يعرض 1 - 6 نتائج من 6 نتيجة بحث عن '"Pu, Bryan"', وقت الاستعلام: 0.84s تنقيح النتائج
  1. 1
    مؤتمر
    Metal contamination control and reduction in plasma etching

    المؤلفون: Chen, Xingjian, He, Xiao-Ming, Pu, Bryan

    المصدر: 2016 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2016 China. :1-4 Mar, 2016

    Relation: 2016 China Semiconductor Technology International Conference (CSTIC)

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  2. 2
    مؤتمر
    Etch process optimization and electrical improvement in TiN hard mask ultra-low k interconnection

    المؤلفون: Chang, Chih-Yang, Kang, Sean, Kao, C L, Bekiaris, Nikos, Ching, Chi, Pu, Bryan, Lill, Throsten

    المصدر: 2011 e-Manufacturing & Design Collaboration Symposium & International Symposium on Semiconductor Manufacturing (eMDC & ISSM) Semiconductor Manufacturing (ISSM) and e-Manufacturing and Design Collaboration Symposium (eMDC), 2011 International Symposium on. :1-21 Sep, 2011

    Relation: 2011 e-Manufacturing & Design Collaboration Symposium & International Symposium on Semiconductor Manufacturing (eMDC & ISSM)

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  3. 3
    دورية أكاديمية
    MxP+: A new dielectric etcher with enabling technology, high productivity, and low cost-of-consumables.

    المؤلفون: Shan, Hongching, Lee, Evans, Welch, Michael, Pu, Bryan, Carducci, James, Ke, Kuang-Han, Gao, Hua, Luscher, Paul, Crean, Gerard, Wang, Rynn, Blume, Richard, Cooper, James, Wu, Robert

    المصدر: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 2, p716-723, 8p

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  4. 4
    دورية أكاديمية
    Process kit and wafer temperature effects on dielectric etch rate and uniformity of electrostatic chuck.

    المؤلفون: Shan, Hongching, Pu, Bryan Y., Gao, Hua, Ke, Kuang-Han, Lewis, Jenny, Welch, Michael, Deshpandey, Chandra

    المصدر: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 1, p521-526, 6p

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  5. 5
    Plasma Control Using Dual Cathode Frequency Mixing

    المؤلفون: Steven Shannon, Grimard Dennis S, Panagopoulos Theodoros, Hoffman Daniel J, Chafin Michael G, Detrick Troy S, Paterson Alexander, Liu Jingbao, Shin Taeho, Pu Bryan Y

    المصدر: The Lens

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::62ecfe48ff03aa74bd300398a9cb9365
    https://www.lens.org/198-151-282-809-229

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  6. 6
    دورية
    High-AR Etch Advances. (cover story)

    المؤلفون: Welch, Steven, Keswick, Kathryn, Stout, Phillip, Jong Mun Kim, Wonseok Lee, Ying, Chris, Dean, Kenny, Hun Sang Kim, Pu, Bryan

    المصدر: Semiconductor International; Feb2009, Vol. 32 Issue 2, p18-22, 4p

    مصطلحات موضوعية: DYNAMIC random access memory, COMPUTER storage devices, SEMICONDUCTORS, SEMICONDUCTOR industry, INTEGRATED circuits industry, RANDOM access memory

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