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المؤلفون: Cong Que Dinh, Seiji Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Soichiro Okada, Seiji Fujimoto, Shinichiro Kawakami, Satoru Shimura, Makoto Muramatsu, Kayoko Cho, Xiang Liu, Kathleen Nafus, Michael A. Carcasi, Ankur Agarwal, Mark H. Somervell, Lior Huli, Kanzo Kato, Michael Kocsis, Peter De Schepper, Stephen T. Meyers, Lauren McQuade, Kazuki Kasahara, Jara Garcia Santaclara, Rik Hoefnagels, Chris Anderson, Patrick Naulleau
المصدر: Advances in Patterning Materials and Processes XL.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::26d02b85b13ca6ca4e771ca40caaaa86
https://doi.org/10.1117/12.2655928 -
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المؤلفون: Yuanyi Zhang, Mark Somervell, Sean P. Berglund, Colton D'Ambra, Muramatsu Makoto, Rachel A. Segalman, Christopher M. Bates, Craig J. Hawker, Michael A. Carcasi, Lior Huli, Ryan L. Burns
المصدر: Advances in Patterning Materials and Processes XXXVIII.
مصطلحات موضوعية: chemistry.chemical_classification, Spin coating, Materials science, chemistry, Monolayer, Deposition (phase transition), Nanometre, Nanotechnology, Dielectric, Polymer, Nanoscopic scale, Microscale chemistry
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1984cfce30751bf70c0b0958d7cbf30f
https://doi.org/10.1117/12.2583086 -
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المؤلفون: Hideo Nakashima, Yuichi Yoshida, John S. Petersen, Cong Que Dinh, Balint Meliorisz, Geert Vandenberghe, Philippe Foubert, Kosuke Yoshihara, Kathleen Nafus, Hans-Jürgen Stock, Masaru Tomono, Yuya Kamei, Seiji Nagahara, Michael A. Carcasi, Ryo Shimada, Yoshihiro Kondo, Danilo De Simone, Yukie Minekawa, Peter De Bisschop, Gosuke Shiraishi, Hiroyuki Ide, Serge Biesemans, Kazuhiro Takeshita
المصدر: Advances in Patterning Materials and Processes XXXVI.
مصطلحات موضوعية: Materials science, Resist, Continuous modelling, Extreme ultraviolet lithography, Calibration, Surface finish, Edge (geometry), Image enhancement, Residual, Biological system
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::26776e5b3630c27003585fd3828bf3be
https://doi.org/10.1117/12.2515187 -
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المؤلفون: Hans-Jürgen Stock, Yuya Kamei, Serge Biesemans, Yoshihiro Kondo, Hiroyuki Ide, Ryo Shimada, Yukie Minekawa, Philippe Foubert, Kazuhiro Takeshita, Kosuke Yoshihara, Kathleen Nafus, Geert Vandenberghe, Michael A. Carcasi, Yuichi Yoshida, Peter De Bisschop, Masaru Tomono, Gousuke Shiraishi, Seiji Nagahara, John S. Petersen, Balint Meliorisz, Danilo De Simone, Teruhiko Moriya, Cong Que Dinh
المصدر: Extreme Ultraviolet (EUV) Lithography X.
مصطلحات موضوعية: Resist, Computer science, Extreme ultraviolet lithography, Stochastic simulation, Mechanical engineering, Model parameters, Surface finish, Lithography process
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ab3e0be5e2bcdf438557b4eafbf7d425
https://doi.org/10.1117/12.2515183 -
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المؤلفون: Akihiro Oshima, Seiichi Tagawa, Hiroyuki Ide, Serge Biesemans, Kosuke Yoshihara, Yoshitaka Konishi, Danilo De Simone, Masafumi Hori, Teruhiko Moriya, Hayakawa Makoto, Hans-Jürgen Stock, Yuya Kamei, Kathleen Nafus, Ryo Aizawa, Ken Maruyama, Takahiro Shiozawa, Yoshihiro Kondo, Motoyuki Shima, Kazuhiro Takeshita, Michael A. Carcasi, Masashi Enomoto, Toru Kimura, Yukie Minekawa, Tomoki Nagai, Gosuke Shiraishi, Hideo Nakashima, Masayuki Miyake, Hisashi Nakagawa, Geert Vandenberghe, Keisuke Yoshida, Masaru Tomono, John S. Petersen, Balint Meliorisz, Takehiko Naruoka, Ryo Shimada, Seiji Nagahara, Satoshi Dei, Foubert Philippe
المصدر: Advances in Patterning Materials and Processes XXXV.
مصطلحات موضوعية: 010302 applied physics, Materials science, Contrast enhancement, business.industry, Extreme ultraviolet lithography, 02 engineering and technology, Surface finish, 021001 nanoscience & nanotechnology, 01 natural sciences, medicine.anatomical_structure, Resist, 0103 physical sciences, medicine, Optoelectronics, Process optimization, 0210 nano-technology, business, Sensitization, Line (formation)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::824dfca6e19a82aae0a388d175fc1216
https://doi.org/10.1117/12.2297498 -
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المؤلفون: Hideo Nakashima, Geert Vandenberghe, Masafumi Hori, Gosuke Shiraishi, Michael A. Carcasi, Masayuki Miyake, Seiji Nagahara, Hiroyuki Ide, Yuya Kamei, Satoshi Dei, Hisashi Nakagawa, Yukie Minekawa, Kosuke Yoshihara, Kathleen Nafus, Yoshihiro Kondo, Tomoki Nagai, Masaru Tomono, Motoyuki Shima, Philippe Foubert, Kazuhiro Takeshita, Ryo Shimada, John S. Petersen, Serge Biesemans, Takehiko Naruoka, Ken Maruyama, Danilo De Simone, Teruhiko Moriya, Akihiro Oshima, Seiichi Tagawa
المصدر: Extreme Ultraviolet (EUV) Lithography IX.
مصطلحات موضوعية: Fabrication, Semiconductor, Resist, business.industry, Scientific method, Extreme ultraviolet lithography, Optoelectronics, Sensitivity (control systems), Absorption (electromagnetic radiation), business, Exposure latitude
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3ab6015c9a8ddc7415432bf2b276d2b0
https://doi.org/10.1117/12.2297370 -
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المؤلفون: Seiji Nagahara, Akihiro Oshima, Seiichi Tagawa, Kosuke Yoshihara, Michael A. Carcasi, Yukie Minekawa, Takehiko Naruoka, Hisashi Nakagawa, Tomohiro Iseki, Gosuke Shiraishi, Tomoki Nagai
المصدر: SPIE Proceedings.
مصطلحات موضوعية: 010302 applied physics, Coupling, business.industry, Extreme ultraviolet lithography, Process (computing), Nanotechnology, 02 engineering and technology, Degrees of freedom (mechanics), 021001 nanoscience & nanotechnology, 01 natural sciences, Work related, Resist, 0103 physical sciences, Optoelectronics, Sensitivity (control systems), 0210 nano-technology, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::83029e1558915e043e8c6fec62e36e9a
https://doi.org/10.1117/12.2258166 -
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المؤلفون: Geert Vandenberghe, Tomohiro Iseki, Tomoki Nagai, Hisashi Nakagawa, Akihiro Oshima, Michael A. Carcasi, Yoshihiro Kondo, Seiichi Tagawa, Philippe Foubert, Danilo De Simone, Bernd Küchler, Yukie Minekawa, Serge Biesemans, Hans-Jürgen Stock, Takehiko Naruoka, Hideo Nakashima, Yasin Ekinci, Yuya Kamei, Elizabeth Buitrago, Seiji Nagahara, Masafumi Hori, Ryo Shimada, Takahiro Shiozawa, Gosuke Shiraishi, Masaru Tomono, Michaela Vockenhuber, Satoshi Dei, Kosuke Yoshihara, Kathleen Nafus
المصدر: SPIE Proceedings.
مصطلحات موضوعية: 010302 applied physics, chemistry.chemical_classification, Materials science, business.industry, Extreme ultraviolet lithography, High resolution, 02 engineering and technology, Polymer, 021001 nanoscience & nanotechnology, Photochemistry, 01 natural sciences, Decomposition, Optics, Resist, chemistry, 0103 physical sciences, Photosensitizer, 0210 nano-technology, business, Throughput (business), Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4aa891c97aae2f8f80b1932ad46b2948
https://doi.org/10.1117/12.2258217 -
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المؤلفون: Kathleen Nafus, Serge Biesemans, Jeffrey S. Smith, Craig Higgins, Anton J. deVilliers, Erik Verduijn, Michael A. Carcasi, Lior Huli, Dave Hetzer, Jerome Wandell, Vinayak Rastogi
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Single pass, Optics, Offset (computer science), Resist, business.industry, Extreme ultraviolet, Extreme ultraviolet lithography, Multiple patterning, Shot noise, Pattern type, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::18954db9a1613441a438776b65e1db58
https://doi.org/10.1117/12.2048862 -
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المؤلفون: Shinichiro Kawakami, Yuichiro Miyata, Derek W. Bassett, Michael A. Carcasi, Wallace P. Printz
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Timoshenko beam theory, Bulk modulus, business.industry, Computer science, Extreme ultraviolet lithography, Aspect ratio (image), Finite element method, Contact angle, symbols.namesake, Optics, Resist, Extreme ultraviolet, Euler's formula, symbols, Node (circuits), Aerospace engineering, business, Beam (structure)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::737a5e265fbeafa22ac2736a6560ca85
https://doi.org/10.1117/12.916310