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المؤلفون: Patrick P. Naulleau, Daniel Zehm, Lauren McQuade, Wenhua Zhu, Christopher L. Anderson, Jason DePonte, Seno Rekawa, Eric M. Gullikson, M.R. Dickinson, Weilun Chao, Farhad Salmassi, Jeff Gamsby, Ryan Miyakawa, Will Cork, Rene Delano, Lucas Conley, Carl Cork, Brandon Vollmer, Geoff Gaines, Arnaud P. Allezy, Gideon Jones
المصدر: Extreme Ultraviolet (EUV) Lithography XI.
مصطلحات موضوعية: Scanner, Materials science, business.industry, Extreme ultraviolet lithography, Photoresist, Vibration, symbols.namesake, Fourier transform, Vibration isolation, Optics, Resist, symbols, business, MOX fuel
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6fcdd18ed1291baa8f99cac8ae4dcc2d
https://doi.org/10.1117/12.2552125 -
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المؤلفون: Jason DePonte, Christopher N. Anderson, Will Cork, Rene Delano, Jeff Gamsby, Eric M. Gullikson, Senajith Rekawa, Weilun Chao, Patrick P. Naulleau, Farhad Salmassi, Ryan Miyakawa, Brandon Vollmer, Geoff Gaines, Carl Cork, Stephen Meyers, Wenhua Zhu, Gideon Jones, M.R. Dickinson, Arnaud P. Allezy, Daniel Zehm
المساهمون: Goldberg, Kenneth A
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Field of view, Synchrotron, law.invention, Optics, Beamline, law, Extreme ultraviolet, Wafer, business, Lithography, Aerial image
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0b94d6e57f0b524b507cc028fe56d679
https://escholarship.org/uc/item/4m8939b8 -
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المؤلفون: Patrick P. Naulleau, William Cork, Iacopo Mochi, Jason DePonte, Jeffrey F. Gamsby, Arnaud P. Allezy, Eric M. Gullikson, Veljko Milanovic, M.R. Dickinson, Eric Van Every, Douglas Van Camp, Markus P. Benk, W. Chao, Senajith Rekawa, Erik H. Anderson, James Macdougall, Elizabeth Martin, Kenneth A. Goldberg, Rene Delano, Daniel Zehm, Eric Acome, Vamsi Vytla, Carl Cork, M. S. Gideon Jones, Farhad Salmassi, Hanjing Huang, William B. Ghiorso
المصدر: Extreme Ultraviolet (EUV) Lithography IV.
مصطلحات موضوعية: Physics, Microscope, business.industry, Extreme ultraviolet lithography, law.invention, Numerical aperture, Optics, law, Extreme ultraviolet, Reticle, Photomask, business, Lithography, Image resolution
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::85cef16beed56b5de8e814af8350f7b6
https://doi.org/10.1117/12.2011688 -
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المؤلفون: Kenneth A. Goldberg, Rene Delano, James Alexander Liddle, Layton C. Hale, Patrick P. Naulleau, Bob Gunion, Senajith Rekawa, Gideon Jones, Hanjing Huang, Erik H. Anderson, Bruce Harteneck, Ron Oort, Brian Hoef, Al Rawlins, Keith Jackson, D. W. Phillion, Gary E. Sommargren, C. Chung, Ron Tackaberry, John S. Taylor, Farhad Salmassi, Paul Denham, Drew Kemp, Kevin Bradley
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Flexibility (engineering), Engineering, business.industry, Extreme ultraviolet lithography, Field of view, Synchrotron, Numerical aperture, law.invention, Optics, law, Extreme ultraviolet, Coherence (signal processing), business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c673fd3d13f2fd93c4b6f00d1f2c95f1
https://doi.org/10.1117/12.556538