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المؤلفون: Raymond Hung, Daito Kazuya, Jonathan R. Bakke, Guoqiang Jian, Rajkumar Jakkaraju, Kai Wu, Yu Lei, Yi Xu, Xinyu Fu, Nicolas Breil
المصدر: 2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC).
مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Metallurgy, Nucleation, chemistry.chemical_element, 02 engineering and technology, Chemical vapor deposition, Tungsten, 021001 nanoscience & nanotechnology, 01 natural sciences, chemistry, Electrical resistivity and conductivity, Plasma-enhanced chemical vapor deposition, 0103 physical sciences, Optoelectronics, 0210 nano-technology, business, Tin, Metal gate, Layer (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4643defc6eaaa1d0a65e5411c7e1824d
https://doi.org/10.1109/iitc-amc.2016.7507699 -
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المؤلفون: Guoqiang Jian, Xinyu Fu, Rajkumar Jakkaraju, Paul F. Ma, Naomi Yoshida, Jing Zhou
المصدر: 2016 China Semiconductor Technology International Conference (CSTIC).
مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, chemistry.chemical_element, 02 engineering and technology, Tungsten, Conductivity, 021001 nanoscience & nanotechnology, 01 natural sciences, Tungsten film, chemistry, Electrical resistivity and conductivity, Logic gate, 0103 physical sciences, Fluorine, Electronic engineering, Optoelectronics, 0210 nano-technology, business, Metal gate, AND gate
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c6d977caffadf675fbb1ed1e8ff02d7c
https://doi.org/10.1109/cstic.2016.7464018 -
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المؤلفون: Andrew Darlak, Rajkumar Jakkaraju, Ray Donohoe, Atif Noori, Haichun Yang, Naomi Yoshida, Xinyu Fu, Steven Hung, Chorng-Ping Chang, Yu Lei, H. Chen, Igor Peidous, Christopher Lazik, Shiyu Sun, Kun Xu, Adam Brand
المصدر: 2012 Symposium on VLSI Technology (VLSIT).
مصطلحات موضوعية: Materials science, business.industry, chemistry.chemical_element, Conductivity, Threshold voltage, chemistry, CMOS, Electrical resistivity and conductivity, Logic gate, MOSFET, Electronic engineering, Optoelectronics, Metal gate, Tin, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d165fc817833bd7b871cfe3a0af61481
https://doi.org/10.1109/vlsit.2012.6242471