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1
المؤلفون: Todd Bailey, Wei-Long Wang, Weijie Lu, Jed H. Rankin, Yee Mei Foong, Gek Soon Chua, Paul Ackmann
المصدر: Photomask Technology 2019.
مصطلحات موضوعية: Reduction (complexity), High fidelity, Computer engineering, Optical proximity correction, law, Computer science, Process (computing), Photolithography, Photomask, Full cycle, Critical dimension, law.invention
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::db04df6da07a379c0a4d8368683ebd5a
https://doi.org/10.1117/12.2536745 -
2
المؤلفون: Xiang Hu, Wenchao Jiang, Guoxiang Ning, Lloyd C. Litt, Yuping Ren, Paul Ackmann
المصدر: Photomask Technology.
مصطلحات موضوعية: Computer science, Product (mathematics), Electronic engineering, Sigma, Process control, Wafer, Node (circuits), Dynamic control, Lithography, Advanced process control
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::056861b639685b7a92c5eec3427c7e67
https://doi.org/10.1117/12.2280570 -
3
المؤلفون: Guoxiang Ning, Paul Ackmann, Peter Philipp, Christian Crell, Norman Chen, Lloyd C. Litt
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Wafer fabrication, Engineering, Scanner, Optics, Optical proximity correction, business.industry, Reticle, Wafer, business, Focus (optics), Critical dimension, Aerial image
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::63d4c22b51fa961836e63c2db443fa7c
https://doi.org/10.1117/12.2197025 -
4
المؤلفون: Sandra Hecker, Christian Buergel, Florian Werle, Paul Ackmann, Nan Fu, Stefan Roling, Guoxiang Ning
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, business.industry, Process (computing), Hardware_PERFORMANCEANDRELIABILITY, Sizing, Optical proximity correction, Hardware_INTEGRATEDCIRCUITS, Reticle, Electronic engineering, Wafer, Static random-access memory, business, Lithography, AND gate
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f467b853d18e6d48fc16871d9de2a5af
https://doi.org/10.1117/12.2197195 -
5
المؤلفون: Lei Yuan, Yan Wang, Thomas V. Pistor, Chenchen Wang, Yixu Wu, Sohan Singh Mehta, Jongwook Kye, Paul Ackmann
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Optics, Resist, business.industry, Atomic force microscopy, Attenuation, Composite material, business, Shrinkage
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9ba94444555ec651089eebfe802c4675
https://doi.org/10.1117/12.2087376 -
6
المؤلفون: Edita Tejnil, John L. Sturtevant, Fritz Gans, Paul Ackmann, Kent H. Nakagawa, Ana Armeanu, Michael Lam, Peter Buck, Guoxiang Ning, Christian Buergel, Kostas Adam, Franklin D. Kalk, Steffen Schulze, Michael Oliver, David Fryer, Chris Clifford
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Optics, Stack (abstract data type), business.industry, Rounding, Calibration, Domain decomposition methods, Sensitivity (control systems), Photomask, business, Representation (mathematics), Algorithm, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c2fc9508d6ac2ab1012c0674a5d33285
https://doi.org/10.1117/12.2066483 -
7
المؤلفون: Paul Ackmann, Lloyd C. Litt, Guo Xiang Ning
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, business.industry, Real-time computing, Process (computing), law.invention, Wafer fabrication, Mask set, Optical proximity correction, law, Hardware_INTEGRATEDCIRCUITS, Reticle, Multiple patterning, Photomask, Photolithography, business, Computer hardware
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1d2bb43e933e6a1df1381411b6ce6755
https://doi.org/10.1117/12.2076771 -
8
المؤلفون: Lloyd C. Litt, Martin Tschinkl, Thomas Thaler, Peter Philipp, Guoxiang Ning, Paul Ackmann, Kristian Schulz, Stefan Meusemann
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Scanner, Materials science, Optics, business.industry, Reticle, Intensity mapping, Wafer, business, Critical dimension, Aerial image, Metrology, Characterization (materials science)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c9667e6611246e42218f966934c360e8
https://doi.org/10.1117/12.2066173 -
9
المؤلفون: Dongqing Zhang, Yee Mei Foong, Lloyd C. Litt, Jacky Cheng, Paul Ackmann, Guoxiang Ning, Sergey Kropinov
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Process variation, Scanner, Optical proximity correction, Computer science, business.industry, Linearity, Computer vision, Artificial intelligence, business, Algorithm, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9b4d79ebf8413abab31ebbc5ff0e43ff
https://doi.org/10.1117/12.2044779 -
10
المؤلفون: Peter Buck, Guoxiang Ning, Franklin D. Kalk, Kent H. Nakagawa, Steffen Schulze, Christian Buergel, John L. Sturtevant, Fritz Gans, Paul Ackmann, Edita Tejnil
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Mask set, Optical proximity correction, business.industry, Computational lithography, Rounding, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Sensitivity (control systems), Photomask, business, Representation (mathematics), Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::440d42cdef13301ff55e6e2c6ac0b422
https://doi.org/10.1117/12.2030733