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المؤلفون: Patrick P. Naulleau, Daniel Zehm, Lauren McQuade, Wenhua Zhu, Christopher L. Anderson, Jason DePonte, Seno Rekawa, Eric M. Gullikson, M.R. Dickinson, Weilun Chao, Farhad Salmassi, Jeff Gamsby, Ryan Miyakawa, Will Cork, Rene Delano, Lucas Conley, Carl Cork, Brandon Vollmer, Geoff Gaines, Arnaud P. Allezy, Gideon Jones
المصدر: Extreme Ultraviolet (EUV) Lithography XI.
مصطلحات موضوعية: Scanner, Materials science, business.industry, Extreme ultraviolet lithography, Photoresist, Vibration, symbols.namesake, Fourier transform, Vibration isolation, Optics, Resist, symbols, business, MOX fuel
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6fcdd18ed1291baa8f99cac8ae4dcc2d
https://doi.org/10.1117/12.2552125 -
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المؤلفون: Wenhua Zhu, Sharon Oh, Patrick P. Naulleau, Christopher N. Anderson, Michael Dickenson, Jeff Gamsby, Weilun Chao, Carl Cork, Seno Rekawa, Geoff Gaines, Gideon Jones, Ryan Miyakawa
المساهمون: Goldberg, Kenneth A
مصطلحات موضوعية: Physics, Diffraction, Wavefront, Interferometry, Light source, Optics, business.industry, Extreme ultraviolet lithography, Shearing interferometer, business, Projection (set theory), Lithography, Eye Disease and Disorders of Vision
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e1ec09d61f09b789c160cc41554dc0f1
https://escholarship.org/uc/item/7xf352nz -
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المؤلفون: Seno Rekawa, Patrick P. Naulleau, Kenneth A. Goldberg, Hak-Seung Han, C. D. Kemp, Iacopo Mochi, Sungmin Huh, E. H. Anderson, R. F. Gunion
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2220-2224
مصطلحات موضوعية: Physics, business.industry, Extreme ultraviolet lithography, Charge coupled device camera, Mask inspection, Condensed Matter Physics, law.invention, Numerical aperture, Lens (optics), Optics, law, Extreme ultraviolet, Optoelectronics, Electrical and Electronic Engineering, business, Image resolution, Aerial image
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المؤلفون: Seno Rekawa, Christopher N. Anderson, Erik H. Anderson, Kenneth A. Goldberg, Chang-Hoon Choi, Nord Andreson, Farhad Salmassi, Weilun Chao, Patrick P. Naulleau, Seong-Sue Kim, Ryan Miyakawa, Eric M. Gullikson, Jongju Park, Donggun Lee
المصدر: Optics express. 22(17)
مصطلحات موضوعية: Diffraction, Point spread function, Physics, business.industry, Extreme ultraviolet lithography, Atomic and Molecular Physics, and Optics, Optics, Extreme ultraviolet, Microscopy, Harmonic, High harmonic generation, Focal length, Optoelectronics, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2b844c9ca80bd9df805ac53d1c34ad4a
https://pubmed.ncbi.nlm.nih.gov/25321224 -
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المؤلفون: Lorie-Mae Baclea-an, Seno Rekawa, Kenneth A. Goldberg, Nathan Smith, Patrick P. Naulleau, Brittany M. McClinton, Ryan Miyakawa, Simi George, Paul Denham, Christopher N. Anderson, Gideon Jones
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Nanolithography, Resist, business.industry, Extreme ultraviolet, Extreme ultraviolet lithography, Optoelectronics, Photoresist, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e477ad57b79da91c23f4aa0e6afa1fcb
https://doi.org/10.1117/12.882955 -
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المؤلفون: Ryan Miyakawa, Kenneth A. Goldberg, Tom Wallow, Gideon Jones, Paul Denham, Brittany M. McClinton, Simi George, Christopher N. Anderson, Seno Rekawa, Patrick P. Naulleau, Iacopo Mochi, Lorie-Mae Baclea-an, Warren Montgomery
المصدر: 27th European Mask and Lithography Conference.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Undulator, Synchrotron, law.invention, Numerical aperture, Nanolithography, Optics, Light source, Resist, law, Extreme ultraviolet, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ca122ec4299beb62decb82df0829a00d
https://doi.org/10.1117/12.885420 -
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المؤلفون: Brittany M. McClinton, Ryan Miyakawa, Tom Wallow, Paul Denham, David Chan, Seno Rekawa, Gideon Jones, Brian Hoef, Christopher N. Anderson, Kenneth A. Goldberg, Simi George, Warren Montgomery, Patrick P. Naulleau, Chawon Koh, Bruno La Fontaine, Lorie-Mae Baclea-an
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Resolution enhancement technologies, business.industry, Extreme ultraviolet lithography, law.invention, Numerical aperture, Optics, Nanolithography, Resist, law, Extreme ultraviolet, Optoelectronics, Photolithography, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b874b6f78f530d355e1bf0a616ab6a21
https://doi.org/10.1117/12.848438 -
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المؤلفون: Obert Wood, P. Kearney, Hak-Seung Han, John S. Taylor, Kenneth A. Goldberg, Bruno M. LaFontaine, Seno Rekawa, Anton Barty
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Microscope, business.industry, Extreme ultraviolet lithography, education, Mask inspection, Substrate (printing), humanities, law.invention, stomatognathic diseases, Optics, law, Extreme ultraviolet, Optoelectronics, Detection rate, Photolithography, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ced9651d61d7ab1a8edb97ff74948570
https://doi.org/10.1117/12.686742 -
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المؤلفون: Anne-Sophie Morlens, Kim Dean, Jason P. Cain, Kenneth A. Goldberg, Erik H. Anderson, Seno Rekawa, Patrick P. Naulleau, Brian Hoef, Paul Denham, Keith Jackson
المصدر: Naulleau, Patrick; Goldberg, Kenneth A.; Anderson, Erik; Cain, Jason P.; Denham, Paul; Hoef, Brian; et al.(2005). EUV microexposures at the ALS using the 0.3-NA MET projection optics. Lawrence Berkeley National Laboratory. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/645415mp
مصطلحات موضوعية: Engineering, Fabrication, business.industry, Extreme ultraviolet lithography, Illuminance, Projection optics, Light source, Optics, Resist, Extreme ultraviolet, Optoelectronics, Materials Sciences, business, Coherence (physics)
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d7cde30d439c7e419ca8deb0d6fcbd97
http://www.escholarship.org/uc/item/645415mp -
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المؤلفون: Paul Denham, Kristine Rosfjord, David Attwood, Eric M. Gullikson, Charles D. Kemp, Phillip J. Batson, Seno Rekawa
المصدر: The 16th Annual Meeting of the IEEE Lasers and Electro-Optics Society, 2003. LEOS 2003..
مصطلحات موضوعية: Physics, Range (particle radiation), Photon, business.industry, Astrophysics::High Energy Astrophysical Phenomena, X-ray optics, Ranging, Undulator, Wavelength, Interferometry, Optics, Extreme ultraviolet, Optoelectronics, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::20ba6f011c214651576156f3a6f12a4d
https://doi.org/10.1109/leos.2003.1251654
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