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المؤلفون: Clyde Browning, Russell Cinque, Luc Martin, Patrick Schiavone, Paolo Petroni, Tadashi Komagata, Taiichi Kiuchi, Thomas Quaglio
المساهمون: JEOL USA, JEOL Ltd, 1156 Nakagami, Akishima, Tokyo 196-0022, Japan., Aselta Nanographics
المصدر: Proc. SPIE
SPIE Photomask Technology
SPIE Photomask Technology, Sep 2013, Monterey, United States. pp.88801F, ⟨10.1117/12.2028944⟩مصطلحات موضوعية: 010302 applied physics, Engineering, business.industry, media_common.quotation_subject, Fidelity, 01 natural sciences, 010309 optics, Reduction (complexity), Software, Digital pattern generator, Shot (pellet), 0103 physical sciences, Electronic engineering, Fraction (mathematics), [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, business, Throughput (business), Algorithm, Dram, ComputingMilieux_MISCELLANEOUS, ComputingMethodologies_COMPUTERGRAPHICS, media_common
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2de1c52b886d0de03f4c13acdafe4d9e
https://hal.archives-ouvertes.fr/hal-02362282 -
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المصدر: SPIE Proceedings.
مصطلحات موضوعية: Data flow diagram, Engineering, Variable (computer science), Engineering drawing, Computer engineering, business.industry, Fracture (geology), Mask data preparation, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::38b4e3ba503ea07657db6b1d4610d23e
https://doi.org/10.1117/12.864159 -
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المؤلفون: Katja Geidel, Martin Sczyrba, Peter Buck, Engelbert Mittermeier, Russell Cinque, Torsten Franke, Stefan Roling
المصدر: SPIE Proceedings.
مصطلحات موضوعية: business.industry, Computer science, Signature (logic), law.invention, Optics, Optical proximity correction, law, Feature (computer vision), Calibration, Wafer, Limit (mathematics), Photolithography, business, Lithography, Algorithm
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::483005d370701180299bf7b1ff4073a4
https://doi.org/10.1117/12.712867 -
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المؤلفون: Scott Goad, Peter D. Buck, Jürgen Preuninger, Martin Blöcker, Richard Gladhill, Russell Cinque, Christopher A. Spence, Üwe Griesinger
المصدر: 22nd European Mask and Lithography Conference.
مصطلحات موضوعية: Engineering, Resolution enhancement technologies, business.industry, Volume (computing), File size, Optical proximity correction, Embedded system, Data file, Computer data storage, Hardware_INTEGRATEDCIRCUITS, File transfer, business, Computer hardware, Dram
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::16a15703e7e7e45bd4be2595def84ece
https://doi.org/10.1117/12.692639 -
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المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Settling time, business.industry, Shaped beam, law.invention, Optics, Deflection (engineering), law, Photolithography, Photomask, business, Critical dimension, Lithography, Electron-beam lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cb283130a947b54d35a575bdf23f468b
https://doi.org/10.1117/12.681748