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1
المؤلفون: Yu Zhang, David Wei Zhang, Yuyang Bian, Biqiu Liu, Cong Zhang, Jun Huang, Jiawang Song, Yang Gao, Qiang Zhou, Wei Chen, Siqun Xiao, Shmuel Ben Nissim, Kevin Houchens, Omri Baum, Amit Zakay, Tal Ayzik, Yaniv Abramovitz
المصدر: Journal of Micro/Nanopatterning, Materials, and Metrology. 21
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::132931604fa8372bd4ac7cc9d438b449
https://doi.org/10.1117/1.jmm.21.4.041605 -
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المؤلفون: Yuyang Bian, Biqiu Liu, Xijun Guan, Xiaobo Guo, Cong Zhang, Wenzhan Zhou, Jun Huang, Yu Zhang, Jiawang Song, Yang Gao, Shmuel Nissim, Kevin Houchens, Omri Baum, Qiang Zhou, Zaisan Yang, Amit Zakay, Tal Ayzik, Yaniv Abramovitz
المصدر: Metrology, Inspection, and Process Control XXXVI.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a5cda6b86bb61fe7eb7eee181d776b72
https://doi.org/10.1117/12.2614221 -
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المؤلفون: Yu Zhang, Yuyang Bian, Yaniv Abramovitz, Yifei Zhu, Omri Baum, Alexander Vipolzov, Qiang Zhou, Biqiu Liu, Song Gao, Shmuel Ben Nissim, Cong Zhang, Uri Smolyan, Jun Huang, Xiaobo Guo
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
مصطلحات موضوعية: Accuracy and precision, Sampling (signal processing), Computer science, Line (geometry), Electronic engineering, Process (computing), Node (circuits), Overlay, Critical dimension, Die (integrated circuit)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d7038abbb89ac80e8855e45f742b2d35
https://doi.org/10.1117/12.2585391 -
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المؤلفون: Felix Levitov, Paz Yabbo, Brad Austin, Omri Baum, Nathaniel Mowell, Jennifer Church, DukKyun Moon, Uri Smolyan, Alex Joseph Varghese, Teresa A. Esposito, Luciana Meli
المصدر: 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
مصطلحات موضوعية: Computer science, Extreme ultraviolet lithography, Process (computing), 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Characterization (materials science), Reliability engineering, 010309 optics, 0103 physical sciences, 0210 nano-technology, Focus (optics), Reduction (mathematics), Throughput (business)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::94cd6620cec7a30ee0b9b7e357112241
https://doi.org/10.1109/asmc51741.2021.9435687 -
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المؤلفون: Kevin Houchens, Tal Itzkovich, Omri Baum, Noam Amit, Aner Avakrat, Shimon Levi
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII.
مصطلحات موضوعية: Optics, Materials science, Margin (machine learning), business.industry, Distortion, Extreme ultraviolet lithography, Outlier, Surface finish, Edge (geometry), business, Lithography, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bf953e8414063b23319b692f9ce3d5c9
https://doi.org/10.1117/12.2514877