المؤلفون: A. Beverina, V. Huard, N. Emonet, R. Velard, J.-P. Carrere, Sébastien Petitdidier, I. Guilmeau, F. Guyader

المصدر: Solid State Phenomena. 92:235-238

مصطلحات موضوعية: chemistry.chemical_compound, Materials science, Resist, chemistry, Etching (microfabrication), business.industry, Oxide, Optoelectronics, General Materials Science, Condensed Matter Physics, Dual gate, business, Atomic and Molecular Physics, and Optics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8ed3b5f673608a560cddedbc21066993
https://doi.org/10.4028/www.scientific.net/ssp.92.235

المؤلفون: M. T. Leccia, Marie-Jeanne Richard, Jean-Claude Beani, N. Emonet, Alain Favier

المصدر: Journal of Photochemistry and Photobiology B: Biology. 40:84-90

مصطلحات موضوعية: Cell Survival, Ultraviolet Rays, Biophysics, chemistry.chemical_element, Radiation-Protective Agents, Human skin, Thiophenes, Citiolone, Pharmacology, Antioxidants, chemistry.chemical_compound, Sodium Selenite, Humans, Radiology, Nuclear Medicine and imaging, Cysteine, Surgery, Plastic, Cells, Cultured, Skin, chemistry.chemical_classification, Radiation, Radiological and Ultrasound Technology, biology, Dose-Response Relationship, Radiation, Glutathione, Fibroblasts, Acetylcysteine, Pyrrolidonecarboxylic Acid, Thiazoles, chemistry, Biochemistry, Thiol, biology.protein, Thiazolidines, Female, Selenium, Intracellular, Peroxidase

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c94a89c3f1c083156aed2239325671e3
https://doi.org/10.1016/s1011-1344(97)00041-9

المؤلفون: J. Bienacel, Kathy Barla, D. Roy, M. Bidaud, L. Vishnubhotla, N. Emonet, D. Barge, I. Pouilloux

المصدر: Materials Science in Semiconductor Processing. 7:181-183

مصطلحات موضوعية: Materials science, business.industry, Mechanical Engineering, Gate dielectric, Oxide, Dielectric, Condensed Matter Physics, Capacitance, chemistry.chemical_compound, chemistry, X-ray photoelectron spectroscopy, Mechanics of Materials, Gate oxide, Optoelectronics, General Materials Science, business, NMOS logic, Nitriding

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a76648bfcbc2be3991a6dce859fa179a
https://doi.org/10.1016/j.mssp.2004.09.014

المؤلفون: H. Del-Puppo, F. Lalanne, Bruce Boeck, N. Emonet, Audrey Berthelot, Christian Caillat, Vincent Huard, S. Barnola

المصدر: 2006 European Solid-State Device Research Conference.

مصطلحات موضوعية: Materials science, business.industry, chemistry.chemical_element, Equivalent oxide thickness, eDRAM, law.invention, Capacitor, Atomic layer deposition, chemistry, law, Electronic engineering, Optoelectronics, Leakage current density, business, Tin, Current density, Dram

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f5dd5f2ffa69bc67ebf422857863e427
https://doi.org/10.1109/essder.2006.307708

المؤلفون: S. Jullian, D. Delille, Yves Morand, R. Pantel, T. Farjot, V. Carron, C. Laviron, Florian Cacho, Benoit Froment, D. Bensahel, Abdelkader Souifi, D. Aime, N. Emonet, Aomar Halimaoui, Marc Juhel, R. Molins, Francois Wacquant, S. Descombes

المساهمون: STMicroelectronics [Crolles] (ST-CROLLES), Laboratoire de physique de la matière (LPM), Institut National des Sciences Appliquées de Lyon (INSA Lyon), Institut National des Sciences Appliquées (INSA)-Université de Lyon-Institut National des Sciences Appliquées (INSA)-Université de Lyon-Centre National de la Recherche Scientifique (CNRS), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Philips France Semiconducteurs, Centre des Matériaux (MAT), MINES ParisTech - École nationale supérieure des mines de Paris, Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Centre National de la Recherche Scientifique (CNRS), Université de Lyon-Institut National des Sciences Appliquées (INSA)-Université de Lyon-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS), Centre des Matériaux (CDM), Mines Paris - PSL (École nationale supérieure des mines de Paris)

المصدر: Scopus-Elsevier
Thermal, Mechanical and Multi-Physics Simulation and Experiments in Micro-Electronics and Micro-Systems, 2005. EuroSimE 2005.
Electron Devices Meeting, 2004. IEDM Technical Digest
Electron Devices Meeting, 2004. IEDM Technical Digest, 2004, pp.87-90, ⟨10.1109/IEDM.2004.1419073⟩

مصطلحات موضوعية: Materials science, Annealing (metallurgy), nickel compounds, doping, work function, 02 engineering and technology, Dielectric, interface structure, 01 natural sciences, chemistry.chemical_compound, Back end of line, thermal stresses, transmission electron microscopy, 0103 physical sciences, Silicide, Electronic engineering, Work function, 010302 applied physics, Dopant, business.industry, Doping, silicon, CMOS integrated circuits, 021001 nanoscience & nanotechnology, chemistry, CMOS, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], Optoelectronics, 0210 nano-technology, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2a8c5bd6cf15c0b77728d2e626b67fee
https://doi.org/10.1109/iedm.2004.1419073

المؤلفون: Nathalie Revil, N. Emonet, P. Llinares, R. Difrenza, M. Denais, Roland Pantel, M. Woo, Vincent Huard, Kathy Barla, J. C. Vildeuil, H. Brut, C. Parthasarthy, M. Bidaud, P. Stolk, Franck Arnaud, David Roy, F. Guyader, K. Rochereau, L. Vishnubotla, D. Barge, Nicolas Planes, Sylvie Bruyere, B. Tavel

المصدر: IEEE International Electron Devices Meeting 2003.

مصطلحات موضوعية: Materials science, business.industry, Gate dielectric, Electrical engineering, Mixed-signal integrated circuit, Hardware_PERFORMANCEANDRELIABILITY, Plasma, Nitride, CMOS, Gate oxide, Dynamic demand, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, business, Hardware_LOGICDESIGN, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::03aa453ac845d0b6280656c92b037bfe
https://doi.org/10.1109/iedm.2003.1269363

المؤلفون: P.O. Sassoulas, Francois Wacquant, J. Todeschini, M. Woo, M. Charpin, Y. Laplanche, N. Revil, J.C. Oberlin, Roland Pantel, B. Hinschberger, O. Belmont, D. Neira, P. Stolk, Franck Arnaud, M. Broekaart, Frederic Boeuf, I. Guilmeau, D. Ceccarelli, Francois Leverd, N. Emonet, Damien Lenoble, Bertrand Borot, G. Imbert, N. Bicais, S. Delmedico, A. Sicard, Nicolas Planes, J. Farkas, Christophe Regnier, V. Vachellerie, J. Uginet, Chittoor Parthasarathy, E. Denis, V. DeJonghe, Pierre Morin, T. Devoivre, H. Brut, R. Palla, Laurent Pain, P. Vannier, F. Salvetti, A. Beverina, C. Perrot

المصدر: 2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407).

مصطلحات موضوعية: Bit cell, Materials science, business.industry, Transistor, Electrical engineering, Low-k dielectric, law.invention, CMOS, law, Gate oxide, MOSFET, Optoelectronics, Photolithography, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f57f1b2bcd5199626774a2f09c78af07
https://doi.org/10.1109/vlsit.2003.1221088

المؤلفون: M. Denais, J. Todeschini, R.A. Bianchi, Damien Lenoble, Laurent Pain, Y. Laplanche, Franck Arnaud, H. Brut, M. Broekaart, Nicolas Planes, V. Vachellerie, M. Woo, A. Beverina, Pierre Morin, R. Difrenza, Bertrand Borot, C. Perrot, H. Leninger, Francois Wacquant, D. Barge, David Roy, F. Salvetti, D. Ceccarelli, N. Emonet, V. DeJonghe, P. Stolk, B. Tavel, B. Duriez, L. Vishnobulta, I. Guilmeau, Y. Loquet, Frederic Boeuf, T. Devoivre, N. Bicais, J.P. Reynard, M. Jurdit, K. Rochereau, R. Palla, F. Judong, M. Bidaud, P. Vannier, D. Reber

المصدر: Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004..

مصطلحات موضوعية: Physics, business.industry, Transistor, Electrical engineering, Strained silicon, Power (physics), PMOS logic, law.invention, General purpose, CMOS, law, Optoelectronics, business, NMOS logic, Voltage

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4ab775f921dd2f959ddab925ffe69424
https://doi.org/10.1109/vlsit.2004.1345363

المؤلفون: N. Emonet, S. Jullian, Frederic Boeuf, C. Perrot, F. Payet, J. M. Hartmann, C. Laviron, Y. Campidelli, Pierre Morin, Francois Leverd, N. Villani, V. Carron, O. Kermarrec, N. Casanova, Thomas Skotnicki, D. Bensahel, Franck Arnaud

المصدر: Extended Abstracts of the 2004 International Conference on Solid State Devices and Materials.

مصطلحات موضوعية: Materials science, CMOS, business.industry, Node (networking), Cost approach, business, Computer network

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3a96a09ddb2e50121367766f24014d52
https://doi.org/10.7567/ssdm.2004.a-1-5

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