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المؤلفون: Zhengkai Yang, Zhenyu Yang, Yuan Tao, Wuping Wang, Chun Shao, Saeki Hodaka, Yuanzhao Ma, Naruo Sakasai, Morita Takayuki
المصدر: 2016 China Semiconductor Technology International Conference (CSTIC).
مصطلحات موضوعية: Engineering, Scanner, business.industry, Process (computing), 02 engineering and technology, 021001 nanoscience & nanotechnology, Optimal control, 01 natural sciences, 010309 optics, Controllability, Software, 0103 physical sciences, Electronic engineering, Process control, Node (circuits), 0210 nano-technology, business, Critical dimension
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a80934943f332bee6a6d686b3384bb24
https://doi.org/10.1109/cstic.2016.7463976 -
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المؤلفون: Ryoko Nakasone, Tsuyoshi Toki, Akira Tokui, Junichi Kosugi, Tomoharu Fujiwara, Toshio Ohashi, Rika Tanaka, Maki Sato, Daishi Tanaka, Naruo Sakasai
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Scanner, Materials science, Optics, Resist, Semiconductor device fabrication, business.industry, Flatness (systems theory), Reticle, Multiple patterning, Process control, Process window, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6498f4016b6a8a161ce3ba3eee343d80
https://doi.org/10.1117/12.916227 -
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المؤلفون: Eiji Tsujimoto, Kei Mesuda, Katsuya Hayano, Hideyoshi Takamizawa, Shintaro Kudo, Toshio Ohhashi, Naruo Sakasai, Tomoyuki Matsuyama, Hiroshi Watanabe
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Scanner, Materials science, Optics, business.industry, Wafer, Performance improvement, business, Lithography, Exposure latitude, 3d topography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::97b9ff0f1b416b26e618d7fe54d6a3c3
https://doi.org/10.1117/12.899910 -
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المؤلفون: Shintaro Kudo, Kei Mesuda, Tomoyuki Matsuyama, Hiroshi Watanabe, Katsuya Hayano, Toshio Ohhashi, Eiji Tsujimoto, Naruo Sakasai, Hideyoshi Takamizawa
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Leading edge, Scanner, Engineering, Resolution enhancement technologies, Optics, business.industry, Head to head, business, Refractive index, Lithography, Exposure latitude, Blank
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::92fb18e55cdff9e43651b6c83b77f178
https://doi.org/10.1117/12.899909 -
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المؤلفون: Tomoharu Fujiwara, Tomohiko Susa, Junichi Kosugi, Naruo Sakasai, Daishi Tanaka, Akira Tokui, Tsuyoshi Toki
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Scanner, Materials science, Post exposure, Key factors, Optics, business.industry, Reticle, Process control, Wafer, Optimal control, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a48b311ee60426680a8ccd8cdb7c23f6
https://doi.org/10.1117/12.879348 -
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المؤلفون: Daniel Kandel, Tsuyoshi Toki, Keiko Saotome, Naruo Sakasai, John C. Robinson, Kazuaki Suzuki, Junichi Kosugi, Yuji Koyanagi, Pavel Izikson
المصدر: Proceeding of SPIE. 7640
مصطلحات موضوعية: Physics, Spectrum analyzer, Scanner, business.industry, Metrology, law.invention, Optics, law, Immersion (virtual reality), Process control, Wafer, Photolithography, Focus (optics), business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4ad6babc8cc732d53820ef162d8b320b
http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100818184