-
1
المؤلفون: R. J. Hillard, D. Liu, J. Yeh, J. T. Virgo, Q. Wang
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 18:1308-1312
مصطلحات موضوعية: Materials science, Silicon, Analytical chemistry, Oxide, chemistry.chemical_element, Schottky diode, Equivalent oxide thickness, Surfaces and Interfaces, Condensed Matter Physics, Capacitance, Surfaces, Coatings and Films, chemistry.chemical_compound, chemistry, Wafer, Surface charge, Layer (electronics)
-
2
المؤلفون: T. Abe, S. R. Weinzierl, M. Pawlik, R. J. Hillard, J. M. Heddleson, P.C. Karulkar, P. Rai-Choudhury
المصدر: Microelectronic Engineering. 19:827-832
مصطلحات موضوعية: Materials science, Fabrication, Spreading resistance profiling, Dopant, business.industry, Transistor, Oxide, Silicon on insulator, Charge density, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, chemistry.chemical_compound, Electrical resistance and conductance, chemistry, law, Optoelectronics, Electrical and Electronic Engineering, business
-
3
المؤلفون: Z-Q. Fang, P. Rai-Choudhury, A. G. Milnes, M. Stam, Robert G. Wilson, Alexander Y. Polyakov, R. J. Hillard
المصدر: Journal of Applied Physics. 72:1316-1319
مصطلحات موضوعية: Secondary ion mass spectrometry, chemistry.chemical_classification, Photoluminescence, Chemistry, Electrical resistivity and conductivity, Hall effect, Analytical chemistry, General Physics and Astronomy, Thin film, Epitaxy, Inorganic compound, Molecular beam epitaxy
-
4
المؤلفون: P. Rai-Choudhury, Alexander Y. Polyakov, Robert G. Wilson, Stephen J. Pearton, M. Stam, A. G. Milnes, X. J. Bao, Tuviah E. Schlesinger, R. J. Hillard
المصدر: Materials Science Forum. :623-628
مصطلحات موضوعية: Materials science, Mechanics of Materials, Mechanical Engineering, General Materials Science, Hydrogen passivation, Condensed Matter Physics, Engineering physics
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::636e0b11accf624312ea467559e647fd
https://doi.org/10.4028/www.scientific.net/msf.83-87.623 -
5
المؤلفون: H. L. Berkowitz, David M. Burnell, R. J. Hillard, R. G. Mazur, P. Rai‐Choudhury
المصدر: Solid-State Electronics. 33:773-781
مصطلحات موضوعية: Materials science, Spreading resistance profiling, Dopant, business.industry, Semiconductor device, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, CMOS, Materials Chemistry, Electronic engineering, Optoelectronics, Electrical and Electronic Engineering, business, Doping profile, Electric resistivity
-
6
المؤلفون: M. C. Benjamin, P. A. Kraus, N. Ho, S. H. Bae, S. Thirupapuliyur, C. S. Olsen, R. J. Hillard
المصدر: AIP Conference Proceedings.
مصطلحات موضوعية: Materials science, Fabrication, business.industry, Gate dielectric, Hardware_PERFORMANCEANDRELIABILITY, Dielectric, Metrology, CMOS, Hardware_GENERAL, Gate oxide, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Optoelectronics, business, Metal gate, Electrical impedance, Hardware_LOGICDESIGN
-
7
المؤلفون: A. E. Bochkarev, R. J. Hillard, Robert G. Wilson, M. Stam, Stephen J. Pearton, A. G. Milnes, Alexander Y. Polyakov, P. Rai-Choudhury
المصدر: Applied Physics Letters. 60:3004-3006
مصطلحات موضوعية: chemistry.chemical_classification, Physics and Astronomy (miscellaneous), Hydrogen, Passivation, Spreading resistance profiling, Fermi level, Analytical chemistry, chemistry.chemical_element, Secondary ion mass spectrometry, symbols.namesake, chemistry, Deuterium, symbols, Tellurium, Inorganic compound
-
8
المؤلفون: P. Rai-Choudhury, Alexander Y. Polyakov, Robert G. Wilson, John Lopata, Tuviah E. Schlesinger, X. J. Bao, A. G. Milnes, Stephen J. Pearton, M. Stam, R. J. Hillard
المصدر: Applied Physics Letters. 60:1318-1320
مصطلحات موضوعية: chemistry.chemical_classification, Deep-level transient spectroscopy, Physics and Astronomy (miscellaneous), Spreading resistance profiling, Hydrogen, Passivation, Chemistry, Diffusion, Analytical chemistry, Schottky diode, chemistry.chemical_element, Atmospheric temperature range, Inorganic compound
-
9
المؤلفون: H. L. Berkowitz, R. J. Hillard, P. Rai‐Choudhury, J. M. Heddleson, R. G. Mazur
المصدر: Euro III-Vs Review. 3:31-33
مصطلحات موضوعية: Profiling (computer programming), Materials science, Silicon, business.industry, Analytical chemistry, chemistry.chemical_element, Germanium, Characterization (materials science), Point contact, chemistry.chemical_compound, Semiconductor, chemistry, Ternary compound, Optoelectronics, Point (geometry), Electrical and Electronic Engineering, business
-
10
المؤلفون: R. H. Herlocher, J. C. Sherbondy, R. G. Mazur, L. E. Peitersen, M. Wilson, R. J. Hillard
المصدر: The 1998 international conference on characterization and metrology for ULSI technology.
مصطلحات موضوعية: Materials science, Dopant, business.industry, Electrical engineering, Oxide, Repeatability, AC power, law.invention, Threshold voltage, Capacitor, chemistry.chemical_compound, chemistry, law, MOSFET, Optoelectronics, business, Mercury probe
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5111f45b0448f2604ad90be70fa0eb6e
https://doi.org/10.1063/1.56802