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1مؤتمر
المؤلفون: Xin Peng Wang, Ming-Fu Li, H. Y. Yu, C. Ren, W. Y. Loh, C. X. Zhu, Albert Chin, A. D. Trigg, Yee-Chia Yeo, S. Biesemans, G. Q. Lo, D. L. Kwong
المصدر: 2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on. :424-426 Oct, 2006
Relation: 2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings
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المؤلفون: V. Vega-Gonzalez, D. Radisic, S. Choudhury, D. Tierno, A. Thiam, D. Batuk, G.T. Martinez, F. Seidel, S. Decoster, S. Kundu, D. Tsvetanova, A. Peter, H. De Coster, A. Sepulveda-Marquez, E. Altamirano-Sanchez, Bt Chan, Y. Drissi, Y. Sherazi, J. Uk-Lee, I. Ciofi, G. Murdoch, N. Nagesh, G. Hellings, J. Ryckaert, S. Biesemans, E. Dentoni Litta, N. Horiguchi, S. Park, Zs. Tokei
المصدر: 2022 International Electron Devices Meeting (IEDM).
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f9b19ff76457aea9272a0db1975d3005
https://doi.org/10.1109/iedm45625.2022.10019483 -
3دورية أكاديمية
لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل. -
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المؤلفون: H. Arimura, L.-A. Ragnarsson, Y. Oniki, J. Franco, A. Vandooren, S. Brus, A. Leonhardt, P. Sippola, T. Ivanova, G. Alessio Verni, R.-J. Chang, Q. Xie, M. Givens, J. Mitard, S. Biesemans, E. Dentoni Litta, N. Horiguchi
المصدر: 2021 IEEE International Electron Devices Meeting (IEDM).
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cd5025589e1bb0bae4fbe0209aa210b4
https://doi.org/10.1109/iedm19574.2021.9720527 -
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المؤلفون: A. Gupta, D. Radisic, J. W. Maes, O. Varela Pedreira, J-P. Soulie, N. Jourdan, H. Mertens, S. Bandyopadhyay, Q. T. Le, A. Pacco, N. Heylen, K. Vandersmissen, K. Devriendt, C. Zhu, S. Datta, F. Sebaai, S. Wang, M. Mousa, J. Lee, J. Geypen, B. De Wachter, B. Chehab, S. M. Salahuddin, G. Murdoch, S. Biesemans, Zs. Tokei, E. Dentoni Litta, N. Horiguchi
المصدر: 2021 IEEE International Electron Devices Meeting (IEDM).
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e66c9cc4bb0398fd54448f81e0f92e27
https://doi.org/10.1109/iedm19574.2021.9720684 -
6تقرير
المؤلفون: G. P. Lansbergen, R. Rahman, J. Verduijn, G. C. Tettamanzi, N. Collaert, S. Biesemans, G. Klimeck, L. C. L. Hollenberg, S. Rogge
المصدر: Physical Review Letters. 107(13)
URL الوصول: https://ntrs.nasa.gov/citations/71937768919780
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المؤلفون: Kateryna Lyakhova, Chris Spence, S. Biesemans, E. De Poortere, Werner Gillijns, Mircea Dusa, David Rio, K. Nafus, P. van Adrichem, Eric Hendrickx, Jörn-Holger Franke, Victor Blanco
المصدر: International Conference on Extreme Ultraviolet Lithography 2018.
مصطلحات موضوعية: Depth of focus, Materials science, Computational lithography, business.industry, Extreme ultraviolet lithography, 02 engineering and technology, Grating, 021001 nanoscience & nanotechnology, Logic synthesis, Optics, Line (geometry), 0202 electrical engineering, electronic engineering, information engineering, 020201 artificial intelligence & image processing, 0210 nano-technology, business, Scaling, Energy (signal processing)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9dcc7871d6fce1c89fefeaece001d5e7
https://doi.org/10.1117/12.2503321 -
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المؤلفون: Joost Bekaert, Guido Schiffelers, G. McIntyre, Michiel Kupers, E. De Poortere, Werner Gillijns, Ming Mao, Mircea Dusa, Eric Hendrickx, Jörn-Holger Franke, V. M. Blanco Carballo, J. Jia, Ling Ee Tan, M. Demand, R. H. Kim, K. Nafus, Stephen Hsu, David Rio, S. Biesemans, Youssef Drissi
المصدر: Extreme Ultraviolet (EUV) Lithography IX.
مصطلحات موضوعية: 010302 applied physics, Materials science, Single exposure, business.industry, Extreme ultraviolet lithography, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Optics, Resist, Stack (abstract data type), 0103 physical sciences, Retargeting, 0210 nano-technology, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c51ef1947107e04659c67949f11a74f7
https://doi.org/10.1117/12.2299639 -
9دورية أكاديمية
المصدر: Science and Technology of Advanced Materials, Vol 8, Iss 3, p 214 (2007)
مصطلحات موضوعية: Materials of engineering and construction. Mechanics of materials, TA401-492, Biotechnology, TP248.13-248.65
وصف الملف: electronic resource
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المؤلفون: S. Van Elshocht, J. Swerts, S. Biesemans, Hui Yu, T. Y. Hoffmann, X.P. Wang, Marc Aoulaiche, Annelies Delabie, A. Akheyar, Laura Nyns, S.Z. Chang, Christoph Kerner, Philippe Absil, C. Adelmann
المصدر: IEEE Electron Device Letters. 29:430-433
مصطلحات موضوعية: Materials science, CMOS, MOSFET, Electrode, Electronic engineering, Analytical chemistry, Equivalent oxide thickness, Dielectric, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Leakage (electronics), High-κ dielectric, Ion