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المؤلفون: Patrick P. Naulleau, Daniel Zehm, Lauren McQuade, Wenhua Zhu, Christopher L. Anderson, Jason DePonte, Seno Rekawa, Eric M. Gullikson, M.R. Dickinson, Weilun Chao, Farhad Salmassi, Jeff Gamsby, Ryan Miyakawa, Will Cork, Rene Delano, Lucas Conley, Carl Cork, Brandon Vollmer, Geoff Gaines, Arnaud P. Allezy, Gideon Jones
المصدر: Extreme Ultraviolet (EUV) Lithography XI.
مصطلحات موضوعية: Scanner, Materials science, business.industry, Extreme ultraviolet lithography, Photoresist, Vibration, symbols.namesake, Fourier transform, Vibration isolation, Optics, Resist, symbols, business, MOX fuel
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6fcdd18ed1291baa8f99cac8ae4dcc2d
https://doi.org/10.1117/12.2552125 -
2كتاب إلكتروني
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3كتاب إلكتروني
المؤلفون: Eric Ryan, Adam Lowry, Lucas Conley
نوع المادة: eBook.
الموضوعات: Strategic planning, Business planning
تصنيفات: BUSINESS & ECONOMICS / Entrepreneurship, BUSINESS & ECONOMICS / Decision-Making & Problem Solving, BUSINESS & ECONOMICS / New Business Enterprises
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4
المؤلفون: Miller, Mark
المساهمون: Conley, Lucas (VerfasserIn); Chouinard, Yvon (VerfasserIn eines Vorworts)
المصدر: 2018
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5كتاب
المؤلفون: Ryan, Eric; Lowry, Adam
المساهمون: Conley, Lucas (Sonstige beteiligte Personen)
المصدر: 2011
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