المؤلفون: Sang Mun Chon, Sang Bong Choi, Dong Chun Lee, Chung Sam Jun, Sung Gon Ryu, Sun Yong Choi

المصدر: 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) Semiconductor manufacturing Semiconductor Manufacturing Symposium, 2001 IEEE International. :359-362 2001

Relation: 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings

المؤلفون: Sang-Mun Chon, Sang-Bong Choi, Yong-Wan Kim, Kye-Weon Kim, Kyu-Hong Lim, Sun-Yong Choi, Chung-Sam Jun

المصدر: 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) Semiconductor manufacturing Semiconductor Manufacturing Symposium, 2001 IEEE International. :399-401 2001

Relation: 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings

المؤلفون: Tomoyuki Yuba, Sang Mun Chon, Masao Tomikawa, Won Mi Kim, Jae Hyun Kim, Yong-Ho Kim

المصدر: Journal of Photopolymer Science and Technology. 17:233-236

مصطلحات موضوعية: chemistry.chemical_classification, Materials science, Polymers and Plastics, Base (chemistry), Organic Chemistry, Pressure dependency, Polymer, Solvent, chemistry, Photosensitivity, Materials Chemistry, Monitoring methods, Composite material, Dissolution, Polyimide

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::737e53bfeed497033850256e0d5a9855
https://doi.org/10.2494/photopolymer.17.233

المؤلفون: Hiroaki Nemoto, Masahiro Noda, Yoshikazu Yamaguchi, Yong-Ho Kim, Yutaka Makita, Tomoki Nagai, Sang Mun Chon, Jae Hyun Kim

المصدر: Journal of Photopolymer Science and Technology. 17:379-384

مصطلحات موضوعية: Materials science, Polymers and Plastics, Annealing (metallurgy), Atomic force microscopy, Deblocking filter, Stereochemistry, Organic Chemistry, Acetal, Analytical chemistry, Photoresist, Line edge roughness, chemistry.chemical_compound, chemistry, Materials Chemistry

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7b359c92099027a452512d3c96cbf676
https://doi.org/10.2494/photopolymer.17.379

المؤلفون: Yoshiomi Hiroi, Takashi Matsumoto, Rikimaru Sakamoto, Sangwoong Yoon, Young-Ho Kim, Sang-Mun Chon, Daisuke Maruyama, Seok Jin Han, Young-Hoon Kim, Yasushi Sakaida, Yasuyuki Nakajima, EunYoung Yoon, Takahiro Kishioka

المصدر: SPIE Proceedings.

مصطلحات موضوعية: chemistry.chemical_classification, Materials science, Etching rate, technology, industry, and agriculture, Nanotechnology, Polymer, Weight control, law.invention, Resist, chemistry, Polymerization, law, Addition polymer, sense organs, Photolithography, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::19ff2498295652027cb303df1156d146
https://doi.org/10.1117/12.599421

المؤلفون: Jeong Yun Ya, Sang-Mun Chon, Myungsun Kim, Kim Boo Deuk, Min-Ho Jung, Hong Lee, Young-Ho Kim, Don Winning, Do Young Kim, Young-Hoon Kim, Beom-Sang Yoo, Sangwoong Yoon, Eun-Soon Chung

المصدر: SPIE Proceedings.

مصطلحات موضوعية: chemistry.chemical_classification, Materials science, Vapor pressure, Humidity, Nanotechnology, Polymer, engineering.material, Solvent, Adsorption, Coating, chemistry, engineering, Solvent effects, Composite material, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::78a007130fae671a33e556be4f395c9d
https://doi.org/10.1117/12.533924

المؤلفون: Sang-Mun Chon, Kyung-Mee Kim, Jae-Hyun Kim, Chang-Ho Lee, Sang Sik Moon, Young-Ho Kim, Shi Yong Lee, Seok Bong Park, Sangwoong Yoon, Won Mi Kim

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, Resist, Deblocking filter, Annealing (metallurgy), Atomic force microscopy, Analytical chemistry, Activation energy, Photoresist

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::faff381dd949f2167b3fbb2ef6000bdd
https://doi.org/10.1117/12.533880

المؤلفون: Kyung-Mee Kim, Yasuhisa Sone, Takahiro Kishioka, Sang-Gyun Woo, Shi Yong Lee, Sang-Mun Chon, Myungsun Kim, Sangwoong Yoon, Jae-Hyun Kim, Hyun-woo Kim, Young-Ho Kim, Yasuyuki Nakajima

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Depth of focus, Materials science, business.industry, engineering.material, Reflectivity, law.invention, Optics, Resist, Coating, law, engineering, Photolithography, Composite material, business, Shrinkage

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::70f52b8275d81c7fbc6af68457b6eaa5
https://doi.org/10.1117/12.533884

المؤلفون: Shi Yong Lee, Kim Boo Deuk, Do Young Kim, Sangwoong Yoon, Hong Lee, Myungsun Kim, Kyung-Mee Kim, Young-Ho Kim, Young-Hoon Kim, Sang-Mun Chon, Jae-Hyun Kim

المصدر: SPIE Proceedings.

مصطلحات موضوعية: chemistry.chemical_classification, Materials science, Molecular size, Resist, chemistry, Polymer chemistry, Dispersity, Analytical chemistry, Fraction (chemistry), Polymer, Line edge roughness, Mass fraction, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0ec35f928fe5a2444bf8c2af432da182
https://doi.org/10.1117/12.533950

المؤلفون: Young-Ho Kim, Sang Mun Chon, Yong-Hoon Kim, Sangwoong Yoon, Hoe-sik Chung, Yasuyuki Nakajima, Ken-Ichi Mizusawa, Tomoyuki Enomoto, Keisuke Nakayama

المصدر: Advances in Resist Technology and Processing XX.

مصطلحات موضوعية: Materials science, Plasma etching, business.industry, engineering.material, Photoresist, law.invention, Anti-reflective coating, Optics, Resist, Coating, Etching (microfabrication), law, engineering, Optoelectronics, Thin film, business, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1063302bbf4bb01fabc7f3d57b4a6fde
https://doi.org/10.1117/12.485060