, Thorsten Kammler, Christoforos G. Theodorou, L. Pirro, Gerard Ghibaudo, Bruna Cardoso Paz
المساهمون: Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC), Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA), Institut de Recherche Interdisciplinaire de Grenoble (IRIG), Direction de Recherche Fondamentale (CEA) (DRF (CEA)), Circuits électroniques quantiques Alpes (QuantECA), Institut Néel (NEEL), Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), GLOBALFOUNDRIES, fab 1, Circuits électroniques quantiques Alpes (NEEL - QuantECA)
المصدر: IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices, Institute of Electrical and Electronics Engineers, 2020, 67 (11), pp.4563-4567. ⟨10.1109/TED.2020.3021999⟩
IEEE Transactions on Electron Devices, 2020, 67 (11), pp.4563-4567. ⟨10.1109/TED.2020.3021999⟩مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Infrasound, Transconductance, Silicon on insulator, Cryogenics, FDSOI MOSFET, low frequency noise, 01 natural sciences, [SPI.TRON]Engineering Sciences [physics]/Electronics, Electronic, Optical and Magnetic Materials, Threshold voltage, Cryogenic applications, CMOS, Logic gate, 0103 physical sciences, MOSFET, Optoelectronics, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Electrical and Electronic Engineering, business
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8Interfacial Layer Engineering to Enhance Endurance and Noise Immunity of FeFETs for IMC Applications
المصدر: International Conference on IC Design and Technology (ICICDT)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=r3c4b2081b22::f6ceab3cf91916958347d678a5162181
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المؤلفون: D. Lipp, Y. Raffel, A. Jayakumar, R. Olivo, R. Pfuetzner, R. Illgen, A. Muehlhoff, Jan Hoentschel, L. Pirro, Michael Otto, O. Zimmerhackl, Alban Zaka, Konrad Seidel
المصدر: IRPS
مصطلحات موضوعية: 010302 applied physics, Surface (mathematics), Materials science, Silicon, business.industry, Noise reduction, Transistor, chemistry.chemical_element, 01 natural sciences, Noise (electronics), law.invention, Reliability (semiconductor), chemistry, law, Logic gate, 0103 physical sciences, Optoelectronics, business, Communication channel
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::54120bc6f07b89a11389b90cbb78b2d2
https://doi.org/10.1109/irps46558.2021.9405122 -
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المؤلفون: Johannes Heitmann, L. Pirro, Yannick Raffel, Konrad Seidel, Ricardo Olivo, R. Hoffmann, Steffen Lehmann, Thomas Kampfe
المصدر: 2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS).
مصطلحات موضوعية: Materials science, business.industry, Logic gate, MOSFET, Doping, Optoelectronics, Silicon on insulator, Flicker noise, Field-effect transistor, business, NMOS logic, PMOS logic
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e1b078cd052c461907650f41a7384843
https://doi.org/10.1109/eurosoi-ulis49407.2020.9365296