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المؤلفون: Markus P. Benk, Andrew R. Neureuther, Laura Waller, Stuart Sherwin, Isvar A. Cordova, Ryan Miyakawa, Patrick P. Naulleau
المصدر: Extreme Ultraviolet Lithography 2020.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Phase (waves), Picometre, Metrology, Optics, Extreme ultraviolet, Etching, Monolayer, Phase-shift mask, Sensitivity (control systems), business, Reflectometry
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d299058def0c28c83123efe7473b2897
https://doi.org/10.1117/12.2574759 -
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المؤلفون: Anton van Oosten, Timon Fliervoet, Eelco van Setten, Joern-Holger Franke, Gerardo Bottiglieri, Rene Carpaij, Dong-Seok Nam, Fei Liu, Natalia Davydova, Vincent Wiaux, Joseph Zekry, John McNamara, Patrick P. Naulleau, Markus P. Benk, Ken Goldberg
المصدر: Extreme Ultraviolet Lithography 2020.
مصطلحات موضوعية: Scanner, Optics, Scale (ratio), Computer science, business.industry, Extreme ultraviolet lithography, FLEX, Node (circuits), Wafer, business, Aerial image
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::52b7865a00d92bb9a6d496972edee69d
https://doi.org/10.1117/12.2572846 -
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المؤلفون: Laura Waller, Aamod Shanker, Stuart Sherwin, Markus P. Benk, Gautam Gunjala, Patrick P. Naulleau, Antoine Wojdyla, Kenneth A. Goldberg
المصدر: Scientific reports, vol 10, iss 1
Scientific Reports
Scientific Reports, Vol 10, Iss 1, Pp 1-11 (2020)مصطلحات موضوعية: Accuracy and precision, Microscope, Materials science, lcsh:Medicine, 02 engineering and technology, Surface finish, 01 natural sciences, Article, law.invention, 010309 optics, Optics, law, 0103 physical sciences, Surface roughness, Optical techniques, lcsh:Science, Wavefront, Multidisciplinary, business.industry, lcsh:R, Computational science, 021001 nanoscience & nanotechnology, Characterization (materials science), Extreme ultraviolet, lcsh:Q, Photomask, 0210 nano-technology, business
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0f12fc3c93e782aa120a67912a9b91c5
https://escholarship.org/uc/item/4pd3p2hw -
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المؤلفون: Markus P. Benk, Patrick P. Naulleau, Ryan Miyakawa, Stuart Shwerwin, Wenhua Zhu
المصدر: Extreme Ultraviolet (EUV) Lithography XI.
مصطلحات موضوعية: Microscope, Materials science, business.industry, Zernike polynomials, Extreme ultraviolet lithography, Phase (waves), Image plane, law.invention, symbols.namesake, Amplitude, Optics, law, Pupil function, symbols, business, Phase retrieval
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ca0f78104e8d82366989264af2301e0a
https://doi.org/10.1117/12.2553133 -
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المؤلفون: Patrick P. Naulleau, Ryan Miyakawa, Ken Goldberg, Weilun Chao, Markus P. Benk
المساهمون: Goldberg, Kenneth A
المصدر: Extreme Ultraviolet (EUV) Lithography X.
مصطلحات موضوعية: SHARP, Physics, aerial image, Microscope, microscope, Stray light, business.industry, Aperture, Extreme ultraviolet lithography, photomask, law.invention, mask, Optics, law, Extreme ultraviolet, zoneplate, Reticle, EUV, Ray tracing (graphics), Photomask, business
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1f1bd55390314f062dfa78fe863317ea
https://doi.org/10.1117/12.2516387 -
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المصدر: Image Sensing Technologies: Materials, Devices, Systems, and Applications V.
مصطلحات موضوعية: Materials science, Microscope, business.industry, Extreme ultraviolet lithography, Mask inspection, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Ptychography, law.invention, Numerical aperture, 010309 optics, Angular spectrum method, Optics, law, 0103 physical sciences, Photomask, Photolithography, 0210 nano-technology, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9ebed104d57de84b5a05b674eb275bc3
https://doi.org/10.1117/12.2307860 -
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المصدر: Computational Imaging III.
مصطلحات موضوعية: Microscope, Materials science, business.industry, Extreme ultraviolet lithography, Resolution (electron density), Ptychography, law.invention, Numerical aperture, symbols.namesake, Optics, Fourier transform, Illumination angle, law, symbols, business, Phase retrieval
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::81181476b44fba4525b6823ff3f497b5
https://doi.org/10.1117/12.2303447 -
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المؤلفون: Kenneth A. Goldberg, Stuart Sherwin, Patrick P. Naulleau, Laura Waller, Gautam Gunjala, Aamod Shanker, Antoine Wojdyla, Markus P. Benk
المصدر: Imaging and Applied Optics 2018 (3D, AO, AIO, COSI, DH, IS, LACSEA, LS&C, MATH, pcAOP).
مصطلحات موضوعية: Materials science, Microscope, business.industry, Extreme ultraviolet lithography, Surface finish, Synchrotron, law.invention, Optics, law, Extreme ultraviolet, Microscopy, Surface roughness, Photomask, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6cce5905cdf7607a274ce2d5e3145804
https://doi.org/10.1364/cosi.2018.cw2e.2 -
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المصدر: Yan, Pei-Yang; Zhang, Guojing; Gullikson, Eric, M.; Goldberg, Kenneth, A.; & Benk, Markus, P.(2017). Understanding EUV mask blank surface roughness induced LWR and associated roughness requirement:. Proc. SPIE, 9422. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/0jm1n133
مصطلحات موضوعية: Materials science, Optics, Resist, business.industry, Extreme ultraviolet lithography, Extreme ultraviolet, Reticle, Surface roughness, Wafer, Surface finish, business, Blank
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cada186e5db1a74512ccb98a1e26bed2
http://www.escholarship.org/uc/item/0jm1n133 -
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المؤلفون: Ken Goldberg, Weilun Chao, Markus P. Benk, Patrick P. Naulleau, Ryan Miyakawa
المصدر: International Conference on Extreme Ultraviolet Lithography 2017.
مصطلحات موضوعية: Materials science, Microscope, business.industry, Extreme ultraviolet lithography, law.invention, Numerical aperture, chemistry.chemical_compound, Optics, Key factors, Tantalum nitride, chemistry, law, Feature (computer vision), Process window, Photomask, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a58a985041c39117b30ff63c1a0c90f3
https://doi.org/10.1117/12.2281109
