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المؤلفون: Patrick Schiavone, Jonathan Pradelles, Thiago Figueiro, Jessy Bustos, Mohamed Abaidi, Jordan Belissard, Nivea Schuch, Matthieu Milléquant, Estelle Guyez, L. Perraud, Sébastien Bérard-Bergery, Aurélie Le Pennec, Aurélien Fay, Jean-Baptiste Henry, E. Sezestre
المساهمون: Minatec
المصدر: Proc. SPIE
SPIE Advanced Lithography
SPIE Advanced Lithography, Feb 2021, Online Only, France. pp.30, ⟨10.1117/12.2583843⟩مصطلحات موضوعية: Curvilinear coordinates, Computer science, Figure of merit, Context (language use), Sensitivity (control systems), Noise (video), Surface finish, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Algorithm, Lithography, Edge detection, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f428faf8e482054b9e9294453cc00305
https://hal.archives-ouvertes.fr/hal-03156564 -
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المساهمون: Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, Feb 2021, Online Only, France. pp.115, ⟨10.1117/12.2584617⟩مصطلحات موضوعية: Engineering drawing, Exploit, Standardization, Computer science, business.industry, Metrology, Key (cryptography), Process control, Photonics, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, business, Critical dimension, Lithography, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::42946132a8c15301fe1cdbbca85edfe6
https://hal.archives-ouvertes.fr/hal-03156573 -
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المؤلفون: Francois Weisbuch, Jirka Schatz, Thiago Figueiro, Nivea Schuch, Sylvio Mattick, Patrick Schiavone
المساهمون: Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
SPIE Advanced Lithography
SPIE Advanced Lithography, Feb 2021, Online Only, France. ⟨10.1117/12.2583715⟩مصطلحات موضوعية: Matching (statistics), Computer science, business.industry, matching, Experimental data, Pattern recognition, critical dimension, Metrology, contour metrology, metrology, Metric (mathematics), SEM, Calibration, Measurement uncertainty, contour, Multiple edges, Artificial intelligence, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, business, Critical dimension
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5148f1883f7f54b2a8138f2ad56a2031
https://hal.science/hal-03156583 -
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المؤلفون: Thiago Figueiro, Patrick Schiavone, Charles Valade, B. Le-Gratiet, Nivea Schuch, Stéphanie Audran, J. Ducote, C. Gardin, Matthieu Milléquant, R. Bouyssou, Alain Ostrovsky, Jordan Belissard
المساهمون: Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, Feb 2021, Online Only, France. pp.29, ⟨10.1117/12.2584364⟩مصطلحات موضوعية: Basis (linear algebra), business.industry, Computer science, Image processing, Overlay, Image (mathematics), Metrology, Metric (mathematics), Line (geometry), Computer vision, Artificial intelligence, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, business, Critical dimension, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3d618cd1dedb2c85efa6fd9c45b43c5d
https://hal.archives-ouvertes.fr/hal-03156590 -
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المؤلفون: R. Bouyssou, J. Ducote, B. Le-Gratiet, Alain Ostrovsky, Paolo Petroni, Charlotte Beylier, Vincent Annezo, Matthieu Milléquant, C. Gardin, L. Schneider, Thiago Figueiro, Patrick Schiavone, Nivea Schuch
المساهمون: STMicroelectronics [Crolles] (ST-CROLLES), Aselta-nanographics [Grenoble], Minatec, Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)
المصدر: Proceedings SPIE Volume 11325
Metrology, Inspection, and Process Control for Microlithography XXXIV
Metrology, Inspection, and Process Control for Microlithography XXXIV, Feb 2020, San Jose, United States. pp.3, ⟨10.1117/12.2551907⟩مصطلحات موضوعية: Coupling, Computer science, Rounding, Process (computing), 02 engineering and technology, Measure (mathematics), 030218 nuclear medicine & medical imaging, Image (mathematics), Metrology, 03 medical and health sciences, 020210 optoelectronics & photonics, 0302 clinical medicine, 0202 electrical engineering, electronic engineering, information engineering, Key (cryptography), Standard algorithms, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Algorithm, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::13ae227f5f46b56000f77b09b27ff4f9
https://hal.archives-ouvertes.fr/hal-03093860 -
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المؤلفون: Charlotte Beylier, Christian Gardin, B. Le Gratiet, Alexandre Chagoya-Garzon, R. Bouyssou, J. Ducote, Matthieu Milléquant, Christophe Dezauzier, Alain Ostrovsky, Patrick Schiavone, Paolo Petroni
المساهمون: STMicroelectronics [Crolles] (ST-CROLLES), Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Aselta Nanographics
المصدر: Proc.SPIE
Metrology, Inspection, and Process Control for Microlithography XXXIII
Metrology, Inspection, and Process Control for Microlithography XXXIII, Feb 2019, San Jose, United States. pp.109591M, ⟨10.1117/12.2511626⟩مصطلحات موضوعية: Image quality, business.industry, Computer science, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Toolbox, Image (mathematics), Metrology, law.invention, 010309 optics, Wafer fabrication, law, 0103 physical sciences, Key (cryptography), Process control, Computer vision, Artificial intelligence, Radar, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 0210 nano-technology, business, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fcb8a6dfcee1ab055cfbacd2635fa899
https://hal.archives-ouvertes.fr/hal-02326560 -
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المؤلفون: Jean-Hervé Tortai, Patrick Schiavone, Duy Duc Nguyen
المساهمون: Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Aselta Nanographics
المصدر: Proc. SPIE
Metrology, Inspection, and Process Control for Microlithography XXXIII
Metrology, Inspection, and Process Control for Microlithography XXXIII, Feb 2019, San Jose, United States. pp.1095918, ⟨10.1117/12.2515181⟩مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Scanning electron microscope, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Finite element method, Robin boundary condition, Secondary electrons, Metrology, Optics, Secondary emission, 0103 physical sciences, Cathode ray, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 0210 nano-technology, business, Beam (structure), ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::22d8782352824238f532300aa6061825
https://hal.archives-ouvertes.fr/hal-02326619 -
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المؤلفون: Patrick Schiavone, Serguei Postnikov, Sébastien Bayle, Clyde Browning, Matthieu Milléquant
المساهمون: Aselta Nanographics, Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])
المصدر: Proc. SPIE
34th European Mask and Lithography Conference
34th European Mask and Lithography Conference, Jun 2018, Grenoble, France. pp.107750K, ⟨10.1117/12.2326599⟩مصطلحات موضوعية: Data processing, Curvilinear coordinates, Computer science, Computation, Process (computing), 02 engineering and technology, 030218 nuclear medicine & medical imaging, Reduction (complexity), 03 medical and health sciences, File size, 020210 optoelectronics & photonics, 0302 clinical medicine, Convergence (routing), 0202 electrical engineering, electronic engineering, information engineering, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Representation (mathematics), Algorithm, ComputingMilieux_MISCELLANEOUS, ComputingMethodologies_COMPUTERGRAPHICS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c9c9f5cf80f18ea8cd20919f6dff82c8
https://doi.org/10.1117/12.2326599 -
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المؤلفون: Alexis Girodon, Sébastien Bayle, Jacky Chartoire, Patrick Schiavone, Aurélien Fay, Jérôme Hazart
المساهمون: Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Aselta Nanographics
المصدر: Proc. SPIE
Photomask Technology
Photomask Technology, Sep 2018, Monterey, United States. pp.108101D, ⟨10.1117/12.2501823⟩مصطلحات موضوعية: 010302 applied physics, Physics, business.industry, ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION, Inverse, Edge (geometry), 01 natural sciences, Optics, Software, 0103 physical sciences, Cathode ray, Calibration, Photonics, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, business, Lithography, Electron-beam lithography, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b6217bf28e11132fff145f22059e9427
https://hal.science/hal-02326592 -
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المؤلفون: Sergei V. Postnikov, Yasuo Kon, Kenji Kono, Thiago Figueiro, Luc Martin, Yasunari Tsukino, Patrick Schiavone, Paolo Petroni
المساهمون: Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Aselta Nanographics, Hoya Corp.
المصدر: Proc. SPIE
Photomask Japan 2018
Photomask Japan 2018, Apr 2018, Yokohama, Japan. pp.19, ⟨10.1117/12.2501785⟩مصطلحات موضوعية: Defect repair, Computer science, Process (computing), 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, 010309 optics, 0103 physical sciences, Electronic engineering, Node (circuits), [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Photomask, 0210 nano-technology, ComputingMilieux_MISCELLANEOUS, Electron-beam lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::93b4726d9f472e2156119ab7a77d9ba0
https://doi.org/10.1117/12.2501785
