نتائج البحث - "Sean D. Burns"

1

Speeding up OPC by leveraging existing designs with machine learning

المؤلفون: Cheng Chi, Julian Dolby, Sean D. Burns, Jeffrery C. Shearer, Derren N. Dunn

المصدر: Design-Process-Technology Co-optimization XV.

مصطلحات موضوعية: Computer engineering, Computer science, business.industry, Extreme ultraviolet lithography, Multilayer perceptron, Hardware_INTEGRATEDCIRCUITS, Calibration, Cloud computing, Learning based, IBM, business, Lithography, Power (physics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::842561759419e20b7fe260962c0254eb
https://doi.org/10.1117/12.2584621

2

Dual tone sub-resolution assist features to improve corner rounding

المؤلفون: Jeff Shearer, Geng Han, Oseo Park, Jing Guo, Cheng Chi, Charlie King, Hao Tang, Jing Xue, Sean D. Burns

المصدر: Optical Microlithography XXXIII.

مصطلحات موضوعية: Reduction (complexity), Tone (musical instrument), Resist, Feature (computer vision), Computer science, Rounding, Hardware_INTEGRATEDCIRCUITS, % area reduction, Algorithm, Resolution (algebra), Dual (category theory)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cfbfcbc4e5762638c2f7cda8cf8b1eac
https://doi.org/10.1117/12.2550834

3

Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle

المصدر: SPIE Proceedings.

مصطلحات موضوعية: 010302 applied physics, Materials science, Current distribution, business.industry, Extreme ultraviolet lithography, Process (computing), Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Rectification, Etching (microfabrication), Test structure, Distortion, 0103 physical sciences, Optoelectronics, Dislocation, 0210 nano-technology, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3a4b933760d1c45cd8d50035676700bf
https://doi.org/10.1117/12.2260454

4

Directed self-assembly patterning for forming fin field effect transistors

المؤلفون: Richard A. Farrell, Fee Li Lie, Michael A. Guillorn, Hoa Truong, Elliott Franke, Sean D. Burns, Matthew E. Colburn, Akiteru Ko, Mark Somervell, Nelson Felix, John C. Arnold, David Hetzer, Hsinyu Tsai, Stuart A. Sieg, Kafai Lai, Chi-Chun Liu, Daniel P. Sanders

المصدر: SPIE Newsroom.

مصطلحات موضوعية: Directed self assembly, Materials science, Fin, business.industry, Optoelectronics, Field-effect transistor, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b0f7f1588d44e7df8463769208c909dc
https://doi.org/10.1117/2.1201606.006519

5

FINFET technology featuring high mobility SiGe channel for 10nm and beyond

المؤلفون: Kerem Akarvardar, K-Y Lim, R. Mo, Bruce B. Doris, Richard G. Southwick, Muthumanickam Sankarapandian, F. Lie, Dechao Guo, Bhagawan Sahu, Huiming Bu, Stuart A. Sieg, Chun Wing Yeung, Junli Wang, Andreas Knorr, Tenko Yamashita, John R. Sporre, Matthew E. Colburn, Nelson Felix, Jody A. Fronheiser, D. K. Sadana, Neeraj Tripathi, Jay W. Strane, R. Divakaruni, P. Oldiges, Gauri Karve, Derrick Liu, T. Hook, Shogo Mochizuki, Nicolas Loubet, Sean D. Burns, Vijay Narayanan, Rajasekhar Venigalla, James Chingwei Li, Pouya Hashemi, Dinesh Gupta, Koji Watanabe, James J. Demarest, Victor Chan, Ruqiang Bao, S. Kanakasabapathy, Robert R. Robison, Mukesh Khare, Stephen W. Bedell, Pietro Montanini, Hemanth Jagannathan, Vamsi Paruchuri, Gen Tsutsui, Kangguo Cheng, James H. Stathis, James J. Kelly, Reinaldo A. Vega, Jacob Ajey Poovannummoottil, Miaomiao Wang

المصدر: 2016 IEEE Symposium on VLSI Technology.

مصطلحات موضوعية: 010302 applied physics, business.industry, Computer science, Electrical engineering, Hardware_PERFORMANCEANDRELIABILITY, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Reliability (semiconductor), CMOS, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, Node (circuits), 0210 nano-technology, business, Technology insertion, Communication channel

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d9013e63588fce0b723f1726672dc180
https://doi.org/10.1109/vlsit.2016.7573360

6

Lithographic qualification of high-transmission mask blank for 10nm node and beyond

المؤلفون: Matthew E. Colburn, Dan Fischer, Nelson Felix, Sean D. Burns, Yoshifumi Sakamoto, Todd Bailey, Tom Faure, Lin Hu, Ben Bleiman, Granger Lobb, Ioana Graur, Richard Wistrom, John Bolton, Yongan Xu, Ramya Viswanathan, John C. Arnold, Yusuke Toda, Yann Mignot

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Depth of focus, Materials science, business.industry, Bar (music), 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Blank, 010309 optics, Optics, Resist, 0103 physical sciences, Transmittance, Wafer, Process window, 0210 nano-technology, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8cf4aad52b54ccc553777f5e5301f37a
https://doi.org/10.1117/12.2219778

7

DSA patterning options for FinFET formation at 7nm node

المؤلفون: Richard A. Farrell, Michael A. Guillorn, Sean D. Burns, Kafai Lai, Fee Li Lie, Hsinyu Tsai, Elliott Franke, Stuart A. Sieg, Matthew E. Colburn, Nelson Felix, John C. Arnold, Daniel P. Sanders, David Hetzer, Hoa Truong, Chi-Chun Charlie Liu, Akiteru Ko, Mark Somervell

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Fabrication, Fin, Silicon, Computer science, chemistry.chemical_element, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, 010309 optics, chemistry, 0103 physical sciences, Electronic engineering, Node (circuits), 0210 nano-technology, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3c0994496273b2831133bf7a7a6a0cd1
https://doi.org/10.1117/12.2219670

8

Process Window Centering for 22 nm Lithography

المؤلفون: Sumanth Kini, Andrew Stamper, Charu Tejwani, Sang Y. Chong, Carol Boye, Ralf Buengener, Roland Hahn, Bryan N. Rhoads, Sean D. Burns, Kourosh Nafisi, Colin J. Brodsky, S. Fan

المصدر: IEEE Transactions on Semiconductor Manufacturing. 24:165-172

مصطلحات موضوعية: Engineering drawing, Engineering, business.industry, Condensed Matter Physics, Industrial and Manufacturing Engineering, Finite element method, Die (integrated circuit), Electronic, Optical and Magnetic Materials, law.invention, Resist, law, Electronic engineering, Process window, Electrical and Electronic Engineering, Photolithography, Focus (optics), business, Lithography, Critical dimension

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::50cfd0b0aee5204dab868442dbd3ea7c
https://doi.org/10.1109/tsm.2011.2106807

9

The Photopolymer Science and Technology Award

المؤلفون: Robert D. Allen, David R. Medeiros, Karen Petrillo, Dirk Pfeiffer, Anthony D. Lisi, Daniel P. Sanders, Shozo Shirai, Dah Chung Owe-Yang, Libor Vylicky, John C. Arnold, Kazumi Noda, Seiichiro Tachibana, Sean D. Burns, Dario L. Goldfarb

المصدر: Journal of Photopolymer Science and Technology. 22:7-11

مصطلحات موضوعية: Materials science, Polymers and Plastics, Organic Chemistry, Materials Chemistry, Art history, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e5ed3b2b5e308a7785f8ab69279dd393
https://doi.org/10.2494/photopolymer.22.7

10

Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography

المؤلفون: Robert D. Allen, Sean D. Burns, John C. Arnold, Dah Chung Owe-Yang, Dario L. Goldfarb, Kazumi Noda, Seiichiro Tachiban, Dirk Pfeiffer, Anthony D. Lisi, Shozo Shirai, Libor Vyklicky, David R. Medeiros, Daniel D. Sanders, Karen Petrillo

المصدر: Journal of Photopolymer Science and Technology. 21:397-404

مصطلحات موضوعية: Materials science, Polymers and Plastics, business.industry, Organic Chemistry, Photoresist, Molar absorptivity, Surface energy, law.invention, Anti-reflective coating, Optics, law, Materials Chemistry, Optoelectronics, X-ray lithography, business, Refractive index, Lithography, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b903fb1e0cda62c44a0f1b00fca4404f
https://doi.org/10.2494/photopolymer.21.397

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