المؤلفون: Teschke, O.^Aff3, Galembeck, F.^Aff3, Murphy, D. S.^Aff4, Rosen, M. J.^Aff4, Ghaica, L.^Aff5, Chattopadhyay, A. K.^Aff6, LeBlanc, R. M.^{Aff5, Aff16}, Röhl, W.^Aff7, von Rybinski, W.^Aff7, Schwuger, M. J.^Aff8, El-Basiouny, M. S.^{Aff9, Aff10}, Babaqi, A. S.^{Aff9, Aff10}, Abdullah, R. M.^{Aff9, Aff10}, Chang, C. H.^Aff11, Wang, N. H. L.^Aff11, Franses, E. I.^Aff11, Nakagaki, M.^Aff12, Tanaka, H.^Aff13, Nakagaki, H.^Aff14, Shimabayashi, S.^Aff13, Esumi, Kunio^Aff15, Nagahama, Tetsuya^Aff15, Meguro, Kenjiro^Aff15, Gauvin, S.^Aff16, Bouzerda, M.^Aff17, Lindheimer, M.^Aff17, Partyka, S.^Aff17, Brun, B.^Aff17, Clark, D. C.^Aff18, Coke, M.^Aff18, Wilde, P. J.^Aff18, Wilson, D. R.^Aff18, Goyal, K. L.^Aff19, Singh, L. R.^Aff20, Gurtu, H. K.^Aff20, Dynarowicz, P.^Aff21, Moberg, R.^Aff22, Siegbahn, H. O. G.^Aff22, Bokman, F.^Aff23, Bohman, O.^Aff23, Ravey, J. C.^Aff24, Gherbi, A.^Aff24, Stébé, M. J.^Aff24, Minones, J.^Aff25, Casas Parada, M.^Aff25, Conde, Y. O.^Aff25, Zhou, Zukang^Aff26, Wu, Peiqiang^Aff26, Hassan, M. H.^Aff27, Zollars, R. L.^Aff27, Bloch, J. M.^Aff28, Ivanov, I. B.^Aff29, Wasan, D. T.^Aff29, Kralchevsky, P. A.^Aff30, Horozov, T. G.^Aff30, Nikolov, A. D.^Aff30, Romero, M. A.^Aff31, Perwuels, A.^Aff32, Vergelati, C.^Aff32, Vovelle, L.^Aff32, Holl, Y.^Aff32, Tronel-Peyroz, E.^Aff33, Douillard, J. M.^Aff33, Bennes, R.^Aff33, Privat, M.^Aff33, Jiding, Xia^Aff34, Wen, Sun^Aff34, Chung, J. B.^Aff11, Hannemann, R. E.^Aff11, Sharma, Bal Gopal^Aff11, Rakshit, Animesh Kumar^Aff35, Shah, Beena^Aff35, Surekha Devi^Aff35

المساهمون: Mittal, K. L., editor^Aff1, Shah, D. O., editor^Aff2

المصدر: Surfactants in Solution : Volume 11. :607-620

المؤلفون: P. Dynarowicz, A. Gherbi, H. Tanaka, R. E. Hannemann, J. M. Douillard, Y. O. Conde, Y. Holl, A. Perwuels, R. Bennes, Surekha Devi, Animesh Kumar Rakshit, W. Röhl, M. J. Stébé, A. K. Chattopadhyay, P. A. Kralchevsky, B. Brun, L. R. Singh, Zukang Zhou, M. Privat, E. I. Franses, Peiqiang Wu, D. T. Wasan, Kunio Esumi, Tetsuya Nagahama, J. M. Bloch, D. C. Clark, P. J. Wilde, R. Moberg, F. Bokman, M. H. Hassan, L. Ghaica, L. Vovelle, M. Casas Parada, T. G. Horozov, Kenjiro Meguro, D. S. Murphy, R. M. LeBlanc, M. Bouzerda, M. Nakagaki, Xia Jiding, M. J. Rosen, H. Nakagaki, Bal Gopal Sharma, S. Shimabayashi, W. von Rybinski, H. O. G. Siegbahn, K. L. Goyal, E. Tronel-Peyroz, M. J. Schwuger, M. S. El-Basiouny, C. Vergelati, A. D. Nikolov, J. C. Ravey, S. Gauvin, O. Teschke, Beena Shah, F. Galembeck, I. B. Ivanov, H. K. Gurtu, A. S. Babaqi, Sun Wen, O. Bohman, M. A. Romero, M. Coke, R. L. Zollars, J. Minones, N. H. L. Wang, C. H. Chang, R. M. Abdullah, J. B. Chung, D. R. Wilson, S. Partyka, M. Lindheimer

المصدر: Surfactants in Solution ISBN: 9781461367123

مصطلحات موضوعية: Contact angle, chemistry.chemical_compound, Materials science, Aqueous solution, Adsorption, Chemical engineering, Passivation, chemistry, Sulfuric acid, Wetting, Dissolution, Anode

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c5bc94fbf9c79474595314552e50c40b
https://doi.org/10.1007/978-1-4615-3836-3_48