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1دورية أكاديمية
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المؤلفون: J. Kanyandekwe, D. Barge, P. Morin, L. Grenouillet, M. Labrot, S. Maitrejean, E. Augendre, V. Lapras, Y. Morand, D. Dutartre, M. Gros-Jean, O. Gourhant, C. Gaumer, N. Rambal, D. Cooper, L. Clement
المصدر: Extended Abstracts of the 2018 International Conference on Solid State Devices and Materials.
مصطلحات موضوعية: Planar, Materials science, CMOS, business.industry, Optoelectronics, Epitaxy, business, PMOS logic
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0d11f975f51d0660963a7b263064dacb
https://doi.org/10.7567/ssdm.2018.c-3-03 -
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4دورية أكاديمية
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المؤلفون: M. Gros-Jean, M. Kogelschatz, Serge Blonkowski, R. Foissac
المصدر: 2014 IEEE International Reliability Physics Symposium.
مصطلحات موضوعية: 010302 applied physics, Materials science, Stress effects, Scale (ratio), business.industry, Electrical engineering, Gate stack, Time-dependent gate oxide breakdown, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Engineering physics, 0103 physical sciences, Breakdown voltage, Voltage pulse, 0210 nano-technology, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4be11780a01180a3afbb2270ef8250d6
https://doi.org/10.1109/irps.2014.6861148 -
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المؤلفون: François Ozanam, Daniel Lincot, M. Gros-Jean, R. Herino, J.-N. Chazalviel
المصدر: Materials Science and Engineering: B. :77-80
مصطلحات موضوعية: Materials science, Nanocomposite, Silicon, Mechanical Engineering, Inorganic chemistry, technology, industry, and agriculture, chemistry.chemical_element, Condensed Matter Physics, Porous silicon, Cadmium sulfide, chemistry.chemical_compound, chemistry, Mechanics of Materials, Transmission electron microscopy, General Materials Science, Porous medium, Layer (electronics), Chemical bath deposition
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المؤلفون: I. Solomon, M Gros-Jean, J.-N Chazalviel
المصدر: Solid State Communications. 109:643-648
مصطلحات موضوعية: Amorphous silicon, Materials science, Silicon, business.industry, Anodizing, Doping, Nanocrystalline silicon, chemistry.chemical_element, General Chemistry, Electrolyte, Microporous material, Condensed Matter Physics, chemistry.chemical_compound, chemistry, Materials Chemistry, Optoelectronics, business, Layer (electronics)
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المؤلفون: R. Herino, Daniel Lincot, M. Gros-Jean
المصدر: Journal of The Electrochemical Society. 145:2448-2452
مصطلحات موضوعية: Cadmium hydroxide, Auger electron spectroscopy, Silicon, Renewable Energy, Sustainability and the Environment, Scanning electron microscope, Chemistry, technology, industry, and agriculture, Mineralogy, chemistry.chemical_element, Condensed Matter Physics, Porous silicon, Cadmium sulfide, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, X-ray photoelectron spectroscopy, Chemical engineering, Materials Chemistry, Electrochemistry, Chemical bath deposition
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المؤلفون: Roland Pantel, F. Martin, Virginie Loup, François Bertin, O. Renault, Catherine Dubourdieu, Jörg Zegenhagen, Blanka Detlefs, Eugénie Martinez, M. Gros-Jean, R. Boujamaa, S. Baudot, Névine Rochat
المساهمون: Laboratoire des matériaux et du génie physique (LMGP ), Institut National Polytechnique de Grenoble (INPG)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), STMicroelectronics [Crolles] (ST-CROLLES), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), European Synchrotron Radiation Facility (ESRF), Laboratoire des technologies de la microélectronique (LTM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS), Science et Ingénierie des Matériaux et Procédés (SIMaP), Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut de Chimie du CNRS (INC)-Institut National Polytechnique de Grenoble (INPG), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut National Polytechnique de Grenoble (INPG)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS), Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut National Polytechnique de Grenoble (INPG)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)
المصدر: Journal of Applied Physics
Journal of Applied Physics, American Institute of Physics, 2012, 111 (5), pp.054110. ⟨10.1063/1.3684709⟩
Journal of Applied Physics, 2012, 111 (5), pp.054110. ⟨10.1063/1.3684709⟩مصطلحات موضوعية: 010302 applied physics, Materials science, Silicon, business.industry, Annealing (metallurgy), Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Heterojunction, 02 engineering and technology, Dielectric, [CHIM.MATE]Chemical Sciences/Material chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, Hafnium, X-ray photoelectron spectroscopy, chemistry, 0103 physical sciences, Optoelectronics, 0210 nano-technology, business, Tin, Metal gate
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المؤلفون: C. Fenouillet-Beranger, P. Perreau, L. Pham-Nguyen, S. Denorme, F. Andrieu, L. Tosti, L. Brevard, O. Weber, S. Barnola, T. Salvetat, X. Garros, M. Casse, M. Cassé, C. Leroux, J.P Noel, O. Thomas, B. Le-Gratiet, F. Baron, M. Gatefait, Y. Campidelli, F. Abbate, C. Perrot, C. de-Buttet, R. Beneyton, L. Pinzelli, F. Leverd, P. Gouraud, M. Gros-Jean, A. Bajolet, C. Mezzomo, C. Leyris, S. Haendler, D. Noblet, R. Pantel, A. Margain, C. Borowiak, E. Josse, N. Planes, D. Delprat, F. Boedt, K. Bourdelle, B.Y. Nguyen, F. Boeuf, O. Faynot, T. Skotnicki
المصدر: 2009 IEEE International Electron Devices Meeting (IEDM).
مصطلحات موضوعية: Materials science, Multimedia, business.industry, Gate dielectric, Electrical engineering, Oxide, Silicon on insulator, computer.software_genre, chemistry.chemical_compound, chemistry, Low-power electronics, System on a chip, Static random-access memory, business, Metal gate, computer, High-κ dielectric
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::994e16265336178cb061f24a3f45c9d2
https://doi.org/10.1109/iedm.2009.5424251
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