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المؤلفون: Nassim Halli, Frederic Robert, Jordan Belissard, Thiago Figueiro, Nivea Schuch, Mohamed Abaidi, Charles Valade, Alexandre Moly
المصدر: Photomask Technology 2021.
مصطلحات موضوعية: Optical proximity correction, business.industry, Image quality, Computer science, Calibration, Process (computing), Process control, Computer vision, Artificial intelligence, Focus (optics), business, Critical dimension, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::69aa3fdcbcdc9edf6883bcdf33976418
https://doi.org/10.1117/12.2601081 -
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المؤلفون: Patrick Schiavone, Jonathan Pradelles, Thiago Figueiro, Jessy Bustos, Mohamed Abaidi, Jordan Belissard, Nivea Schuch, Matthieu Milléquant, Estelle Guyez, L. Perraud, Sébastien Bérard-Bergery, Aurélie Le Pennec, Aurélien Fay, Jean-Baptiste Henry, E. Sezestre
المساهمون: Minatec
المصدر: Proc. SPIE
SPIE Advanced Lithography
SPIE Advanced Lithography, Feb 2021, Online Only, France. pp.30, ⟨10.1117/12.2583843⟩مصطلحات موضوعية: Curvilinear coordinates, Computer science, Figure of merit, Context (language use), Sensitivity (control systems), Noise (video), Surface finish, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Algorithm, Lithography, Edge detection, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f428faf8e482054b9e9294453cc00305
https://hal.archives-ouvertes.fr/hal-03156564 -
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المساهمون: Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, Feb 2021, Online Only, France. pp.115, ⟨10.1117/12.2584617⟩مصطلحات موضوعية: Engineering drawing, Exploit, Standardization, Computer science, business.industry, Metrology, Key (cryptography), Process control, Photonics, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, business, Critical dimension, Lithography, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::42946132a8c15301fe1cdbbca85edfe6
https://hal.archives-ouvertes.fr/hal-03156573 -
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المؤلفون: Francois Weisbuch, Jirka Schatz, Thiago Figueiro, Nivea Schuch, Sylvio Mattick, Patrick Schiavone
المساهمون: Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
SPIE Advanced Lithography
SPIE Advanced Lithography, Feb 2021, Online Only, France. ⟨10.1117/12.2583715⟩مصطلحات موضوعية: Matching (statistics), Computer science, business.industry, matching, Experimental data, Pattern recognition, critical dimension, Metrology, contour metrology, metrology, Metric (mathematics), SEM, Calibration, Measurement uncertainty, contour, Multiple edges, Artificial intelligence, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, business, Critical dimension
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5148f1883f7f54b2a8138f2ad56a2031
https://hal.science/hal-03156583 -
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المؤلفون: Thiago Figueiro, Patrick Schiavone, Charles Valade, B. Le-Gratiet, Nivea Schuch, Stéphanie Audran, J. Ducote, C. Gardin, Matthieu Milléquant, R. Bouyssou, Alain Ostrovsky, Jordan Belissard
المساهمون: Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, Feb 2021, Online Only, France. pp.29, ⟨10.1117/12.2584364⟩مصطلحات موضوعية: Basis (linear algebra), business.industry, Computer science, Image processing, Overlay, Image (mathematics), Metrology, Metric (mathematics), Line (geometry), Computer vision, Artificial intelligence, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, business, Critical dimension, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3d618cd1dedb2c85efa6fd9c45b43c5d
https://hal.archives-ouvertes.fr/hal-03156590 -
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المؤلفون: R. Bouyssou, J. Ducote, B. Le-Gratiet, Alain Ostrovsky, Paolo Petroni, Charlotte Beylier, Vincent Annezo, Matthieu Milléquant, C. Gardin, L. Schneider, Thiago Figueiro, Patrick Schiavone, Nivea Schuch
المساهمون: STMicroelectronics [Crolles] (ST-CROLLES), Aselta-nanographics [Grenoble], Minatec, Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)
المصدر: Proceedings SPIE Volume 11325
Metrology, Inspection, and Process Control for Microlithography XXXIV
Metrology, Inspection, and Process Control for Microlithography XXXIV, Feb 2020, San Jose, United States. pp.3, ⟨10.1117/12.2551907⟩مصطلحات موضوعية: Coupling, Computer science, Rounding, Process (computing), 02 engineering and technology, Measure (mathematics), 030218 nuclear medicine & medical imaging, Image (mathematics), Metrology, 03 medical and health sciences, 020210 optoelectronics & photonics, 0302 clinical medicine, 0202 electrical engineering, electronic engineering, information engineering, Key (cryptography), Standard algorithms, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Algorithm, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::13ae227f5f46b56000f77b09b27ff4f9
https://hal.archives-ouvertes.fr/hal-03093860 -
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المؤلفون: Andre I. Reis, Renato P. Ribas, Nivea Schuch, Vinicius Dal Bem
المصدر: ECS Transactions. 23:421-428
مصطلحات موضوعية: AND-OR-Invert, CMOS, Pass transistor logic, Computer science, Logic gate, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Logic family, Equivalent circuit, Hardware_PERFORMANCEANDRELIABILITY, Hardware_LOGICDESIGN, Electronic circuit, PMOS logic
