المؤلفون: Okandan, M., Wessendorf, K., Christenson, T., Lemp, T., Shul, R., Baker, M., James, C., Myers, R., Stein, D.

المصدر: TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664) Solid-state sensors, actuators and microsystems TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003. 2:1643-1646 vol.2 2003

Relation: IEEE International Solid-State Sensors and Actuators Conference

المؤلفون: Herrera, G. V., Bauer, Todd, Blain, M. G., Dodd, P. E., Dondero, R., Garcia, E. J., Galambos, P. C., Hetherington, D. L., Hudgens, J. J., McCormick, F. B., Nielson, G. N., Nordquist, C. D., Okandan, M., Olsson, R. H., Ortiz, K., Platzbecker, M. R., Resnick, P.J., Shul, R. J., Shaw, M. J., Sullivan, C. T., Watts, M. R.

المصدر: 2008 IEEE International SOI Conference SOI Conference, 2008. SOI. IEEE International. :5-8 Oct, 2008

Relation: 2008 IEEE International SOI Conference

المؤلفون: Spahn, O.B., Tigges, C., Shul, R., Rodgers, S., Polosky, M.

المصدر: 2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399) Optical MEMS Optical MEMS, 2000 IEEE/LEOS International Conference on. :51-52 2000

Relation: 2000 IEEE/LEOS International Conference on Optical MEMS

المؤلفون: Shul, R. J.^Aff3, Fleming, J. G.^Aff3

المساهمون: Shul, Randy J., editor^Aff1, Pearton, Stephen J., editor^Aff2

المصدر: Handbook of Advanced Plasma Processing Techniques. :419-458

المؤلفون: Kabanov, Yu. P., Gornakov, V. S.^Aff1, Nikitenko, V. I.^{Aff1, Aff2}, Shul, R. D.

المصدر: Journal of Experimental and Theoretical Physics. 118(5):747-759

المؤلفون: Zhang, L., Lester, L. F., Baca, A. G., Shul, R. J., Chang, P. C., Willison, C. G., Mishra, U. K., Denbaars, S. P., Zolper, J. C.

المصدر: MRS Internet Journal of Nitride Semiconductor Research. 5(Suppl 1):376-383

المؤلفون: Dang, G., Cao, X. A., Ren, F., Pearton, S. J., Han, J., Baca, A. G., Shul, R. J., Wilson, R. G.

المصدر: MRS Internet Journal of Nitride Semiconductor Research. 5(Suppl 1):845-851

المؤلفون: Hahn, Y. B., Hays, D. C., Cho, H., Jung, K. B., Lambers, E. S., Abernathy, C. R., Pearton, S. J., Hobson, W. S., Shul, R. J.

المصدر: Plasma Chemistry and Plasma Processing. September 2000 20(3):405-415

المؤلفون: Hahn, Y. B., Hays, D. C., Cho, H., Jung, K. B., Lambers, E. S., Abernathy, C. R., Pearton, S. J., Hobson, W. S., Shul, R. J.

المصدر: Plasma Chemistry and Plasma Processing. September 2000 20(3):417-427

المؤلفون: Cao, X. A., Zhang, A. P., Dang, G. T., Ren, F., Pearton, S. J., van Hove, J. M., Hickman, R. A., Shul, R. J., Zhang, L.

المصدر: Journal of Electronic Materials. March 2000 29(3):256-261