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1
المؤلفون: F. Ferrieu, Olivier Joubert, Bernard Drevillon, L. Vallier, S. Vallon, N. Blayo
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 15:865-870
مصطلحات موضوعية: Materials science, business.industry, Surfaces and Interfaces, Plasma, Integrated circuit, Condensed Matter Physics, medicine.disease_cause, Signature (logic), Surfaces, Coatings and Films, law.invention, Optics, Etching (microfabrication), Ellipsometry, law, medicine, Optoelectronics, Plasma diagnostics, business, Layer (electronics), Ultraviolet
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2
المؤلفون: N. Blayo, B. Drevillon
المصدر: Surface Science. 260:37-43
مصطلحات موضوعية: Amorphous silicon, Materials science, Hydrogen, Infrared, Analytical chemistry, Oxide, chemistry.chemical_element, Surfaces and Interfaces, Condensed Matter Physics, Surfaces, Coatings and Films, chemistry.chemical_compound, chemistry, Ellipsometry, Phase (matter), Materials Chemistry, Reactivity (chemistry), Layer (electronics)
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3
المؤلفون: N. Blayo, B. Drevillon, P. Blom
المصدر: Physica B: Condensed Matter. 170:566-570
مصطلحات موضوعية: Amorphous silicon, Materials science, Hydrogen, Infrared, business.industry, Hydrogen bond, Analytical chemistry, chemistry.chemical_element, Plasma, Substrate (electronics), Condensed Matter Physics, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Optics, chemistry, Ellipsometry, Phase (matter), Electrical and Electronic Engineering, business
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4
المؤلفون: N Blayo, J Huc, Bernard Drevillon
المصدر: Vacuum. 41:1343-1346
مصطلحات موضوعية: In situ, Amorphous semiconductors, Materials science, Infrared, Ellipsometry, Monolayer, Analytical chemistry, Substrate (electronics), Thin film, Condensed Matter Physics, Instrumentation, Surfaces, Coatings and Films, In situ study
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5
المؤلفون: A. Mayeux, Bernard Drevillon, B. Delahaye, Razvigor Ossikovski, M. Firon, N. Blayo
المصدر: Applied Physics Letters. 65:1236-1238
مصطلحات موضوعية: Materials science, Physics and Astronomy (miscellaneous), chemistry, Infrared, Ellipsometry, Analytical chemistry, chemistry.chemical_element, Infrared spectroscopy, Wafer, Chemical vapor deposition, Thin film, Boron, Borophosphosilicate glass
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6
المؤلفون: N. Blayo, B. Drévillon
المصدر: Applied Physics Letters. 57:786-788
مصطلحات موضوعية: Amorphous silicon, Materials science, Physics and Astronomy (miscellaneous), Silicon, Analytical chemistry, chemistry.chemical_element, Mineralogy, Substrate (electronics), Chemical vapor deposition, Amorphous solid, chemistry.chemical_compound, chemistry, Ellipsometry, Thin film, Boron
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7
المؤلفون: N. Blayo, Bernard Drevillon
المصدر: MRS Proceedings. 237
مصطلحات موضوعية: Amorphous silicon, chemistry.chemical_compound, Materials science, Microcrystalline, chemistry, Hydrogen, Ellipsometry, Phase (matter), Analytical chemistry, chemistry.chemical_element, Deposition (law), Overlayer, Amorphous solid
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8
المؤلفون: D. E. Ibbotson, I. Tepermeister, F.P. Klemens, William M. Mansfield, Jaesik Lee, N. Blayo
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14:3283
مصطلحات موضوعية: Plasma etching, Materials science, business.industry, General Engineering, Analytical chemistry, Titanium nitride, chemistry.chemical_compound, Helicon, chemistry, Gate oxide, Ellipsometry, Etching (microfabrication), Optoelectronics, Plasma diagnostics, Reactive-ion etching, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d2ee20e513064b6431be26b6fc27acb0
https://doi.org/10.1116/1.588821 -
9
المؤلفون: N. Blayo, F. P. Klemens, R. A. Cirelli, J. T. C. Lee
المصدر: Journal of the Optical Society of America A. 12:591
مصطلحات موضوعية: Fabrication, Plasma etching, Materials science, business.industry, Scanning electron microscope, Nanotechnology, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Metrology, Optics, Ellipsometry, Microelectronics, Wafer, Computer Vision and Pattern Recognition, business, Plasma processing
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9d20a428bdbfc48dcb2be661ccdc862c
https://doi.org/10.1364/josaa.12.000591 -
10
المؤلفون: J. T. C. Lee, D. E. Ibbotson, N. Blayo, H. H. Sawin, R. A. Gottscho, I. Tepermeister, F. P. Klemens
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 12:2310
مصطلحات موضوعية: Silicon, Chemistry, business.industry, General Engineering, Analytical chemistry, chemistry.chemical_element, Plasma, Electron cyclotron resonance, Helicon, Etching (microfabrication), Optoelectronics, Inductively coupled plasma, Reactive-ion etching, business, Plasma stability
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3c9200f9773ce00db82d1649f6687228
https://doi.org/10.1116/1.587758