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المؤلفون: Qais Saadeeh, Meiyi Wu, Vicky Philipsen, Philipp Naujok, Jean-Philippe Soulié, Robbert Wilhelmus Elisabeth van de Kruijs, Richard Ciesielski, Karl Opsomer, Michael Kolbe, Victor Soltwisch, Frank Scholze
المصدر: Modeling Aspects in Optical Metrology VIII.
مصطلحات موضوعية: Range (particle radiation), Optics, Materials science, Beamline, Field (physics), Scattering, business.industry, Extreme ultraviolet lithography, Thin film, business, Lithography, Semimetal
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b48493e0309b4e64ca7928fe95cfaaf2
https://doi.org/10.1117/12.2592543