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المؤلفون: Heui-Seung Lee, Kyong-Jin Hwang, Sung-Hyung Park, Jung-Eun Lim, In-Shik Han, Ook-Sang You, Won-Ho Choi, Hee-Hwan Ji, Hi-Deok Lee, Dae-Byung Kim
المصدر: IEEE Transactions on Electron Devices. 55:1352-1358
مصطلحات موضوعية: Stress (mechanics), Compressive strength, Negative-bias temperature instability, Materials science, Ultimate tensile strength, Stress–strain curve, Electronic engineering, Strained silicon, Electrical and Electronic Engineering, Composite material, NMOS logic, Electronic, Optical and Magnetic Materials, PMOS logic
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المؤلفون: Sung-Hyung Park, Heui-Seung Lee, Hee-Hwan Ji, Hi-Deok Lee, Tae-Gyu Goo, Ook-Sang You, In-Shik Han, Won-Ho Choi, Young-Seok Kang, Dae-Byung Kim
المصدر: Journal of the Korean Institute of Electrical and Electronic Material Engineers. 20:569-574
مصطلحات موضوعية: Stress (mechanics), chemistry.chemical_compound, Materials science, chemistry, Gate oxide, Oxide, Analytical chemistry, Degradation (geology), chemistry.chemical_element, Plasma, Nitrogen, Capacitance, Nitriding
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3854d705ab96c3bb172d8b865accbc09
https://doi.org/10.4313/jkem.2007.20.7.569 -
3
المؤلفون: Won-Ho Choi, Min-Ki Na, Tae-Gyu Goo, Dae-Byung Kim, Hee-Hwan Ji, Yong-Goo Kim, Hi-Deok Lee, Young-Seok Kang, Ga-Won Lee, Heui-Seung Lee, Ook-Sang You, In-Shik Han, Sung-Hyung Park
المصدر: Extended Abstracts of the 2007 International Conference on Solid State Devices and Materials.
مصطلحات موضوعية: chemistry.chemical_compound, Recovery effect, Materials science, Chemical engineering, chemistry, Oxide, Degradation (geology), Plasma, Nanoscopic scale, Nitriding
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bbcad02fada2fce9f9e32d88c145e480
https://doi.org/10.7567/ssdm.2007.p-3-14 -
4
المؤلفون: In-Shik Han, Won-Ho Choi, Dae M. Kim, Hee-Hwan Ji, Hi-Deok Lee, Bomsoo Kim, Tae-Gyu Goo, Ook-Sang You, Chang-Ki Baek, Younghwan Son
المصدر: 2006 IEEE Nanotechnology Materials and Devices Conference.
مصطلحات موضوعية: chemistry.chemical_compound, Materials science, chemistry, Nanoelectronics, Gate oxide, MOSFET, Analytical chemistry, Oxide, Remote plasma, chemistry.chemical_element, Nanoscopic scale, Nitrogen, Nitriding
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0d7573dd2b9a3026aad1f8dbb91d6517
https://doi.org/10.1109/nmdc.2006.4388878 -
5دورية أكاديمية
المؤلفون: In-Shik Han, Hee-Hwan Ji, Ook-Sang You, Won-Ho Choi, Jung-Eun Lim, Kyong-Jin Hwang, Sung-Hyung Park, Heui-Seung Lee, Dae-Byung Kim, Hi-Deok Lee
المصدر: IEEE Transactions on Electron Devices; Jun2008, Vol. 55 Issue 6, p1352-1358, 7p