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المؤلفون: Daniel Schmidt, Manasa Medikonda, Michael Rizzolo, Claire Silvestre, Julien Frougier, Andrew Greene, Mary Breton, Aron Cepler, Jacob Ofek, Itzik Kaplan, Roy Koret, Igor Turovets
المصدر: Journal of Micro/Nanopatterning, Materials, and Metrology. 22
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::efec40642400718dad045060d2eddd91
https://doi.org/10.1117/1.jmm.22.3.031203 -
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المؤلفون: Daniel Schmidt, Aron Cepler, Curtis Durfee, Shanti Pancharatnam, Julien Frougier, Mary Breton, Andrew Greene, Mark Klare, Roy Koret, Igor Turovets
مصطلحات موضوعية: FOS: Physical sciences, Physics - Applied Physics, Applied Physics (physics.app-ph), Electrical and Electronic Engineering, Condensed Matter Physics, Industrial and Manufacturing Engineering, Electronic, Optical and Magnetic Materials
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a0b883d3edd86a617680648728b9db75
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المؤلفون: Adra Carr, Shanti Pancharatnam, Gabriel Rodriguez, L. White, Brock Mendoza, W. Wang, Scott DeVries, R. N. Pujari, Gauri Karve, Mary Breton, Jean E. Wynne
المصدر: IEEE Transactions on Semiconductor Manufacturing. 32:374-380
مصطلحات موضوعية: 0209 industrial biotechnology, Materials science, chemistry.chemical_element, 02 engineering and technology, Tungsten, equipment and supplies, Condensed Matter Physics, Titanium nitride, Industrial and Manufacturing Engineering, Grain size, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, 020901 industrial engineering & automation, chemistry, Tantalum nitride, Surface roughness, Electrical and Electronic Engineering, Composite material, skin and connective tissue diseases, Tin, Deposition (law)
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المؤلفون: Igor Turovets, Jennifer Fullam, Mary Breton, Roy Koret, Karen Petrillo, Daniel Schmidt, Aron Cepler
المصدر: 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Reference data (financial markets), 02 engineering and technology, Surface finish, 021001 nanoscience & nanotechnology, Machine learning, computer.software_genre, 01 natural sciences, Line width, Metrology, Characterization (materials science), 010309 optics, Resist, 0103 physical sciences, Line (geometry), Artificial intelligence, 0210 nano-technology, business, computer
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::751e641cba50434e9d41a5b8b6f0cbc6
https://doi.org/10.1109/asmc51741.2021.9435698 -
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المؤلفون: Mary Breton, Anuja De Silva, Jing Guo, Karen Petrillo, Nelson Felix, Jennifer Church, Martin Burkhardt, Luciana Meli, Allen H. Gabor, Cody Murray, Lijuan Zou
المصدر: Extreme Ultraviolet (EUV) Lithography XII.
مصطلحات موضوعية: Interconnection, Scanner, Materials science, Stack (abstract data type), Resist, business.industry, Etching (microfabrication), Extreme ultraviolet lithography, Optoelectronics, Node (circuits), Performance improvement, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a879bbeb6cadd42b19242c8ff84854a9
https://doi.org/10.1117/12.2582563 -
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المؤلفون: Curtis Durfee, Frougier Julien, Daniel Schmidt, Andrew M. Greene, Veeraraghavan S. Basker, Jennifer Church, Nelson Felix, Indira Seshadri, Mary Breton
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
مصطلحات موضوعية: Semiconductor industry, Technology readiness, law, Computer science, Transistor, Systems engineering, Node (circuits), Architecture, Cmos scaling, law.invention, Metrology, Nanosheet
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9c6a4ecf9f0ad6d25b631e6567243b1c
https://doi.org/10.1117/12.2583636 -
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المؤلفون: Tao Li, Chris A. Mack, Frougier Julien, Andrew M. Greene, Daniel J. Dechene, Chris Waskiewicz, Veeraraghavan S. Basker, Jingyun Zhang, Stuart A. Sieg, Carl J. Radens, Prateek Hundekar, Tsung-Sheng Kang, Indira Seshadri, Nelson Felix, Jennifer Church, Eric R. Miller, Mary Breton
المصدر: Extreme Ultraviolet (EUV) Lithography XII.
مصطلحات موضوعية: Materials science, Resist, business.industry, Extreme ultraviolet lithography, Multiple patterning, Optoelectronics, Node (circuits), business, Critical dimension, Scaling, AND gate, Nanosheet
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ecd35b8cc836ad368baf97505bac549a
https://doi.org/10.1117/12.2583897 -
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المؤلفون: Daniel Schmidt, Igor Turovets, Veeraraghavan S. Basker, Andrew M. Greene, Frougier Julien, Mary Breton, Aron Cepler, Marjorie Cheng, Dexin Kong, Nicolas Loubet, Mark Klare, Roy Koret, Jingyun Zhang, Abraham Arceo de la Pena, Ishtiaq Ahsan
المصدر: 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
مصطلحات موضوعية: Materials science, business.industry, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Light scattering, Metrology, Silicon-germanium, 010309 optics, chemistry.chemical_compound, Interferometry, chemistry, Indentation, 0103 physical sciences, Optoelectronics, Process control, Development (differential geometry), 0210 nano-technology, business, Nanosheet
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f3f7a2fb31f627b7d8b01b43a56fe6d4
https://doi.org/10.1109/asmc49169.2020.9185226 -
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المؤلفون: M. Cogorno, S. C. Kung, Tushar Mandrekar, Balasubramanian S. Pranatharthi Haran, Mary Breton, Hemanth Jagannathan, Jingyun Zhang, James Chingwei Li, Benjamin Colombeau, Huimei Zhou, Shogo Mochizuki, Koji Watanabe, Nicolas Loubet, Sanjay Natarajan, M. Stolfi, P. Chen
المصدر: 2020 IEEE Symposium on VLSI Technology.
مصطلحات موضوعية: Negative-bias temperature instability, Materials science, Silicon, business.industry, chemistry.chemical_element, 02 engineering and technology, 010402 general chemistry, 021001 nanoscience & nanotechnology, Epitaxy, Cladding (fiber optics), 01 natural sciences, 0104 chemical sciences, Silicon-germanium, PMOS logic, Threshold voltage, chemistry.chemical_compound, chemistry, Optoelectronics, 0210 nano-technology, business, Nanosheet
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ee4322f5540fb764cc42752599399f82
https://doi.org/10.1109/vlsitechnology18217.2020.9265097 -
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المؤلفون: Jennifer Church, Marjorie Cheng, Luciana Meli, John R. Sporre, Mary Breton, Igor Turovets, Chi-Chun Liu, Cody Murray, Nelson Felix, Dexin Kong, Eric R. Miller, Ishtiaq Ahsan, Roy Koret, Aron Cepler, Daniel Schmidt
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Reference data (financial markets), Machine learning, computer.software_genre, Resist, Cathode ray, Artificial intelligence, Focus (optics), business, Throughput (business), computer, Critical dimension, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f46c75a6f61127c8ec20ba2b373bf2ad
https://doi.org/10.1117/12.2551498