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1مؤتمر
المؤلفون: Che, Y.-M., Fan, S.-Y., Lur, W.-S., Wu, T.-F.
المصدر: 38th IAS Annual Meeting on Conference Record of the Industry Applications Conference, 2003. Industry applications conference Industry Applications Conference, 2003. 38th IAS Annual Meeting. Conference Record of the. 3:1657-1663 vol.3 2003
Relation: Conference Record of the 2003 IEEE Industry Applications Conference. 38th IAS Annual Meeting
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2مؤتمر
المؤلفون: Shih, H.H., Tsai, C.Y., Yang, G.S., Chen, K.C., Yew, T.R., Lur, W., Liou, F.T.
المصدر: 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) Plasma process-induced damage Plasma Process-Induced Damage, 1999 4th International Symposium on. :88-91 1999
Relation: 1999 4th International Symposium on Plasma Process-Induced Damage
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3مؤتمر
المؤلفون: Lin, T., Chen, C., Hsu, S.Y., Tsai, M.J., Yew, T.R., Chou, J.W., Huang, K.T., Wu, J.Y., Ku, Y.C., Liu, C.C., Yang, M.S., Yeh, W.K., Huang, C.H., Lur, W., Huang, H.S., Sun, S.W.
المصدر: 1998 Semiconductor Manufacturing Technology Workshop (Cat. No.98EX133) Semiconductor manufacturing technology Semiconductor Manufacturing Technology Workshop, 1998. :57-60 1998
Relation: 1998 Semiconductor Manufacturing Technology Workshop
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4مؤتمر
المؤلفون: Lin, T., Chen, C., Hsu, S.Y., Tsai, M.J., Yew, T.R., Chou, J.W., Haung, K.T., Wu, J.Y., Ku, Y.C., Liu, C.C., Yang, M.S., Yeh, W.K., Huang, C.H., Lur, W., Huang, H.S., Sun, S.W.
المصدر: International Electron Devices Meeting. IEDM Technical Digest Electron Devices Electron Devices Meeting, 1997. IEDM '97. Technical Digest., International. :851-854 1997
Relation: International Electron Devices Meeting. IEDM Technical Digest
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5مؤتمر
المؤلفون: Chen, C., Chou, J.W., Lur, W., Sun, S.W.
المصدر: International Electron Devices Meeting. Technical Digest Electron devices Electron Devices Meeting, 1996. IEDM '96., International. :837-840 1996
Relation: International Electron Devices Meeting. Technical Digest
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6مؤتمر
المؤلفون: Chen, H.C., Yang, M.S., Wu, J.Y., Lur, W.
المصدر: Proceedings of the IEEE 1999 International Interconnect Technology Conference (Cat. No.99EX247) Interconnect technology Interconnect Technology, 1999. IEEE International Conference. :65-67 1999
Relation: Proceedings of the IEEE 1999 International Interconnect Technology Conference
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7كتاب إلكتروني
المؤلفون: Chen, L. J.Aff3, Chu, J. J.Aff3, Lur, W.Aff3, Hsu, H. F.Aff3, Lee, T. C.Aff3
المساهمون: Nissim, Yves I., editorAff1, Rosencher, Emmanuel, editorAff2
المصدر: Heterostructures on Silicon: One Step Further with Silicon. 160:231-238
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8دورية أكاديمية
المؤلفون: Lur, W., Chen, L. J.
المصدر: Journal of Applied Physics; 10/15/1989, Vol. 66 Issue 8, p3604, 8p, 18 Black and White Photographs, 3 Charts, 1 Graph
مصطلحات موضوعية: SURFACE chemistry, THIN films, TITANIUM, SILICON
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9دورية أكاديمية
المؤلفون: Lur, W., Chen, L. J.
المصدر: Journal of Applied Physics; 10/1/1988, Vol. 64 Issue 7, p3505, 7p, 13 Black and White Photographs, 3 Charts, 1 Graph
مصطلحات موضوعية: COBALT, TIN, ION implantation, FLUORINE, SILICIDES
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10دورية أكاديمية
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