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1
المؤلفون: Anshul Gupta, Zheng Tao, Dunja Radisic, Hans Mertens, Olalla Varela Pedreira, Steven Demuynck, Juergen Boemmels, Katia Devriendt, Nancy Heylen, Shouhua Wang, Karine Kenis, Lieve Teugels, Farid Sebaai, Christophe Lorant, Nicolas Jourdan, Boon Teik Chan, Sujith Subramanian, Filip Schleicher, Antony Peter, Nouredine Rassoul, Yong Kong Siew, Basoene Briggs, Dasiy Zhou, Erik Rosseel, Elena Capogreco, Geert Mannaert, Alfonso Sepúlveda Márquez, Emmanuel Dupuy, Kevin Vandersmissen, Bilal Chehab, Gayle Murdoch, Efrain Altamirano-Sánchez, Serge Biesemans, Zsolt Tokei, Eugenio Dentoni Litta, Naoto Horiguchi
المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XI.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b4e39fa928e22ebd2961927d5db215ec
https://doi.org/10.1117/12.2615641 -
2
المؤلفون: Serge Biesemans, S. B. Samavedam, Julien Ryckaert, Eric Beyne, Naoto Horiguchi, Alessio Spessot, Iuliana Radu, M. H. Na, Kurt G. Ronse, Marie Garcia Bardon, Zsolt Tokei
المصدر: 2020 IEEE International Electron Devices Meeting (IEDM).
مصطلحات موضوعية: 010302 applied physics, Standard cell, Computer science, Extreme ultraviolet lithography, 02 engineering and technology, 01 natural sciences, 020202 computer hardware & architecture, Logic gate, 0103 physical sciences, 0202 electrical engineering, electronic engineering, information engineering, Electronic engineering, Node (circuits), Static random-access memory, Cache, Scaling, Electronic circuit
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2000f701b29ad7cc7fb7a49d18258e9f
https://doi.org/10.1109/iedm13553.2020.9372023 -
3
المؤلفون: P. Morin, Julien Ryckaert, Doyoung Jang, Lieve Teugels, Efrain Altamirano-Sanchez, M. H. Na, Jürgen Bömmels, F. Schleicher, S. Wang, A. Sepúlveda, Serge Biesemans, C. Lorant, I. Demonie, Gayle Murdoch, E. Dentoni Litta, A. Lesniewska, Zsolt Tokei, Bilal Chehab, Farid Sebaai, Antony Premkumar Peter, N. Nagesh, Naoto Horiguchi, Frederic Lazzarino, Boon Teik Chan, Geert Hellings, O. Varela Pedreira, N. Jourdan, D. Radisic, O. Richard, Z. Tao, Hans Mertens, P. Marien, Anshul Gupta, Nancy Heylen, Steven Demuynck, Katia Devriendt
المصدر: 2020 IEEE International Electron Devices Meeting (IEDM).
مصطلحات موضوعية: Materials science, business.industry, Annealing (metallurgy), chemistry.chemical_element, Dielectric, Electromigration, law.invention, Fin (extended surface), chemistry, law, Optoelectronics, Node (circuits), business, Tin, Spark plug, Scaling
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::59e54b6d81ba91648fb02f7a002b2fd9
https://doi.org/10.1109/iedm13553.2020.9371970 -
4
المؤلفون: Hideo Nakashima, Yuichi Yoshida, John S. Petersen, Cong Que Dinh, Balint Meliorisz, Geert Vandenberghe, Philippe Foubert, Kosuke Yoshihara, Kathleen Nafus, Hans-Jürgen Stock, Masaru Tomono, Yuya Kamei, Seiji Nagahara, Michael A. Carcasi, Ryo Shimada, Yoshihiro Kondo, Danilo De Simone, Yukie Minekawa, Peter De Bisschop, Gosuke Shiraishi, Hiroyuki Ide, Serge Biesemans, Kazuhiro Takeshita
المصدر: Advances in Patterning Materials and Processes XXXVI.
مصطلحات موضوعية: Materials science, Resist, Continuous modelling, Extreme ultraviolet lithography, Calibration, Surface finish, Edge (geometry), Image enhancement, Residual, Biological system
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::26776e5b3630c27003585fd3828bf3be
https://doi.org/10.1117/12.2515187 -
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المؤلفون: Hans-Jürgen Stock, Yuya Kamei, Serge Biesemans, Yoshihiro Kondo, Hiroyuki Ide, Ryo Shimada, Yukie Minekawa, Philippe Foubert, Kazuhiro Takeshita, Kosuke Yoshihara, Kathleen Nafus, Geert Vandenberghe, Michael A. Carcasi, Yuichi Yoshida, Peter De Bisschop, Masaru Tomono, Gousuke Shiraishi, Seiji Nagahara, John S. Petersen, Balint Meliorisz, Danilo De Simone, Teruhiko Moriya, Cong Que Dinh
المصدر: Extreme Ultraviolet (EUV) Lithography X.
مصطلحات موضوعية: Resist, Computer science, Extreme ultraviolet lithography, Stochastic simulation, Mechanical engineering, Model parameters, Surface finish, Lithography process
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ab3e0be5e2bcdf438557b4eafbf7d425
https://doi.org/10.1117/12.2515183 -
6
المؤلفون: Akihiro Oshima, Seiichi Tagawa, Hiroyuki Ide, Serge Biesemans, Kosuke Yoshihara, Yoshitaka Konishi, Danilo De Simone, Masafumi Hori, Teruhiko Moriya, Hayakawa Makoto, Hans-Jürgen Stock, Yuya Kamei, Kathleen Nafus, Ryo Aizawa, Ken Maruyama, Takahiro Shiozawa, Yoshihiro Kondo, Motoyuki Shima, Kazuhiro Takeshita, Michael A. Carcasi, Masashi Enomoto, Toru Kimura, Yukie Minekawa, Tomoki Nagai, Gosuke Shiraishi, Hideo Nakashima, Masayuki Miyake, Hisashi Nakagawa, Geert Vandenberghe, Keisuke Yoshida, Masaru Tomono, John S. Petersen, Balint Meliorisz, Takehiko Naruoka, Ryo Shimada, Seiji Nagahara, Satoshi Dei, Foubert Philippe
المصدر: Advances in Patterning Materials and Processes XXXV.
مصطلحات موضوعية: 010302 applied physics, Materials science, Contrast enhancement, business.industry, Extreme ultraviolet lithography, 02 engineering and technology, Surface finish, 021001 nanoscience & nanotechnology, 01 natural sciences, medicine.anatomical_structure, Resist, 0103 physical sciences, medicine, Optoelectronics, Process optimization, 0210 nano-technology, business, Sensitization, Line (formation)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::824dfca6e19a82aae0a388d175fc1216
https://doi.org/10.1117/12.2297498 -
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المؤلفون: Hideo Nakashima, Geert Vandenberghe, Masafumi Hori, Gosuke Shiraishi, Michael A. Carcasi, Masayuki Miyake, Seiji Nagahara, Hiroyuki Ide, Yuya Kamei, Satoshi Dei, Hisashi Nakagawa, Yukie Minekawa, Kosuke Yoshihara, Kathleen Nafus, Yoshihiro Kondo, Tomoki Nagai, Masaru Tomono, Motoyuki Shima, Philippe Foubert, Kazuhiro Takeshita, Ryo Shimada, John S. Petersen, Serge Biesemans, Takehiko Naruoka, Ken Maruyama, Danilo De Simone, Teruhiko Moriya, Akihiro Oshima, Seiichi Tagawa
المصدر: Extreme Ultraviolet (EUV) Lithography IX.
مصطلحات موضوعية: Fabrication, Semiconductor, Resist, business.industry, Scientific method, Extreme ultraviolet lithography, Optoelectronics, Sensitivity (control systems), Absorption (electromagnetic radiation), business, Exposure latitude
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3ab6015c9a8ddc7415432bf2b276d2b0
https://doi.org/10.1117/12.2297370 -
8
المؤلفون: Gian Lorusso, Kathleen Nafus, Serge Biesemans, Greg Rechtsteiner, Will Conley, Paolo Alagna
المصدر: Optical Microlithography XXXI.
مصطلحات موضوعية: Speckle pattern, Materials science, business.industry, Bandwidth (signal processing), Multiple patterning, Application specific, Optoelectronics, Surface finish, business, Exposure latitude, Lithography, Coherence length
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::275be0b153c95d17705ff0ab47cf33c9
https://doi.org/10.1117/12.2300511 -
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المؤلفون: Paolo Alagna, Greg Rechtsteiner, Serge Biesemans, Kathleen Nafus, Will Conley
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, 02 engineering and technology, Grating, 021001 nanoscience & nanotechnology, 01 natural sciences, 010309 optics, Optics, 0103 physical sciences, Multiple patterning, Bandwidth (computing), Optoelectronics, Wafer, 0210 nano-technology, business, Lithography, Next-generation lithography, Immersion lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::91745204a69ea292d775f8039edc21f4
https://doi.org/10.1117/12.2263228 -
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المؤلفون: Satoru Shimura, Kathleen Nafus, Serge Biesemans, Shinji Kobayashi, Carlos Fonseca, Soichiro Okada, Masashi Enomoto
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Noise, Computer science, Process (computing), Wafer, Enhanced Data Rates for GSM Evolution, Function (mathematics), Algorithm, Simulation, Block (data storage)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f3d8341109d3d1f27589f78f99353221
https://doi.org/10.1117/12.2257868