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1دورية أكاديمية
المؤلفون: Selonen, V.Aff1, IDs10530024033234_cor1, Brommer, J. E., Klangwald, C., Laaksonen, T.
المصدر: Biological Invasions. :1-10
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2دورية أكاديمية
المؤلفون: Auvinen, VV, Lauren, P, Shen, BX, Isokuortti, J, Durandin, N, Lajunen, T, Linko, V, Laaksonen, T
المصدر: CELLULOSE. 29(18):9707-9717
مصطلحات موضوعية: Medicin och hälsovetenskap
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3دورية أكاديمية
المؤلفون: Espín, S., Andersson, T., Haapoja, M., Hyvönen, R., Kluen, E., Kolunen, H., Laaksonen, T., Lakka, J., Leino, L., Merimaa, K., Nurmi, J., Rainio, M., Ruuskanen, S., Rönkä, K., Sánchez-Virosta, P., Suhonen, J., Suorsa, P., Eeva, T.
المصدر: In Environmental Pollution 15 March 2024 345
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4مؤتمر
المؤلفون: Ahsan, I., Greenslit, D., Evans, B., Laaksonen, T., Gordon, T., Song, Z., Liu, Y., Masnik, J., Barth, F., Khan, S., Winkler, J., Sekar, K., Bawaskar, N., Crown, S., Zhang, K., O'tool, M., Lin, T.-Y., Lagus, M., Sohn, D.K.
المصدر: 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) Advanced Semiconductor Manufacturing Conference (ASMC), 2019 30th Annual SEMI. :1-4 May, 2019
Relation: 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
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5دورية أكاديمية
المؤلفون: Selonen, V.Aff1, IDs10530022028502_cor1, Brommer, J. E., Holopainen, S., Kauhala, K., Krüger, H., Poutanen, J., Väänänen, V.-M., Laaksonen, T.
المصدر: Biological Invasions. 24(11):3461-3474
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6مؤتمر
المؤلفون: Rao, S.S.P., Lavangkul, S., Laaksonen, T., Ali, A., Friedmann, J.B., Nam Luu
المصدر: 1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314) Semiconductor manufacturing Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on. :399-402 1999
Relation: 1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings
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7مؤتمر
المؤلفون: Gupta, I.J., Kraft, R., Krishnan, S., Gale, B., Aur, S., Rodder, M., Laaksonen, T.
المصدر: 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) Plasma process-induced damage Plasma Process-Induced Damage, 1998 3rd International Symposium on. :84-87 1998
Relation: 1998 3rd International Symposium on Plasma Process-Induced Damage
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8مؤتمر
المؤلفون: Rodder, M., Hattangady, S., Yu, N., Shiau, W., Nicollian, P., Laaksonen, T., Chao, C.P., Mehrotra, M., Lee, C., Murtaza, S., Aur, S.
المصدر: International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217) Electron devices - IEDM 1998 Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International. :623-626 1998
Relation: International Electron Devices Meeting 1998. Technical Digest
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9مؤتمر
المؤلفون: Rodder, M., Hanratty, M., Rogers, D., Laaksonen, T., Hu, J.C., Murtaza, S., Chao, C.-P., Hattangady, S., Aur, S., Amerasekera, A., Chen, I.-C.
المصدر: International Electron Devices Meeting. IEDM Technical Digest Electron Devices Electron Devices Meeting, 1997. IEDM '97. Technical Digest., International. :223-226 1997
Relation: International Electron Devices Meeting. IEDM Technical Digest
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10دورية أكاديمية
المؤلفون: Saari, H., Lisitsyna, E., Rautaniemi, K., Rojalin, T., Niemi, L., Nivaro, O., Laaksonen, T., Yliperttula, M., Vuorimaa-Laukkanen, E.
المصدر: In Journal of Controlled Release 28 August 2018 284:133-143