-
1
المؤلفون: Steven Consiglio, Qingyun Yang, K. Tapily, Saraf Iqbal Rashid, Muthumanickam Sankarapandian, Paul C. Jamison, Tsunomura Takaaki, C. Catano, Robert D. Clark, T. Ando, R. Pujari, Vijay Narayanan, Hisashi Higuchi, Gerrit J. Leusink, Malte J. Rasch, R. Soave, Hongwen Yan, Ernest Y. Wu, Dexin Kong, Aelan Mosden, Peter Biolsi, Youngseok Kim, Robert R. Robison, O. van der Straten, D. Koty, S. McDermott, Soon-Cheon Seo, Hiroyuki Miyazoe, Son Nguyen, A. Gasasira, Nicole Saulnier, Wilfried Haensch, Sebastian Engelmann, C. S. Wajda, Ramachandran Muralidhar, S. DeVries
المصدر: IEEE Electron Device Letters. 42:759-762
مصطلحات موضوعية: 010302 applied physics, Physics, business.industry, Deep learning, Process (computing), Topology, 01 natural sciences, Omega, Electronic, Optical and Magnetic Materials, Resistive random-access memory, Stack (abstract data type), 0103 physical sciences, Scalability, Process optimization, Artificial intelligence, Electrical and Electronic Engineering, business, Voltage
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fe9d72aa9eb14d75aff72c197a0ef723
https://doi.org/10.1109/led.2021.3066181
-
2
المؤلفون: Ishtiaq Ahsan, Arthur Gasasira, Vijay Narayanan, Soon-Cheon Seo, Xuefeng Liu, Veenadhar Katragadda, Takashi Ando, Nicole Saulnier, Youngseok Kim, Ruturaj Pujari, Dexin Kong, Sean Teehan
المصدر: 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
مصطلحات موضوعية: Development environment, Resistive touchscreen, Learning cycle, Computer science, business.industry, Deep learning, 02 engineering and technology, Test method, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, 0104 chemical sciences, Resistive random-access memory, Scalability, Electronic engineering, Artificial intelligence, 0210 nano-technology, business, Voltage
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8d6b6e5e454cc3929b87f5dd640f81c5
https://doi.org/10.1109/asmc51741.2021.9435708 -
3
المؤلفون: Kangguo Cheng, Soon-Cheon Seo, James Chingwei Li, Ishtiaq Ahsan, A. J. Varghese, Dexin Kong, Nicole Saulnier, Vijay Narayanan, T. Ando, Robert R. Robison, Ramachandran Muralidhar, C. Robinson, Youngseok Kim
المصدر: International Symposium for Testing and Failure Analysis.
مصطلحات موضوعية: Materials science, Field cycling, business.industry, Electrode, Optoelectronics, Resistive switching memory, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2f458bbc115e136245ffda8be1bb98d2
https://doi.org/10.31399/asm.cp.istfa2020p0053 -
4
المؤلفون: Vijay Narayanan, Dexin Kong, Saraf Iqbal Rashid, Youngseok Kim, Takashi Ando, Soon-Cheon Seo, Sergey Voronin, Nicole Saulnier, Shyam Sridhar, Catano Christopher
المصدر: Advanced Etch Technology for Nanopatterning IX.
مصطلحات موضوعية: business.industry, Computer science, Analog computer, Electrical engineering, Resistive random-access memory, law.invention, Etching (microfabrication), law, Resistive switching, Scalability, Metal electrodes, business, Efficient energy use, Voltage
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::08722711744b9c00c32fb3cde3f757dc
https://doi.org/10.1117/12.2552035 -
5
المؤلفون: Hisashi Higuchi, Soon-Cheon Seo, Eduard A. Cartier, Kandabara Tapily, Takashi Ando, Dexin Kong, Robert D. Clark, Robert Soave, Steven Consiglio, Gert J. Leusink, Youngseok Kim, Cory Wajda, Tsunomura Takaaki, Paul C. Jamison, Vijay Narayanan, Marinus Hopstaken
المصدر: ECS Meeting Abstracts. :994-994
مصطلحات موضوعية: Atomic layer deposition, Materials science, business.industry, Deposition (phase transition), Optoelectronics, Wafer, Plasma, Performance improvement, business, Layer (electronics), Voltage, Resistive random-access memory
-
6
المؤلفون: John H. Zhang, Xie Ruilong, C. Labelle, Charan V. V. S. Surisetty, Pietro Montanini, Soon-Cheon Seo, Stan D. Tsai, Andrew M. Greene, Haigou Huang, Qiang Fang, Donald F. Canaperi, Wei-Tsu Tseng, Dinesh Koli, Walter Kleemeier, Dechao Guo, Jean E. Wynne, Matthew Malley, Raghuveer R. Patlolla
المصدر: MRS Advances. 2:2361-2372
مصطلحات موضوعية: Materials science, business.industry, 020209 energy, Mechanical Engineering, 02 engineering and technology, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Reduction (complexity), Mechanics of Materials, 0202 electrical engineering, electronic engineering, information engineering, General Materials Science, Chemical attack, Node (circuits), 0210 nano-technology, Process engineering, business
-
7
المؤلفون: Chi-Chun Liu, Frougier Julien, Aron Cepler, Matthew Sendelbach, Nicolas Loubet, Dexin Kong, Daniel Schmidt, Gangadhara Raja Muthinti, Soon-Cheon Seo, Mary Breton, Veeraraghavan S. Basker, Pietro Montanini, Gilad Barak, Robinhsinkuo Chao, Itzik Kaplan, Susan Ng-Emans, John G. Gaudiello
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII.
مصطلحات موضوعية: Materials science, business.industry, Machine learning, computer.software_genre, Characterization (materials science), Metrology, Calibration, Wafer, Process window, Field-effect transistor, Artificial intelligence, business, computer, Scaling, Critical dimension
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b6cb854098e9ca2522cd164324bfc146
https://doi.org/10.1117/12.2297377 -
8
المؤلفون: Oleg Gluschenkov, Zuoguang Liu, Chengyu Niu, Andreas Knorr, Tenko Yamashita, Jay W. Strane, Mukesh Khare, Gen Tsutsui, Chris M. Prindle, Abraham Arceo, Indira Seshadri, Bruce Miao, A. Petrescu, Stan D. Tsai, Curtis Durfee, Soon-Cheon Seo, Adra Carr, Jie Yang, Walter Kleemeier, Kisik Choi, F. Lie, W. Wang, Rama Divakaruni, Chanro Park, Mark Raymond, Heng Wu, Huiming Bu, Dechao Guo, Anuja DeSilva, George Yang, Dinesh Gupta, Muthumanickam Sankarapandian, Praneet Adusumilli, Sam Choi, Kerem Akarvardar
المصدر: 2017 IEEE International Electron Devices Meeting (IEDM).
مصطلحات موضوعية: 010302 applied physics, Very-large-scale integration, Materials science, business.industry, Doping, Phase (waves), 02 engineering and technology, Ring oscillator, 021001 nanoscience & nanotechnology, Epitaxy, 01 natural sciences, Reduction (complexity), CMOS, Electrical resistivity and conductivity, 0103 physical sciences, Optoelectronics, 0210 nano-technology, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fafc4c9a45bd4b7e938db8bc086dead4
https://doi.org/10.1109/iedm.2017.8268440 -
9
المؤلفون: Nelson Felix, Spyridon Skordas, Rohit Galatage, Junli Wang, Dinesh Gupta, Xin Miao, Deok-Hyung Lee, R. Divakaruni, John C. Arnold, Vamsi Paruchuri, Ohyun Kwon, Adra Carr, Seng Luan Lee, Soon-Cheon Seo, T. Gow, James Chingwei Li, Muthumanickam Sankarapandian, Y. Xu, Zuoguang Liu, D. Corliss, Stuart A. Sieg, Robert C. Wong, Chun Wing Yeung, Albert M. Young, Jingyun Zhang, Jeffrey C. Shearer, Huiming Bu, C. Labelle, Zhenxing Bi, Bassem Hamieh, M. Guillom, Andreas Knorr, Tenko Yamashita, Jae-Yoon Yoo, D. Brown, Peng Xu, Robin Chao, Dexin Kong, Terence B. Hook, P. Oldiges, T. Wu, Shogo Mochizuki, Young-Kwan Park, W. Xu, Raja Muthinti, S. Lian, Ruqiang Bao, S. Kanakasabapathy, Myung-Hee Na, Richard A. Conti, Frougier Julien, Robert R. Robison, Nicolas Loubet, Yann Mignot, Theodorus E. Standaert, Hemanth Jagannathan, Ho Ju Song, Pietro Montanini, Myounggon Kang, John G. Gaudiello, Mukesh Khare, Abraham Arceo, Su Chen Fan, Andrew M. Greene
المصدر: 2017 Symposium on VLSI Technology.
مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Extreme ultraviolet lithography, Transistor, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, Electrostatics, 01 natural sciences, law.invention, law, Logic gate, 0103 physical sciences, Stiction, Optoelectronics, Work function, 0210 nano-technology, business, Nanosheet, Leakage (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8172c77d8489643bbaac20dc37532850
https://doi.org/10.23919/vlsit.2017.7998183 -
10
المؤلفون: Junli Wang, Matthew E. Colburn, Nelson Felix, Andreas Knorr, Tenko Yamashita, Charan V. V. S. Surisetty, Peter Zeitzoff, Dinesh Gupta, Y. Xu, Su Chen Fan, D. Park, Xin Miao, R. Divakaruni, Scott C. Johnson, Hiroaki Niimi, S. Lian, Balasubramanian S. Pranatharthi Haran, Andre Labonte, Eric R. Miller, Richard A. Conti, Shogo Mochizuki, Zhenxing Bi, M. Mottura, Bhagawan Sahu, Chengyu Niu, Donald F. Canaperi, John R. Sporre, James J. Demarest, Spyridon Skordas, Vamsi Paruchuri, Praneet Adusumilli, Seng Luan Lee, Lars W. Liebmann, Christopher Prindle, Walter Kleemeier, Oleg Gluschenkov, Peng Xu, Hemanth Jagannathan, Pietro Montanini, Rohit Galatage, Jody A. Fronheiser, Ruilong Xie, P. Oldiges, Neeraj Tripathi, Abraham Arceo, F. Lie, Robin Chao, Zuoguang Liu, D. Corliss, Stuart A. Sieg, Vimal Kamineni, Lee Choonghyun, Jeffrey C. Shearer, C. Labelle, J. Zhang, S. Kanakasabapathy, Stan D. Tsai, James Chingwei Li, Soon-Cheon Seo, H. Chen, H. P. Amanapu, Min Gyu Sung, Mark Raymond, Huiming Bu, Andrew M. Greene, Kisup Chung, Kerem Akarvardar, Sanjay Mehta, Richard G. Southwick, Chanro Park, C.-C. Yeh, John C. Arnold, K. Cheon, Myung-Hee Na, Mukesh Khare, Jungho Cha, Shariq Siddiqui, S. Whang, Lei Sun, Theodorus E. Standaert, Derren N. Dunn, Bassem Hamieh, T. Gow, Ki-chul Kim, Nicolas Loubet, Muthumanickam Sankarapandian, Terence B. Hook
المصدر: 2016 IEEE International Electron Devices Meeting (IEDM).
مصطلحات موضوعية: 010302 applied physics, Very-large-scale integration, Materials science, Silicon, business.industry, Extreme ultraviolet lithography, chemistry.chemical_element, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, law.invention, chemistry, law, Logic gate, 0103 physical sciences, Multiple patterning, Optoelectronics, Photolithography, 0210 nano-technology, business, Lithography, Next-generation lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::75a8807331b86a9948840b3fa0fbe3d5
https://doi.org/10.1109/iedm.2016.7838334
Find this article in full text from Springer Verlag.