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المؤلفون: Jochem Janssen, Andrey Ushakov, Han Velthuis, N.B. Koster
المصدر: IEEE Transactions on Plasma Science. 49:770-775
مصطلحات موضوعية: Nuclear and High Energy Physics, Brightness, Liquid metal, Materials science, business.industry, chemistry.chemical_element, Condensed Matter Physics, 01 natural sciences, 010305 fluids & plasmas, Anode, Semiconductor, chemistry, Beamline, 0103 physical sciences, Electrode, Cathode ray, Optoelectronics, Tin, business
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المؤلفون: Matthew P. Maniscalco, A. Gattuso, Rob Ebeling, N.B. Koster, Charles Lasnier, Peter Verhoeff, Ray O’Neill, Russell Feder, M. Smith, B. C. Stratton, Chien-Ching Wu, Andrey Ushakov, Ad Verlaan
المصدر: Fusion Engineering and Design. 146:1559-1563
مصطلحات موضوعية: Materials science, Plasma cleaning, business.industry, Mechanical Engineering, chemistry.chemical_element, Plasma, Ion, Nuclear Energy and Engineering, chemistry, Molybdenum, Sputtering, Service life, Electrode, Optoelectronics, General Materials Science, business, Deposition (law), Civil and Structural Engineering
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المؤلفون: Jos van der List, André Rijfers, Matthew P. Maniscalco, Russell Feder, M. Smith, Ad Verlaan, Charles Lasnier, B. C. Stratton, Rob Ebeling, Andrey Ushakov, Ray O’Neill, N.B. Koster, Peter Verhoeff, A. Gattuso
المصدر: Fusion Engineering and Design. 136:431-437
مصطلحات موضوعية: Materials science, business.industry, Mechanical Engineering, chemistry.chemical_element, Plasma, Tungsten, 01 natural sciences, 010305 fluids & plasmas, Electric discharge in gases, Neon, Nuclear Energy and Engineering, chemistry, Sputtering, 0103 physical sciences, Surface roughness, Optoelectronics, General Materials Science, Beryllium, 010306 general physics, business, Helium, Civil and Structural Engineering
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المؤلفون: J.F.M. van der List, Rob Ebeling, Andrey Ushakov, Peter Verhoeff, Matthew P. Maniscalco, A. Rijfers, N.B. Koster, Russell Feder, C.J. Lasnier, Ad Verlaan, A. Gattuso, R.C. O'Neill, B. C. Stratton, M. Smith
المصدر: Fusion Engineering and Design. 131:54-60
مصطلحات موضوعية: Materials science, Plasma cleaning, business.industry, Mechanical Engineering, chemistry.chemical_element, Contamination, Tungsten, 01 natural sciences, 010305 fluids & plasmas, Electric discharge in gases, Nuclear Energy and Engineering, chemistry, Sputtering, Mockup, 0103 physical sciences, Optoelectronics, General Materials Science, Beryllium, 010306 general physics, business, Helium, Civil and Structural Engineering
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المؤلفون: T.C. van den Dool, Hamed Sadeghian, N.B. Koster, R.W. Herfst, M. Eschen, W.A. Klop
المصدر: Measurement. 56:104-116
مصطلحات موضوعية: Microelectromechanical systems, Nanoelectromechanical systems, Cantilever, Materials science, business.industry, Applied Mathematics, System of measurement, Detector, Bandwidth (signal processing), Condensed Matter Physics, Metrology, Scanning probe microscopy, Optics, Electronic engineering, Electrical and Electronic Engineering, business, Instrumentation
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المؤلفون: B.A.H. Nijland, Wouter Mulckhuyse, Peter Kerkhof, P.M. Muilwijk, F.T. Molkenboer, N.B. Koster, Alex Deutz, Edwin te Sligte, Michel van Putten, Peter van der Walle
المصدر: Takehisa, K., XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, Photomask Japan 2017, 5-7 April 2017, 10454
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technologyمصطلحات موضوعية: Scanner, Materials science, Extreme ultraviolet lithography, NI - Nano Instrumentation, High Tech Systems & Materials, Metrology, 7. Clean energy, law.invention, Optics, law, Reticle, EUV exposure, Spectral purity, TS - Technical Sciences, Pellicle, XPS analysis, Industrial Innovation, Mask, business.industry, Handling, Photodiode, Beamline, Extreme ultraviolet, Optoelectronics, Nano Technology, Contamination control, Electronics, business
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3a97063b25f5c85bb8423021635d62f2
http://resolver.tudelft.nl/uuid:7641b841-befc-459d-9944-8b7feffcaf10 -
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المؤلفون: N.B. Koster, Alex Deutz, Joost Westerhout, P. van der Walle, E. te Sligte, F.T. Molkenboer, Wouter Mulckhuyse, Bastiaan Oostdijck, P.M. Muilwijk, M. van Putten, Peter Kerkhof
المصدر: Itani, T.Ronse, K.G.Gargini, P.A.Naulleau, P.P., International Conference on Extreme Ultraviolet Lithography 2017, 11-14 September 2017, 10450
International Conference on Extreme Ultraviolet Lithography 2017مصطلحات موضوعية: Scanner, Surface analysis, X-ray photoelectron spectroscopy, Materials science, Extreme ultraviolet lithography, NI - Nano Instrumentation, High Tech Systems & Materials, 02 engineering and technology, Metrology, 01 natural sciences, Optics, Physics & Electronics, 0103 physical sciences, Position control, EUV exposure, 010302 applied physics, Contamination control, TS - Technical Sciences, Pellicle, XPS analysis, Industrial Innovation, business.industry, Handling, Measurements, Masks, 021001 nanoscience & nanotechnology, Characterization (materials science), Beamline, Units of measurement, Photomask, 0210 nano-technology, business
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d2f1960d0e3d7f4b278ed3ab68fc6e44
http://resolver.tudelft.nl/uuid:c01595be-12c1-4be2-8dbf-f7d89e4650a7 -
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المؤلفون: R. Verberk, N.B. Koster, E. te Sligte, W.P.M. Staring
المصدر: 33rd European Mask and Lithography Conference
Finders, J.Behringer, U.F.W., 33rd European Mask and Lithography Conference, EMLC 2017, 26-28 June 2017, Dresden, Germany, 10446مصطلحات موضوعية: Scanner, Engineering, EUV reticle, Extreme ultraviolet lithography, NI - Nano Instrumentation, Optical instruments, 02 engineering and technology, 01 natural sciences, EUV mask infra structure, 010309 optics, Optics, Acceptance testing, 0103 physical sciences, Stages, Reticle, Electronics, Aerospace engineering, Acceptance tests, Optical tomography, Infra-structure, TS - Technical Sciences, Contamination control, Pellicle, Industrial Innovation, business.industry, Inspection, Masks, First light, 021001 nanoscience & nanotechnology, Resist, Nano Technology, 0210 nano-technology, business, Optics lifetime
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::26164f2db26ad672524575148daa5e21
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المؤلفون: Edwin te Sligte, Michel van Putten, Peter Kerkhof, F.T. Molkenboer, Wouter Mulckhuyse, A.M. Hoogstrate, Christiaan Hollemans, B.A.H. Nijland, N.B. Koster, P.M. Muilwijk, Bastiaan Oostdijck, Alex Deutz, Peter van der Walle
المصدر: Photomask Technology 2016
مصطلحات موضوعية: Engineering, business.industry, Extreme ultraviolet lithography, Environment controlled, 02 engineering and technology, Radiation, 021001 nanoscience & nanotechnology, 01 natural sciences, Power (physics), 010309 optics, Optics, Beamline, Extreme ultraviolet, 0103 physical sciences, Reticle, Electronics, 0210 nano-technology, business, Simulation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bcb9d854c23757af8bd42f90ab78f854
https://doi.org/10.1117/12.2240921 -
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المؤلفون: F.T. Molkenboer, N.B. Koster, Alex Deutz, Edwin te Sligte
المصدر: Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Sample (graphics), 010309 optics, Optics, Beamline, X-ray photoelectron spectroscopy, Ellipsometry, 0103 physical sciences, Irradiation, Photomask, 0210 nano-technology, business, Intensity (heat transfer)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0d83f962c4198572630ac08f5b8cd650
https://doi.org/10.1117/12.2240302