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المؤلفون: Jos Benschop, Wesley van Beld den, Silvester Houweling, Airat Shafikov, Fred Bijkerk, Robbert Wilhelmus Elisabeth van de Kruijs
المساهمون: MESA+ Institute, XUV Optics
المصدر: Journal of microelectromechanical systems, 31(1), 63-73. IEEE
مصطلحات موضوعية: Materials science, Fracture toughness, Free-standing, thin films, Mechanical Engineering, method, buckling, Electrical and Electronic Engineering, Composite material, Thin film, Chip, EUV pellicle
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::52dedd643d76ee303873cdbf13d5b532
https://research.utwente.nl/en/publications/f2661099-289a-427c-b643-bd7eae39f453
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المؤلفون: Anirudhan Chandrasekaran, Jacobus Marinus Sturm, Andrey Zameshin, Fred Bijkerk, Robbert Wilhelmus Elisabeth van de Kruijs
المساهمون: XUV Optics
المصدر: ACS Applied Materials & Interfaces
ACS applied materials & interfaces, 11(49). American Chemical Societyمصطلحات موضوعية: Materials science, scaling law, UT-Hybrid-D, intermixing, 02 engineering and technology, Substrate (electronics), 01 natural sciences, transition metals, interfaces, 0103 physical sciences, General Materials Science, Thin film, sputter deposition, 010302 applied physics, Condensed matter physics, Scattering, thin film growth, Sputter deposition, 021001 nanoscience & nanotechnology, Enthalpy of mixing, segregation, Atomic radius, Low-energy ion scattering, 0210 nano-technology, Layer (electronics), low energy ion scattering, Research Article
وصف الملف: application/pdf
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المؤلفون: Anirudhan Chandrasekaran, Jacobus Marinus Sturm, Robbert Wilhelmus Elisabeth van de Kruijs, Fred Bijkerk
المساهمون: XUV Optics, MESA+ Institute
المصدر: ACS Applied Materials & Interfaces
ACS Applied Materials and Interfaces, 13(26), 31260-31270. American Chemical Societyمصطلحات موضوعية: Materials science, Annealing (metallurgy), UT-Hybrid-D, preferred orientation, metal-silicon interface, 02 engineering and technology, 01 natural sciences, law.invention, ion channeling, law, 0103 physical sciences, General Materials Science, Texture (crystalline), Crystallization, Composite material, sputter deposition, 010302 applied physics, thin film growth, Sputter deposition, 021001 nanoscience & nanotechnology, Microstructure, metal−silicon interface, Amorphous solid, Transmission electron microscopy, low-energy ion-scattering, interdiffusion, Crystallite, 0210 nano-technology, Research Article
وصف الملف: application/pdf
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المؤلفون: Qais Saadeeh, Meiyi Wu, Vicky Philipsen, Philipp Naujok, Jean-Philippe Soulié, Robbert Wilhelmus Elisabeth van de Kruijs, Richard Ciesielski, Karl Opsomer, Michael Kolbe, Victor Soltwisch, Frank Scholze
المصدر: Modeling Aspects in Optical Metrology VIII.
مصطلحات موضوعية: Range (particle radiation), Optics, Materials science, Beamline, Field (physics), Scattering, business.industry, Extreme ultraviolet lithography, Thin film, business, Lithography, Semimetal
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b48493e0309b4e64ca7928fe95cfaaf2
https://doi.org/10.1117/12.2592543 -
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المؤلفون: Olena Soroka, Robbert Wilhelmus Elisabeth van de Kruijs, Fred Bijkerk, Jacobus Marinus Sturm, Christopher James Lee
المساهمون: XUV Optics
المصدر: Applied surface science, 455, 70-74. Elsevier
مصطلحات موضوعية: Materials science, Hydrogen, General Physics and Astronomy, chemistry.chemical_element, 02 engineering and technology, 010402 general chemistry, 01 natural sciences, Dissociation (chemistry), Adsorption, Desorption, Yttrium hydride, Solubility, Thin film, Metal thin coatings, 22/3 OA procedure, Transition temperature, Surfaces and Interfaces, General Chemistry, Yttrium, Atomic hydrogen, Surface desorption, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 0104 chemical sciences, Surfaces, Coatings and Films, chemistry, Chemical engineering, Hydrogenation, 0210 nano-technology
وصف الملف: application/pdf
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المؤلفون: Cristiane R. Stilhano Vilas Boas, Jacobus Marinus Sturm, Parikshit Phadke, Robbert Wilhelmus Elisabeth van de Kruijs, F. Bijkerk
المساهمون: XUV Optics
المصدر: Applied surface science, 518:146143. Elsevier
مصطلحات موضوعية: Materials science, Ion beam, Oxide, Analytical chemistry, UT-Hybrid-D, General Physics and Astronomy, chemistry.chemical_element, 02 engineering and technology, Tungsten, 010402 general chemistry, 01 natural sciences, Oxygen, Ion, chemistry.chemical_compound, X-ray photoelectron spectroscopy, Sputtering, Oxidation, TRIDYN, Near-threshold, Oxygen transport, Radiation enhanced diffusion, Surfaces and Interfaces, General Chemistry, Transition metals, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Sputter yields, 0104 chemical sciences, Surfaces, Coatings and Films, chemistry, 0210 nano-technology
وصف الملف: application/pdf
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المؤلفون: Jacobus Marinus Sturm, F. Bijkerk, Parikshit Phadke, Robbert Wilhelmus Elisabeth van de Kruijs
المساهمون: XUV Optics
المصدر: Applied surface science, 505:144529. Elsevier
مصطلحات موضوعية: Materials science, Analytical chemistry, UT-Hybrid-D, General Physics and Astronomy, chemistry.chemical_element, 02 engineering and technology, Binary collision approximation, Tungsten, Nitride, 010402 general chemistry, 01 natural sciences, Ion, X-ray photoelectron spectroscopy, Transition metal, Sputtering, Sputter yield, Thin film, TRIDYN, Near-threshold, Nitrogen ions, Surfaces and Interfaces, General Chemistry, Transition metals, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 0104 chemical sciences, Surfaces, Coatings and Films, chemistry, Nitridation, 0210 nano-technology
وصف الملف: application/pdf
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المساهمون: XUV Optics
المصدر: Journal of Applied Physics, 126(13):135304. American Institute of Physics
مصطلحات موضوعية: 010302 applied physics, Phase transition, Materials science, Silicon, Analytical chemistry, 22/2 OA procedure, General Physics and Astronomy, chemistry.chemical_element, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Stress (mechanics), chemistry.chemical_compound, chemistry, Low-energy ion scattering, Molybdenum, 0103 physical sciences, Ultimate tensile strength, Silicide, Nanometre, 0210 nano-technology
وصف الملف: application/pdf
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المؤلفون: Igor Alexandrovich Makhotkin, Jaromír Chalupský, Dorota Klinger, Ryszard Sobierajski, Libor Juha, Marek Jurek, Elke Plönjes, Iwanna Jacyna, Karel Saksl, Sebastian Strobel, Michael Störmer, Frank Siewert, Kai Tiedtke, Eric Louis, Barbara Keitel, Igor Milov, Věra Hájková, Tobias Mey, Laurent Nittler, R.A. Loch, Gosse de Vries, Sven Toleikis, Martin Hermann, Siegfried Schreiber, Y. Syryanyy, Tomáš Burian, Han Kwang Nienhuys, Hartmut Enkisch, Grzegorz Gwalt, Bart Faatz, V. Vozda, Robbert Wilhelmus Elisabeth van de Kruijs, Frank Scholze
المساهمون: XUV Optics
المصدر: Journal of synchrotron radiation 25(1), 77-84 (2018). doi:10.1107/S1600577517017362
Journal of Synchrotron Radiation
Makhotkin, I.A.; Sobierajski, R.; Chalupský, J.; Tiedtke, K.; De Vries, G.; Störmer, M.; Scholze, F.; Siewert, F.; Van De Kruijs, R.W.E.; Milov, I.; Louis, E.; Jacyna, I.; Jurek, M.; Klinger, D.; Nittler, L.; Syryanyy, Y.; Juha, L.; Hájková, V.; Vozda, V.; Burian, T.; Saksl, K.; Faatz, B.; Keitel, B.; Plönjes, E.; Schreiber, S.; Toleikis, S.; Loch, R.; Hermann, M.; Strobel, S.; Nienhuys, H.-K.; Gwalt, G.; Mey, T.; Enkisch, H.: Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold. In: Journal of Synchrotron Radiation. Vol. 25 (2018) 1, 77-84. (DOI: /10.1107/S1600577517017362)
Journal of synchrotron radiation, 25(1), 77-84. International Union of Crystallographyمصطلحات موضوعية: Nuclear and High Energy Physics, Materials science, genetic structures, Extreme ultraviolet lithography, UT-Hybrid-D, 02 engineering and technology, free electron laser induced damage, EUV optics, thin films, FELs, 01 natural sciences, Fluence, law.invention, 010309 optics, Optics, law, 0103 physical sciences, Total external reflection, Irradiation, Instrumentation, Thin Films, Free-Electron laser induced damage, Radiation, business.industry, Photondiag2017 Workshop, 021001 nanoscience & nanotechnology, Laser, eye diseases, Optical coating, Angle of incidence (optics), Extreme ultraviolet, ddc:540, 0210 nano-technology, business
وصف الملف: application/pdf
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المؤلفون: Robbert Wilhelmus Elisabeth van de Kruijs, Jort D. Verbakel, Fred Bijkerk, Z. Silvester Houweling, Seda Kizir, Jos P. H. Benschop, Wesley T. E. van den Beld, Roman Pushkarev
المساهمون: MESA+ Institute, XUV Optics, Physics of Interfaces and Nanomaterials
المصدر: Journal of physics D: applied physics, 54(50):505304. IOP Publishing Ltd.
مصطلحات موضوعية: Materials science, Acoustics and Ultrasonics, Hydrogen, Passivation, UT-Hybrid-D, chemistry.chemical_element, macromolecular substances, law.invention, chemistry.chemical_compound, Atomic layer deposition, stomatognathic system, Grapheme, law, Etching (microfabrication), Hydrogen radical, AlO, Graphene, fungi, technology, industry, and agriculture, Condensed Matter Physics, Isotropic etching, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Etching, chemistry, Chemical engineering, ALD, HOPG, Aluminium oxide, Grain boundary
وصف الملف: application/pdf
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