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1
المؤلفون: Scott Jessen, Mizuki Watanabe, Steve Prins, Jing Shu, Can Duan, Chi-Chien Ho, David Ziger
المصدر: Optical Microlithography XXXI.
مصطلحات موضوعية: Depth of focus, Optical proximity correction, Computer science, Proximity effect (audio), Process (computing), Electronic engineering, Node (circuits), Process window, Lithography, Exposure latitude
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::83c81988cb090fe8362ac316a2fcbb1c
https://doi.org/10.1117/12.2297219 -
2
المؤلفون: Scott Jessen, James Walter Blatchford, Steven L. Prins, Ki-Ho Baik, Linyong Pang, Bob Gleason, Thuc Dam
المصدر: ECS Transactions. 27:449-454
مصطلحات موضوعية: Set (abstract data type), Scheme (programming language), Computer science, Hardware_INTEGRATEDCIRCUITS, Wafer, Node (circuits), Function (mathematics), Topology, computer, Scaling, computer.programming_language
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3
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Interconnection, Optics, Semiconductor, Materials science, Optical proximity correction, business.industry, Process control, Measurement uncertainty, Photoresist, business, Engineering physics, Critical dimension, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::25bb8040de07b164402a5d2b4160c16e
https://doi.org/10.1117/12.882183 -
4
المؤلفون: Linyong Pang, Scott Jessen, Bob Gleason, Thuc Dam, Guangming Xiao, Steve Prins, Simon Chang, James Walter Blatchford
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Resolution enhancement technologies, Pixel, Computer science, Numerical aperture, Visualization, Metal, Logic gate, visual_art, visual_art.visual_art_medium, Process window, Algorithm, Lithography, Random logic, Simulation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ebbc0de05d94d65f1cea3a050d548c8f
https://doi.org/10.1117/12.814197 -
5
المؤلفون: Yiming Gu, Scott Jessen, Chris Sallee, James Walter Blatchford, Steve Prins, Simon Chang, Dale Legband, Mark D. Smith
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Scanning electron microscope, Computer science, Process (computing), Electronic packaging, Photoresist, law.invention, Design for manufacturability, Computer engineering, Optical proximity correction, Resist, law, Hardware_INTEGRATEDCIRCUITS, Node (circuits), Wafer, Process window, Photolithography, Lithography, Simulation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9c536ff7db7fef3b3f338c5ccdc0edb8
https://doi.org/10.1117/12.772685 -
6
المؤلفون: Thuc Dam, Scott Jessen, Lewis W. Flanagin, Guangming Xiao, Bob Gleason, Steve Prins, Timothy Lin, Simon Chang, James Walter Blatchford, Sean C. O'Brien
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Resolution enhancement technologies, Optical proximity correction, Computer engineering, Pixel, Computer science, Process window, Lithography process, Random logic, Lithography, Simulation, Design for manufacturability
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::14c04f0400b33deec0a7dfabd71ae448
https://doi.org/10.1117/12.774581 -
7
المؤلفون: Thomas Wolf, Robert A. Soper, Willie J. Yarbrough, Scott Jessen, Mark E. Mason, Sean C. O'Brien, Mark Terry
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Optics, Optical proximity correction, business.industry, Margin (machine learning), Node (circuits), Off-axis illumination, business, Contact hole, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7690f1e9205a652ad1e7c8d7ef249ffc
https://doi.org/10.1117/12.660120 -
8
المؤلفون: Sopa Chevacharoenkul, Patrick Reynolds, Scott Jessen, Winston Yan, Venugopal Vellanki, Jan Hauschild, Marco Pieters, Joe Ganeshan, Gary Zhang, Qizhi He, Stephen J. DeMoor
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Depth of focus, Back end of line, Focus (computing), Engineering, Optics, business.industry, Electronic engineering, Wafer, business, Focus variation, Front end of line, Immersion lithography, Die (integrated circuit)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b8d9193e4842606b9269ba8f48f3a68e
https://doi.org/10.1117/12.657752 -
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المؤلفون: Thomas Wolf, Robert A. Soper, Scott Jessen, Sean C. O'Brien, Mark Terry, Mark E. Mason
المصدر: Design and Process Integration for Microelectronic Manufacturing III.
مصطلحات موضوعية: Engineering, Depth of focus, Optics, business.industry, Optical engineering, Node (circuits), Off-axis illumination, business, Focus (optics), Random logic, Lithography, Numerical aperture
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::eb66738cfef8b7a2484876ec5cf35777
https://doi.org/10.1117/12.600005 -
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المؤلفون: Kurt G. Steiner, Mitsuru Sato, Ming Hui Fan, William D. Josephson, Chung Yih Lee, Thomas Michael Wolf, Steven Alan Lytle, Scott Jessen
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, business.industry, Copper interconnect, Low-k dielectric, Nanotechnology, Dielectric, Chemical vapor deposition, engineering.material, law.invention, Semiconductor, Resist, Coating, law, engineering, Photolithography, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d2c106879f27c58dc7fb1736d709a788
https://doi.org/10.1117/12.474632