يعرض 1 - 10 نتائج من 232 نتيجة بحث عن '"Rodder, M."', وقت الاستعلام: 1.07s تنقيح النتائج
  1. 1
    دورية أكاديمية

    المصدر: IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 69(6):3470-3476 Jun, 2022

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  3. 3
    مؤتمر

    المصدر: 2018 IEEE Symposium on VLSI Technology VLSI Technology, 2018 IEEE Symposium on. :51-52 Jun, 2018

    Relation: 2018 IEEE Symposium on VLSI Technology

  4. 4
    مؤتمر

    المصدر: 2018 IEEE International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2018 IEEE International. :13.2.1-13.2.4 Dec, 2018

    Relation: 2018 IEEE International Electron Devices Meeting (IEDM)

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    مؤتمر

    المصدر: International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) Electron devices meeting Electron Devices Meeting, 2000. IEDM '00. Technical Digest. International. :545-548 2000

    Relation: International Electron Devices Meeting. Technical Digest. IEDM

  7. 7
    دورية أكاديمية

    المصدر: IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 35(4):473-475 Apr, 2014

  8. 8
    مؤتمر

    المصدر: International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318) Electron devices Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International. :419-422 1999

    Relation: International Electron Devices Meeting 1999. Technical Digest

  9. 9
    مؤتمر

    المصدر: 1999 IEEE International Reliability Physics Symposium Proceedings. 37th Annual (Cat. No.99CH36296) Reliability physics Reliability Physics Symposium Proceedings, 1999. 37th Annual. 1999 IEEE International. :400-404 1999

    Relation: 1999 IEEE International Reliability Physics Symposium Proceedings. 37th Annual

  10. 10
    مؤتمر

    المصدر: 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) Plasma process-induced damage Plasma Process-Induced Damage, 1998 3rd International Symposium on. :84-87 1998

    Relation: 1998 3rd International Symposium on Plasma Process-Induced Damage