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المؤلفون: Piyush Pathak, Frank E. Gennari, Moutaz Fakhry, Ya-Chieh Lai, Abdullah Yassine, Jeffrey E. Nelson, Jason P. Cain
المصدر: Design-Process-Technology Co-optimization for Manufacturability XIII.
مصطلحات موضوعية: Computer science, media_common.quotation_subject, Volume (computing), Root cause, computer.software_genre, Design for manufacturability, Presentation, Filter (video), Node (circuits), Data mining, Physical design, Root cause analysis, computer, media_common
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f90b1f5fe8ec96d80518acc8324f515c
https://doi.org/10.1117/12.2516571 -
2
المؤلفون: Jason Sweis, Piyush Pathak, Moutaz Fakhry, Jason P. Cain, Frank E. Gennari, Ya-Chieh Lai
المصدر: Design-Process-Technology Co-optimization for Manufacturability XII.
مصطلحات موضوعية: Framingham Risk Score, Process (engineering), Computer science, business.industry, Rank (computer programming), Pattern analysis, Integrated circuit, Machine learning, computer.software_genre, Pattern selection, law.invention, law, Pattern matching, Artificial intelligence, Physical design, business, computer
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::57cf9c5710c64943318d5850a99f8c56
https://doi.org/10.1117/12.2299492 -
3
المؤلفون: Fadi Batarseh, Mohamed Ismail, Uwe Paul Schroeder, Janam Bakshi, Nishant Shah, Jason P. Cain, Ahmed Mohyeldin, Ahmed Mounir Elsemary, Moutaz Fakhry
المصدر: Design-Process-Technology Co-optimization for Manufacturability XII.
مصطلحات موضوعية: Bar (music), Computer science, business.industry, Flow (psychology), 02 engineering and technology, 021001 nanoscience & nanotechnology, 020202 computer hardware & architecture, Design for manufacturability, 0202 electrical engineering, electronic engineering, information engineering, Redundancy (engineering), 0210 nano-technology, business, Lithography, Computer hardware
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f80133cabf9ca3ab15181d9527aac3d2
https://doi.org/10.1117/12.2297499 -
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المؤلفون: Jason Sweis, Jason P. Cain, Piyush Pathak, Moutaz Fakhry, Frank E. Gennari, Ya-Chieh Lai
المصدر: SPIE Proceedings.
مصطلحات موضوعية: business.industry, Computer science, 02 engineering and technology, 021001 nanoscience & nanotechnology, computer.software_genre, Track (rail transport), 01 natural sciences, 010309 optics, Work (electrical), Analytics, Yield risk, 0103 physical sciences, Structural pattern, Data mining, Physical design, 0210 nano-technology, business, computer
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ba8a5323293bec9c2b0b1020f6f313b4
https://doi.org/10.1117/12.2262363 -
5
المؤلفون: Kareem Madkour, Joe Kwan, Jason P. Cain, Wael ElManhawy, Moutaz Fakhry
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Optical image, Computer science, Image processing, 02 engineering and technology, 021001 nanoscience & nanotechnology, computer.software_genre, 01 natural sciences, Transfer function, Design for manufacturability, 010309 optics, 0103 physical sciences, Data mining, 0210 nano-technology, computer, Lithography, Simulation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7ce0947c650331cc862ce7cce752ecce
https://doi.org/10.1117/12.2219506 -
6
المؤلفون: Jassem Abdallah, Moutaz Fakhry, Melih Ozlem, Neal Lafferty, Joy Cheng, Daniel Brue, Topalogu Rasit Onur, Jed W. Pitera, Chi-Chun Liu, Daniel J. Dechene, Azalia A. Krasnoperova, Kafai Lai, Melia Tjio, Gregory S. Doerk, M. Guillorn, Hsinyu Tsai, Anthony Schepis
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Optical proximity correction, Computational lithography, Computer science, law, Component (UML), Wafer, Photolithography, Lithography process, Lithography, Simulation, law.invention, Computational science, Design for manufacturability
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::db451891b7c3cbcacdb57fe8791e4918
https://doi.org/10.1117/12.2046920 -
7
المؤلفون: Moutaz Fakhry, Kafai Lai, Yuri Granik, Kostas Adam
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Resist, business.industry, Real-time computing, Flow (psychology), Process (computing), Production (economics), High capacity, Process variability, Process engineering, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3d623426eee0cd401e650657fb2a7eac
https://doi.org/10.1117/12.898860 -
8
المؤلفون: Byung-Sung Kim, Scott M. Mansfield, Moutaz Fakhry, Gandharv Bhatara, David O. S. Melville, Tadanobu Inoue, Jason E. Meiring, Bruce Durgan, Henning Haffner, Young O. Kim, Alexander Wei, Jaione Tirapu-Azpiroz, Aasutosh Dave, Alexander Tritchkov, Kehan Tian, Masaharu Sakamoto, Alan E. Rosenbluth, Gabriel Berger, Kostas Adam
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Resolution enhancement technologies, Computer engineering, Computer science, law, Real-time computing, Hardware_INTEGRATEDCIRCUITS, Leverage (statistics), Node (circuits), Photolithography, Lithography, law.invention
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::20e4e990a92d7e65fc9d9acdeacea47c
https://doi.org/10.1117/12.879703 -
9
المؤلفون: Young O. Kim, Emily Gallagher, Yuri Granik, Kafai Lai, Daniele Paolo Scarpazza, Nick Cobb, Tom Faure, Lei Zhuang, Saeed Bagheri, Alan E. Rosenbluth, Greg McIntyre, Laszlo Ladanyi, Andreas Waechter, Geoffrey W. Burr, Moutaz Fakhry, Michael Lam, Francisco Barahona, Jason E. Meiring, Kehan Tian, David O. S. Melville, Aasutosh Dave, Phil Strenski, Jon Lee, Jaione Tirapu-Azpiroz, Alexander Tritchkov, Hidemasa Muta, Masaharu Sakamoto, Tadanobu Inoue, Azalia A. Krasnoperova, Gabriel Berger, Alfred Wagner, Kostas Adam, Mike Hibbs, Daniel Corliss, Scott Halle
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Reduction (complexity), Optics, Optical proximity correction, business.industry, Computer science, law, Electronic engineering, Off-axis illumination, Surface finish, Photolithography, business, Lithography, law.invention
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8973f93c622631fa266efeaff0ea8024
https://doi.org/10.1117/12.846716 -
10
المؤلفون: A. Seoud, H. Maaty, Moutaz Fakhry
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Optical proximity correction, Mathematical model, Iterative method, business.industry, Process window, Node (circuits), Process variable, Focus (optics), business, Measure (mathematics), Algorithm
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a11d8b21de0dfeb56d2fac64e372d89a
https://doi.org/10.1117/12.829714