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1
المؤلفون: Stefan Schoeche, Daniel Schmidt, Marjorie Cheng, Aron Cepler, Abraham Arceo de la Pena, Jennifer S. Oakley
المصدر: Metrology, Inspection, and Process Control XXXVII.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d2682081c9b0366300445d2b65f208ba
https://doi.org/10.1117/12.2658458 -
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المؤلفون: Amir Nourbakhsh, Lan Yu, Tyler Sherwood, Xing Chen, Siddarth Krishnan, PY Hung, Aron Cepler, Marjorie Cheng, Yonatan Oren
المصدر: 2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a15cd78c9221138a9ed7d795cedde53c
https://doi.org/10.1109/asmc54647.2022.9792512 -
3
المؤلفون: Daniel Schmidt, Igor Turovets, Veeraraghavan S. Basker, Andrew M. Greene, Frougier Julien, Mary Breton, Aron Cepler, Marjorie Cheng, Dexin Kong, Nicolas Loubet, Mark Klare, Roy Koret, Jingyun Zhang, Abraham Arceo de la Pena, Ishtiaq Ahsan
المصدر: 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
مصطلحات موضوعية: Materials science, business.industry, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Light scattering, Metrology, Silicon-germanium, 010309 optics, chemistry.chemical_compound, Interferometry, chemistry, Indentation, 0103 physical sciences, Optoelectronics, Process control, Development (differential geometry), 0210 nano-technology, business, Nanosheet
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f3f7a2fb31f627b7d8b01b43a56fe6d4
https://doi.org/10.1109/asmc49169.2020.9185226 -
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المؤلفون: Jennifer Church, Marjorie Cheng, Luciana Meli, John R. Sporre, Mary Breton, Igor Turovets, Chi-Chun Liu, Cody Murray, Nelson Felix, Dexin Kong, Eric R. Miller, Ishtiaq Ahsan, Roy Koret, Aron Cepler, Daniel Schmidt
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Reference data (financial markets), Machine learning, computer.software_genre, Resist, Cathode ray, Artificial intelligence, Focus (optics), business, Throughput (business), computer, Critical dimension, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f46c75a6f61127c8ec20ba2b373bf2ad
https://doi.org/10.1117/12.2551498 -
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المؤلفون: Kevin Drayton, Matthew Sendelbach, Alexander Elia, Padraig Timoney, Susan Emans, Darren Zingerman, Marjorie Cheng, Benny Vilge, Charles Kang, Timothy Hughes, Taher Kagalwala, Naren Yellai, Alok Vaid, Jason Emans, Ronald Fiege
المصدر: 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
مصطلحات موضوعية: Matching (statistics), Schedule, Computer science, Process (engineering), Semiconductor device fabrication, Action plan, Key (cryptography), ComputerApplications_COMPUTERSINOTHERSYSTEMS, Performance indicator, Manufacturing engineering, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8c28b5540552f4f3f687d57735f5ebe1
https://doi.org/10.1109/asmc.2019.8791789 -
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المؤلفون: Naren Yellai, Alok Vaid, Roy Koret, Haibo Liu, Paul Isbester, Byeong Cheol Kang, Padraig Timoney, Susan Ng-Emans, Matt Sendelbach, Oram Gedalia, Marjorie Cheng
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Process variation, Interconnection, Back end of line, Optics, Materials science, business.industry, Measurement uncertainty, Wafer, business, Rigorous coupled-wave analysis, Front end of line, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c585a1cec70e6994702211af7e769dbf
https://doi.org/10.1117/12.2261452