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1دورية أكاديمية
المؤلفون: Wu, Shaocheng, Xu, Rongbin, Guo, Bingliang, Ma, Yinggong, Yu, Daquan
المصدر: In Materials Science in Semiconductor Processing January 2024 169
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2مؤتمر
المؤلفون: Guo, Bingliang, Dong, Boyu, Wu, Xuewei, Li, Xinying, Wu, Shubo, Yang, Yilong, Liu, Yujie, Zhang, Jiahao, Zhang, Lu, Chen, Yujing, Zhao, Chenguang, Ma, Yinggong, Shi, Xiaoping, Wang, Hougong, Ding, Peijun
المصدر: 2019 China Semiconductor Technology International Conference (CSTIC) China Semiconductor Technology International Conference (CSTIC), 2019. :1-3 Mar, 2019
Relation: 2019 China Semiconductor Technology International Conference (CSTIC)
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3دورية أكاديمية
المؤلفون: Wang, Yonghua, Kou, Zili, Liu, Yinjuan, Liu, Fangming, Duan, Wenrui, Deng, Jirui, Ma, Yinggong, Ma, Dejiang, Tan, Lijie, Li, Chunxia, Zhang, Yajie, He, Duanwei
المصدر: In International Journal of Refractory Metals and Hard Materials January 2016 54:203-209
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4
المؤلفون: Wu Shubo, Ding Peijun, Chen Yujing, Li Xinying, Zhang Jiahao, Wu Xuewei, Zhang Lu, Zhao Chenguang, Guo Bingliang, Dong Boyu, Ma Yinggong, Yang Yilong, Xiaoping Shi, Hougong Wang, Liu Yujie
المصدر: 2019 China Semiconductor Technology International Conference (CSTIC).
مصطلحات موضوعية: Full width at half maximum, Materials science, business.industry, Physical vapor deposition, Optoelectronics, Microelectronics, Substrate (electronics), Metalorganic vapour phase epitaxy, Chemical vapor deposition, business, Epitaxy, Layer (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::145ddaf42662c7742494e117a1be9ffd
https://doi.org/10.1109/cstic.2019.8755770