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المؤلفون: Stuart Sherwin, Ryan Miyakawa, Eric Gullikson, Laura Waller, Andrew Neureuther, Patrick Naulleau
المصدر: Optical and EUV Nanolithography XXXV.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::232d73b6bfc49d7ecc5a628014e24e1f
https://doi.org/10.1117/12.2617291 -
2
المؤلفون: Markus P. Benk, Andrew R. Neureuther, Laura Waller, Stuart Sherwin, Isvar A. Cordova, Ryan Miyakawa, Patrick P. Naulleau
المصدر: Extreme Ultraviolet Lithography 2020.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Phase (waves), Picometre, Metrology, Optics, Extreme ultraviolet, Etching, Monolayer, Phase-shift mask, Sensitivity (control systems), business, Reflectometry
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d299058def0c28c83123efe7473b2897
https://doi.org/10.1117/12.2574759 -
3
المؤلفون: Wenhua Zhu, Patrick P. Naulleau, Ryan Miyakawa
المصدر: Extreme Ultraviolet Lithography 2020.
مصطلحات موضوعية: Shearing (physics), Materials science, business.industry, Extreme ultraviolet lithography, Detector, Phase (waves), Image plane, Zone plate, law.invention, Optics, Region of interest, law, Reference Region, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1dde4e06ff85859097ed9e9b6d07c197
https://doi.org/10.1117/12.2574605 -
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المؤلفون: Gus Xia, Dave B. Carlton, Christopher N. Anderson, Ryan Miyakawa, Junyan Jiang
المصدر: ICASSP
مصطلحات موضوعية: business.industry, Computer science, Analogy, 020207 software engineering, 02 engineering and technology, 010501 environmental sciences, 01 natural sciences, Autoencoder, Hierarchical database model, 0202 electrical engineering, electronic engineering, information engineering, Artificial intelligence, business, Feature learning, 0105 earth and related environmental sciences, Transformer (machine learning model), Interpretability
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3d1a2bb9dcd4889f295131f4857b484d
https://doi.org/10.1109/icassp40776.2020.9054554 -
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المؤلفون: Markus P. Benk, Patrick P. Naulleau, Ryan Miyakawa, Stuart Shwerwin, Wenhua Zhu
المصدر: Extreme Ultraviolet (EUV) Lithography XI.
مصطلحات موضوعية: Microscope, Materials science, business.industry, Zernike polynomials, Extreme ultraviolet lithography, Phase (waves), Image plane, law.invention, symbols.namesake, Amplitude, Optics, law, Pupil function, symbols, business, Phase retrieval
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ca0f78104e8d82366989264af2301e0a
https://doi.org/10.1117/12.2553133 -
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المؤلفون: Patrick P. Naulleau, Daniel Zehm, Lauren McQuade, Wenhua Zhu, Christopher L. Anderson, Jason DePonte, Seno Rekawa, Eric M. Gullikson, M.R. Dickinson, Weilun Chao, Farhad Salmassi, Jeff Gamsby, Ryan Miyakawa, Will Cork, Rene Delano, Lucas Conley, Carl Cork, Brandon Vollmer, Geoff Gaines, Arnaud P. Allezy, Gideon Jones
المصدر: Extreme Ultraviolet (EUV) Lithography XI.
مصطلحات موضوعية: Scanner, Materials science, business.industry, Extreme ultraviolet lithography, Photoresist, Vibration, symbols.namesake, Fourier transform, Vibration isolation, Optics, Resist, symbols, business, MOX fuel
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6fcdd18ed1291baa8f99cac8ae4dcc2d
https://doi.org/10.1117/12.2552125 -
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المؤلفون: Andrew R. Neureuther, Laura Waller, Isvar A. Cordova, Stuart Sherwin, Ryan Miyakawa, Patrick P. Naulleau
المصدر: Extreme Ultraviolet (EUV) Lithography XI.
مصطلحات موضوعية: Physics, Image quality, Zernike polynomials, business.industry, Extreme ultraviolet lithography, Grating, Metrology, symbols.namesake, Optics, symbols, Photomask, Phase retrieval, Reflectometry, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::299128a9c96c7d8a3a0af809468d7718
https://doi.org/10.1117/12.2552967 -
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المؤلفون: Yow-Gwo Wang, Weilun Chao, Patrick P. Naulleau, Ryan Miyakawa
المصدر: Optics Communications. 402:167-172
مصطلحات موضوعية: business.industry, Computer science, ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, law.invention, Compensation (engineering), 010309 optics, Lens (optics), Wavelength, Optics, Nanolithography, Transmission (telecommunications), law, 0103 physical sciences, Electrical and Electronic Engineering, Physical and Theoretical Chemistry, 0210 nano-technology, business, Intensity (heat transfer)
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المؤلفون: Wenhua Zhu, Patrick P. Naulleau, Ryan Miyakawa, Lei Chen
المصدر: Extreme Ultraviolet (EUV) Lithography X.
مصطلحات موضوعية: Physics, Interferometry, Amplitude, Optics, Illumination angle, business.industry, Extreme ultraviolet lithography, Detector, Phase (waves), Interference (wave propagation), Phase retrieval, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b543992381083af40157960203ad1bb4
https://doi.org/10.1117/12.2518057 -
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المؤلفون: Wenhua Zhu, Sharon Oh, Patrick P. Naulleau, Christopher N. Anderson, Michael Dickenson, Jeff Gamsby, Weilun Chao, Carl Cork, Seno Rekawa, Geoff Gaines, Gideon Jones, Ryan Miyakawa
المساهمون: Goldberg, Kenneth A
مصطلحات موضوعية: Physics, Diffraction, Wavefront, Interferometry, Light source, Optics, business.industry, Extreme ultraviolet lithography, Shearing interferometer, business, Projection (set theory), Lithography, Eye Disease and Disorders of Vision
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e1ec09d61f09b789c160cc41554dc0f1
https://escholarship.org/uc/item/7xf352nz