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المؤلفون: Jeffrey Weintraub, Scott Warrick
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII.
مصطلحات موضوعية: Generality, Casual, Yield (finance), Industry standard, Code (cryptography), Algorithm, Die (integrated circuit), Mathematics, Causal analysis
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2b02ecf4654604682879a5f561ae119b
https://doi.org/10.1117/12.2515080 -
2كتاب إلكتروني
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المؤلفون: Jeffrey Weintraub, Scott Warrick
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII.
مصطلحات موضوعية: Contamination control, Computer science, Control limits, Control (management), Outlier, Process (computing), Anomaly detection, Data mining, computer.software_genre, computer
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2ca56f4a0187cc9f09a08dcfe3e60f07
https://doi.org/10.1117/12.2297379 -
4
المؤلفون: Scott Warrick, Jeffrey Weintraub
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Data collection, Computer science, Process (engineering), Control (management), Sampling (statistics), Sample (statistics), 02 engineering and technology, 021001 nanoscience & nanotechnology, computer.software_genre, 01 natural sciences, Industrial engineering, 010309 optics, Work (electrical), 0103 physical sciences, Process control, Data mining, Product (category theory), 0210 nano-technology, Sampling methodology, computer
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d8df31422df4e633ead7c0c9052c5375
https://doi.org/10.1117/12.2258031 -
5
المؤلفون: Jeffrey Weintraub, Scott Warrick
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Short run, Computer science, Process (computing), 02 engineering and technology, Geometric distribution, 021001 nanoscience & nanotechnology, Statistical process control, 01 natural sciences, Stability (probability), 010309 optics, Sampling distribution, 0103 physical sciences, Process control, Probability distribution, 0210 nano-technology, Algorithm
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b76f6e7f5660b8129c67b7352ce8fb1a
https://doi.org/10.1117/12.2218623 -
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المؤلفون: Scott Warrick, S. Gaugiran, Bénédicte Mortini, David Cruau, M. Benndorf, Romain Feilleux, C. Sourd, Vincent Farys
المصدر: Microelectronic Engineering. 84:1054-1057
مصطلحات موضوعية: Chemistry, Nanotechnology, Photoresist, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Barrier layer, Resist, Chemical engineering, law, Immersion (virtual reality), Leaching (metallurgy), Electrical and Electronic Engineering, Photolithography, Lithography, Immersion lithography
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المؤلفون: Scott Warrick, Will Conley, Mazen Saied, Yves Rody, Christian Gardin, Jonathan Planchot, Christophe Couderc, Patrick Montgomery, Pierre-Jerome Goirand, Catherine Martinelli, Amandine Borjon, Frank Sundermann, Bill Wilkinson, Yorick Trouiller, Jean-Christophe Urbani, Frederic Robert, Laurent Le Cam, Florent Vautrin, G. Kerrien, Jerome Belledent, Emic Yesilada, Vincent Farys
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Resolution enhancement technologies, Computer science, Transistor, Integrated circuit, Design for manufacturability, law.invention, law, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Multiple patterning, Process window, System on a chip, Photolithography, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c32fba57c3e8540d10beaa1e15e963b6
https://doi.org/10.1117/12.714116 -
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المؤلفون: Michael Benndorf, Jan-Willem Gemmink, Vincent Farys, Scott Warrick, Yorick Trouiller, Pascal Gouraud, Jerome Belledent, Dejan Jovanovic, Will Conley
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Computational lithography, business.industry, law.invention, Optics, law, Thin-film interference, Process integration, Optoelectronics, Node (circuits), Photolithography, business, Lithography, Immersion lithography, Next-generation lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d2833a86ea69029b79b3814fb7e7475f
https://doi.org/10.1117/12.716807 -
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المؤلفون: Vincent Farys, Catherine Chaton, Scott Warrick, Jean-Damien Chapon
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, business.industry, Chemical vapor deposition, law.invention, Wavelength, Optics, Anti-reflective coating, Stack (abstract data type), law, Process window, Photolithography, business, Lithography, Immersion lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::517e1f6e5ccef75dc19c77487a65f25c
https://doi.org/10.1117/12.712882 -
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المؤلفون: Michael Benndorf, Vincent Farys, Scott Warrick, Karim Mestadi, Danilo DeSimone, Will Conley, Jan-Willem Gemmink, David Cruau
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Optical proximity correction, Resist, Computer science, law, Miniaturization, Nanotechnology, Photolithography, Engineering physics, Lithography, Immersion lithography, Numerical aperture, law.invention
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e8417bde10dfb046a9ed0843b37b180e
https://doi.org/10.1117/12.715987