المؤلفون: Kim, TaeSeong, Cho, Sohye, Hwang, SeonKwan, Lee, Kyuha, Hong, Yikoan, Lee, Hakseung, Cho, Hyokyung, Moon, Kwangjin, Na, Hoonjoo, Hwang, Kihyun

المصدر: 2021 IEEE 71st Electronic Components and Technology Conference (ECTC) ECTC Electronic Components and Technology Conference (ECTC), 2021 IEEE 71st. :415-419 Jun, 2021

Relation: 2021 IEEE 71st Electronic Components and Technology Conference (ECTC)

المؤلفون: Park, Hyunyoung, Jeong, Julie, Lee, HakSeung, Lee, Sang-Hak, Suk, Seung-Han

المصدر: Acta Neurologica Belgica. June 2017 117(2):455-459

المؤلفون: Lee Hakseung, Yi-koan Hong, Hyokyung Cho, SeonKwan Hwang, Tae-Seong Kim, Hoon-joo Na, Kyu-Ha Lee, Ki-Hyun Hwang, Sohye Cho, Kwang-jin Moon

المصدر: 2021 IEEE 71st Electronic Components and Technology Conference (ECTC).

مصطلحات موضوعية: Interconnection, Materials science, Stack (abstract data type), business.industry, Wafer bonding, Chemical-mechanical planarization, Hardware_INTEGRATEDCIRCUITS, Process control, Optoelectronics, Wafer, Edge (geometry), business, Electrical connection

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::06af239fac598003ea86a1022c8b0e0d
https://doi.org/10.1109/ectc32696.2021.00076

المؤلفون: Haegyu Jang, Heeyeop Chae, Lee Hakseung, Honyoung Lee, Chang-Koo Kim

المصدر: IEEE Transactions on Semiconductor Manufacturing. 30:17-22

مصطلحات موضوعية: 010302 applied physics, 0209 industrial biotechnology, Plasma etching, Semiconductor device fabrication, Chemistry, technology, industry, and agriculture, Analytical chemistry, 02 engineering and technology, Dielectric, Condensed Matter Physics, 01 natural sciences, Industrial and Manufacturing Engineering, Spectral line, Electronic, Optical and Magnetic Materials, Wavelength, 020901 industrial engineering & automation, Etching (microfabrication), 0103 physical sciences, Electrical and Electronic Engineering, Inductively coupled plasma, Sensitivity (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::abcf416098af9976477f01e48df0b9df
https://doi.org/10.1109/tsm.2017.2653062

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المؤلفون: Lee Hakseung, Haegyu Jang, Heeyeop Chae, Honyoung Lee

المصدر: Applied Science and Convergence Technology. 23:328-339

مصطلحات موضوعية: Plasma etching, Multivariate analysis, Chemistry, Materials Science (miscellaneous), Non invasive, Analytical chemistry, General Medicine, Plasma, Condensed Matter Physics, computer.software_genre, Principal component analysis, Optical emission spectroscopy, Sensitivity (control systems), Data mining, Electrical and Electronic Engineering, Physical and Theoretical Chemistry, computer

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cb4ffe74fa66182a0b5b00d059e11ff1
https://doi.org/10.5757/asct.2014.23.6.328

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المؤلفون: Roh H, Lee K, Eo E, Hong YS, Lee H, Jang BW, Rhee BD

المصدر: Korean journal of medical education [Korean J Med Educ] 2015 Dec; Vol. 27 (4), pp. 309-19. Date of Electronic Publication: 2015 Dec 01.

نوع المنشور: Journal Article

بيانات الدورية: Publisher: Korean Society of Medical Education Country of Publication: Korea (South) NLM ID: 101503071 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 2005-7288 (Electronic) Linking ISSN: 2005727X NLM ISO Abbreviation: Korean J Med Educ Subsets: MEDLINE

مواضيع طبية MeSH: Practice Guidelines as Topic* , Students, Medical*, Clinical Competence/*standards , Educational Measurement/*methods, Humans ; Republic of Korea