المؤلفون: Current, Michael I., Lukaszek, W., Farrens, Shari, Fong, T.

المصدر: 2015 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S) SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2015 IEEE. :1-3 Oct, 2015

Relation: 2015 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)

المؤلفون: Lukaszek, W., Current, M.I., Daryanani, S., Larson, L., Rhoad, T., Shields, J., Vella, M., Wagner, D.

المصدر: 2003 8th International Symposium Plasma- and Process-Induced Damage. Plasma- and process-induced damage Plasma- and Process-Induced Damage, 2003 8th International Symposium. :182-185 2003

Relation: 2003 8th International Symposium on Plasma- and Process-Induced Damage

المؤلفون: Barlingay, C., Yach, R., Lukaszek, W.

المصدر: 7th International Symposium on Plasma- and Process-Induced Damage Plasma- and process-induced damage Plasma- and Process-Induced Damage, 2002 7th International Symposium on. :27-30 2002

Relation: 2002 7th International Symposium on Plasma- and Process-Induced Damage

المؤلفون: Lukaszek, W., Shields, J.

المصدر: 7th International Symposium on Plasma- and Process-Induced Damage Plasma- and process-induced damage Plasma- and Process-Induced Damage, 2002 7th International Symposium on. :68-71 2002

Relation: 2002 7th International Symposium on Plasma- and Process-Induced Damage

المؤلفون: Lukaszek, W., Daryanani, S., Shields, J.

المصدر: Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Ion implantation technology proceedings Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on. :209-212 2002

Relation: Proceedings of the 2002 14th International Conference on Ion Implantation Technology

المؤلفون: Lukaszek, W.

المصدر: 2002 IEEE International Reliability Physics Symposium. Proceedings. 40th Annual (Cat. No.02CH37320) Reliability physics symposium Reliability Physics Symposium Proceedings, 2002. 40th Annual. :346-353 2002

Relation: 2002 IEEE International Reliability Physics Symposium Proceedings. 40th Annual

المؤلفون: Barlingay, C.K., Yach, R., Lukaszek, W.

المصدر: 2001 6th International Symposium on Plasma- and Process-Induced Damage (IEEE Cat. No.01TH8538) Plasma- and process-induced damage Plasma- and Process-Induced Damage, 2001 6th International Symposium on. :76-79 2001

Relation: 2001 6th International Symposium on Plasma- and Process-Induced Damage

المؤلفون: Lukaszek, W., Gabriel, C.T.

المصدر: 2001 6th International Symposium on Plasma- and Process-Induced Damage (IEEE Cat. No.01TH8538) Plasma- and process-induced damage Plasma- and Process-Induced Damage, 2001 6th International Symposium on. :116-119 2001

Relation: 2001 6th International Symposium on Plasma- and Process-Induced Damage

المؤلفون: Lukaszek, W.

المصدر: 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) Ion implantation technology Ion Implantation Technology, 2000. Conference on. :569-572 2000

Relation: 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000

المؤلفون: Carrere, J.-P., Poiroux, T., Lukaszek, W., Verove, C., Haond, M., Reimbold, G., Turban, G.

المصدر: 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) Plasma process-induced damage Plasma Process-Induced Damage, 2000 5th International Symposium on. :22-25 2000

Relation: 2000 5th International Symposium on Plasma Process-Induced Damage