المؤلفون: Adler, A., Anthony, N., Archimbaud, M., Beeck, S., Bjorge-Engeland, I., Bogacz, E., Boutier, F., Camplone, V., Collier, H., Dandumont, Colin, Dhuicque, O., Drozd, B., Eizinger, M., Fayolle-Chambe, M., Galetsky, V., Linder, B., Lopez-Contreras, E., Milasevicius, M., Mueller, F., Nielsen, T., Noecker, M., Ocaña Losada, S., Pagu, A., Vilaboa Perez, Jesus, Putz, A., Salfenmoser, L., Salvia, G., Savu, A., Schreiter, L., Stefko, M., Weterings, E., Wischert, D., Woodwark, J., Zeif, R.

مصطلحات موضوعية: Physical, chemical, mathematical & earth Sciences :: Earth sciences & physical geography, Physique, chimie, mathématiques & sciences de la terre :: Sciences de la terre & géographie physique, Engineering, computing & technology :: Aerospace & aeronautics engineering, Ingénierie, informatique & technologie :: Ingénierie aérospatiale

جغرافية الموضوع: international

Relation: EGU General Assembly 2020 (du 4 mai 2020 au 8 mai 2020)

URL الوصول: https://orbi.uliege.be/handle/2268/255271

المؤلفون: Bao, R., Southwick, R. G., Zhou, H., Lee, C. H., Linder, B. P., Ando, T., Guo, D., Jagannathan, H., Narayanan, V.

المصدر: 2018 IEEE Symposium on VLSI Technology VLSI Technology, 2018 IEEE Symposium on. :115-116 Jun, 2018

Relation: 2018 IEEE Symposium on VLSI Technology

المؤلفون: En, W.G., Bell, S., Linder, B., Cheung, N.W.

المصدر: 2nd International Symposium on Plasma Process-Induced Damage Plasma Process-Induced Damage, 1997., 2nd International Symposium on. :161-164 1997

Relation: 2nd International Symposium on Plasma Process-Induced Damage

المؤلفون: Iyer, S.S.K., Xiang Lu, Jingbao Liu, Linder, B., Chenming Hu, Cheung, N.W., Jing Min, Zhineng Fan, Chu, P.

المصدر: Proceedings of 11th International Conference on Ion Implantation Technology Ion implantation technology Ion Implantation Technology. Proceedings of the 11th International Conference on. :764-767 1996

Relation: Proceedings of 11th International Conference on Ion Implantation Technology

المؤلفون: Wang, M., Muralidhar, R., Stathis, J. H., Linder, B. P., Jagannathan, H., Faltermeier, J.

المصدر: IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 34(7):837-839 Jul, 2013

المؤلفون: Ando, T., Kannan, B., Kwon, U., Lai, W. L., Linder, B. P., Cartier, E. A., Haight, R., Copel, M., Bruley, J., Krishnan, S. A., Narayanan, V.

المصدر: 2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers VLSI Technology (VLSI-Technology): Digest of Technical Papers, 2014 Symposium on. :1-2 Jun, 2014

Relation: 2014 IEEE Symposium on VLSI Technology

المؤلفون: Cartier, E., Steen, M., Linder, B. P., Ando, T., Iijima, R., Frank, M., Newbury, J.S., Kim, Y. H., McFeely, F. R., Copel, M., Haight, R., Choi, C., Callegari, A., Paruchuri, V. K., Narayanan, V.

المصدر: 2009 Symposium on VLSI Technology VLSI Technology, 2009 Symposium on. :42-43 Jun, 2009

Relation: 2009 Symposium on VLSI Technology

المؤلفون: Choi, K., Jagannathan, H., Choi, C., Edge, L., Ando, T., Frank, M., Jamison, P., Wang, M., Cartier, E., Zafar, S., Bruley, J., Kerber, A., Linder, B., Callegari, A., Yang, Q., Brown, S., Stathis, J., Iacoponi, J., Paruchuri, V., Narayanan, V.

المصدر: 2009 Symposium on VLSI Technology VLSI Technology, 2009 Symposium on. :138-139 Jun, 2009

Relation: 2009 Symposium on VLSI Technology

المؤلفون: Chudzik, M., Doris, B., Mo, R., Sleight, J., Cartier, E., Dewan, C., Park, D., Bu, H., Natzle, W., Yan, W., Ouyang, C., Henson, K., Boyd, D., Callegari, S., Carter, R., Casarotto, D., Gribelyuk, M., Hargrove, M., He, W., Kim, Y., Linder, B., Moumen, N., Paruchuri, V. K., Stathis, J., Steen, M., Vayshenker, A., Wang, X., Zafar, S., Ando, T., Iijima, R., Takayanagi, M., Narayanan, V., Wise, R., Zhang, Y., Divakaruni, R., Khare, M., Chen, T. C.

المصدر: 2007 IEEE Symposium on VLSI Technology VLSI Technology, 2007 IEEE Symposium on. :194-195 Jun, 2007

Relation: 2007 IEEE Symposium on VLSI Technology

المؤلفون: Paruchuri, V. K., Narayanan, V., Linder, B. P., Brown, S.L., Kim, Y. H., Wang, Y., Ronsheim, P., Jammy, R., Chen, T. C.

المصدر: 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) VLSI Technology, Systems and Applications, 2007. VLSI-TSA 2007. International Symposium on. :1-2 Apr, 2007

Relation: 2007 International Symposium on VLSI Technology, Systems and Applications