المؤلفون: M.-L. Pourteau, A. Gharbi, P. Brianceau, J.-A. Dallery, F. Laulagnet, G. Rademaker, R. Tiron, H.-J. Engelmann, J. von Borany, K.-H. Heinig, M. Rommel, L. Baier

المصدر: Micro and Nano Engineering, Vol 9, Iss , Pp 100074- (2020)

مصطلحات موضوعية: Single-electron-transistor, Multilayer nanopillars, Si nanodots, E-beam lithography, ICP-RIE, EFTEM, Electronics, TK7800-8360, Technology (General), T1-995

وصف الملف: electronic resource

Relation: http://www.sciencedirect.com/science/article/pii/S2590007220300290; https://doaj.org/toc/2590-0072

URL الوصول: https://doaj.org/article/293532bf485e4b0bb8f502c2bf8aa57a

المؤلفون: J von Borany, H-J Engelmann, K-H Heinig, E Amat, G Hlawacek, F Klüpfel, R Hübner, W Möller, M-L Pourteau, G Rademaker, M Rommel, L Baier, P Pichler, F Perez-Murano, R Tiron

المصدر: Semiconductor Science and Technology. 38:055011

مصطلحات موضوعية: Materials Chemistry, Electrical and Electronic Engineering, Condensed Matter Physics, Electronic, Optical and Magnetic Materials

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::70cc75628207d2fa354e36ca2239d2ab
https://doi.org/10.1088/1361-6641/acbe5d

المؤلفون: A del Moral, E Amat, H-J Engelmann, M-L Pourteau, G Rademaker, D Quirion, N Torres-Herrero, M Rommel, K-H Heinig, J von Borany, R Tiron, J Bausells, F Perez-Murano

المصدر: Semiconductor Science and Technology 37(2022), 125014-125023

مصطلحات موضوعية: hybrid circuit, MOSFET, CMOS, Materials Chemistry, Electrical and Electronic Engineering, Condensed Matter Physics, single electron transistor, vertical nanopillar, Electronic, Optical and Magnetic Materials

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bad847d133d5a21f971c279a7b843ca1
https://doi.org/10.1088/1361-6641/ac9f61

المؤلفون: Maxime Argoud, A. Le Pennec, Tommaso Jacopo Giammaria, Xavier Chevalier, Guido Rademaker, Raluca Tiron, Christophe Navarro, Ahmed Gharbi, M.-L. Pourteau, Kaumba Sakavuyi, Charlotte Bouet, Paul F. Nealey, M. G. Gusmao Cacho, Khatia Benotmane, H. Pham, C. Nicolet, A. Paquet

المصدر: Advances in Patterning Materials and Processes XXXVII

مصطلحات موضوعية: Materials science, CMOS, business.industry, Multiple patterning, Optoelectronics, Wetting, business, Lithography, Layer (electronics), Surface energy, Immersion lithography, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::04bba6add8361b70f98da428326e8d11
https://doi.org/10.1117/12.2552003

المؤلفون: P. Brianceau, M. Rommel, Hans-Jürgen Engelmann, M.-L. Pourteau, J. von Borany, F. Laulagnet, Guido Rademaker, J.-A. Dallery, Ahmed Gharbi, L. Baier, Karl-Heinz Heinig, Raluca Tiron

المساهمون: Département Plate-Forme Technologique (DPFT), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Vistec Electron Beam GmbH, Helmholtz-Zentrum Dresden-Rossendorf (HZDR), Fraunhofer Institute for Integrated Systems and Device Technology (Fraunhofer IISB), Fraunhofer (Fraunhofer-Gesellschaft), European Project: 688072,H2020,H2020-ICT-2015,IONS4SET(2016), Publica

المصدر: Micro and Nano Engineering
Micro and Nano Engineering, Elsevier, 2020, 9, https://doi.org/10.1016/j.mne.2020.100074. ⟨10.1016/j.mne.2020.100074⟩
Micro and Nano Engineering, 2020, 9, https://doi.org/10.1016/j.mne.2020.100074. ⟨10.1016/j.mne.2020.100074⟩
Micro and Nano Engineering 9(2020), 100074
Micro and Nano Engineering, Vol 9, Iss, Pp 100074-(2020)

مصطلحات موضوعية: Reactive ion etching, Materials science, Fabrication, lcsh:TK7800-8360, EFTEM, 02 engineering and technology, 01 natural sciences, 010309 optics, Single-electron transistor, Characterization methods, E-beam lithography, Robustness (computer science), lcsh:Technology (General), Energy-filtered transmission electron microscopy, 0103 physical sciences, Electrical and Electronic Engineering, Reactive-ion etching, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Lithography, Nanopillar, business.industry, ICP-RIE, lcsh:Electronics, Single-electron-transistor, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Multilayer nanopillars, CMOS, lcsh:T1-995, Optoelectronics, Si nanodots, 0210 nano-technology, business, Silicon nanodots, Critical dimension

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1ffaa0176ed92185b48dbaa77d24531d
https://hal-cea.archives-ouvertes.fr/cea-03409432

المؤلفون: C. Nicolet, Laurent Pain, A. Le Pennec, Guido Rademaker, D. Mariolle, Ahmed Gharbi, Christophe Navarro, Xavier Chevalier, Tommaso Jacopo Giammaria, Raluca Tiron, Kaumba Sakavuyi, M.-L. Pourteau, A. Paquet, Paul F. Nealey

المصدر: Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019.

مصطلحات موضوعية: Materials science, business.industry, Resolution (electron density), Copolymer, Process (computing), Optoelectronics, Process window, Ranging, business, Epitaxy, Lithography, Critical dimension

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4af1827411810f3d8033f4fe5e4a6d01
https://doi.org/10.1117/12.2514960

المؤلفون: Raluca Tiron, Hans-Jürgen Engelmann, L. Baier, Ahmed Gharbi, Guido Rademaker, Karl-Heinz Heinig, J.-A. Dallery, P. Brianceau, J. von Borany, M.-L. Pourteau, F. Laulagnet, M. Rommel

المصدر: Microelectronic Engineering. :111336

مصطلحات موضوعية: Set (abstract data type), CMOS, business.industry, Computer science, Optoelectronics, Electrical and Electronic Engineering, Condensed Matter Physics, business, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Nanopillar

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3b43b81cdf3e25cdf2c0c3b10d835a3f
https://doi.org/10.1016/j.mee.2020.111336

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تسجيل الدخول للوصول الكامل.

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تسجيل الدخول للوصول الكامل.

المؤلفون: L. Pain, J. Boussey, Sylvain David, A.-P. Mebiene-Engohang, M.-L Pourteau, S. Cêtre, S. Labau, J. C. Marusic

المساهمون: Laboratoire des technologies de la microélectronique (LTM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), ST Microélectronics, ST Microélectronic, Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS), The research leading to these results has been performed in the frame of the industrial collaborative consortium IMAGINE.

المصدر: Conference on Photomask Technology
Conference on Photomask Technology, Sep 2014, Monterey, United States
Conference on Photomask Technology, Sep 2014, Monterey, United States. ⟨10.1117/12.2066152⟩

مصطلحات موضوعية: Materials science, Residual gas analyzer, Extreme ultraviolet lithography, 02 engineering and technology, 01 natural sciences, Optics, 0103 physical sciences, Lithography, ComputingMilieux_MISCELLANEOUS, [PHYS]Physics [physics], 010302 applied physics, business.industry, optic contamination, RGA, 021001 nanoscience & nanotechnology, TD-GC-MS, Outgassing, Resist, top-coat, 13. Climate action, outgassing, SEM, Optoelectronics, chemically amplified resists, 0210 nano-technology, business, Next-generation lithography, Maskless lithography, Electron-beam lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::03814563678ae5eb1e8170ce221ffe03
https://doi.org/10.1117/12.2066152