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1
المؤلفون: Dennis Rodier, Kurt Decker-Lucke, Stan Todorov, Hugh Park, Benjamin Colombeau
المصدر: Electrochemical and Solid-State Letters. 15:H31-H33
مصطلحات موضوعية: Threshold dose, Materials science, business.industry, General Chemical Engineering, Electrochemistry, Optoelectronics, General Materials Science, Nanotechnology, Halo, Electrical and Electronic Engineering, Physical and Theoretical Chemistry, business
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2
المؤلفون: J.C. Olson, Alex Eidukonis, Stan Todorov, Dennis Rodier, Frank Sinclair, Thirumal Thanigaivelan
المصدر: 2014 20th International Conference on Ion Implantation Technology (IIT).
مصطلحات موضوعية: Materials science, Ion implantation, Semiconductor technology, business.industry, Electrical engineering, Beam shape, Current (fluid), business, Beam (structure)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a76eb7d71c010e3defc5164cee14c2bf
https://doi.org/10.1109/iit.2014.6940037 -
3
المؤلفون: B.N. Guo, Kyu-Ha Shim, Stan Todorov, Sinclair Frank, T. Toh, Todd Henry, Hans-Joachim L. Gossmann, B. Colombeau
المصدر: AIP Conference Proceedings.
مصطلحات موضوعية: Materials science, Silicon, business.industry, Doping, chemistry.chemical_element, Semiconductor device, Channelling, Ion, Crystallography, Optics, Ion implantation, chemistry, Wafer, business, Sheet resistance
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4
المؤلفون: B.N. Guo, Dimitry Kouzminov, Niranjan Khasgiwale, Kurt Decker-Lucke, Stan Todorov, B. Colombeau, Hugh Park, Dennis Rodier, Wei Zou
المصدر: AIP Conference Proceedings.
مصطلحات موضوعية: Materials science, Silicon, Annealing (metallurgy), business.industry, Analytical chemistry, chemistry.chemical_element, Germanium, Nanotechnology, Amorphous solid, Ion implantation, Semiconductor, chemistry, Boron, business, Indium
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5
المؤلفون: Stan Todorov, U. Jeong, T. Robertson, A. Bertuch, N. Variam, E. Evans
المصدر: 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432).
مصطلحات موضوعية: Materials science, Ion implantation, Optics, Constraint theory, Ion beam, business.industry, Goniometer, Batch processing, Analytical chemistry, Wafer, High current, business, Beam (structure)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fba1f5d351dcf808120c29d876173081
https://doi.org/10.1109/iit.2000.924237 -
6
المؤلفون: W. Piscitello, Stan Todorov, R. Eddy, T. Robertson, A. Bertuch
المصدر: 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432).
مصطلحات موضوعية: Materials science, Silicon, business.industry, Doping, Analytical chemistry, chemistry.chemical_element, Secondary ion mass spectrometry, Ion implantation, chemistry, Optoelectronics, Process control, Wafer, business, Sheet resistance, Beam (structure)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::863f937796cae115f823842a85ceac13
https://doi.org/10.1109/iit.2000.924253 -
7مؤتمر
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