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1
المؤلفون: Syed Naime Mohammad, Chao-Jen Tsou, Afu Chiu, Norman Birnstein, Erick deGouw, Clemens Utzny, Philip Groeger, Stefan Buhl, W.H. Wang, C.H. Huang, Elvis Yang, T.H. Yang, K.C. Chen
المصدر: Optical and EUV Nanolithography XXXVI.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::401cc17af057eb44afb5d446ceb88ba9
https://doi.org/10.1117/12.2657965 -
2
المؤلفون: Syed Naime Mohammad, Sven Boese, Philip Groeger, Holger Bald, Alberto Lopez-Gomez, Clemens Utzny, Stefan Buhl
المصدر: Optical and EUV Nanolithography XXXVI.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b9fd96c48c1c28ef88238a20b6d8f574
https://doi.org/10.1117/12.2657970 -
3
المؤلفون: Hyosung Lee, Seonho Lee, Hyungju Rah, Iksun Park, Jaeil Lee, Jaewoong Sohn, Yongchan Kim, Christoph Ehrlich, Philip Groeger, Sven Boese, Enrico Bellmann, Stefan Buhl, Seop Kim, Kang-san Lee
المصدر: Metrology, Inspection, and Process Control XXXVII.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3cd86afdf947eb61481e0e5a98b08a15
https://doi.org/10.1117/12.2657679 -
4
المؤلفون: Philip Groeger, Ulrich Denker, Robin Zech, Stefan Buhl, Matthias Ruhm, Mingyu Kim, Hongseok Jang, Chunsoo Kang, DongYoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee, Chanha Park, DongSub Choi, Jeonghoon Lee
المصدر: Metrology, Inspection, and Process Control XXXVI.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9448f397f1a5148d5ab98e8292243c56
https://doi.org/10.1117/12.2607571 -
5
المؤلفون: Ulrich Denker, Philip Groeger, Xaver Thrun, Stefan Buhl, Mycahya Eggleston, Nhi Doan, Gou Kawaguchi, Ranjan Khurana
المصدر: Metrology, Inspection, and Process Control XXXVI.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1fd38019fd4df684159744cac2c22e52
https://doi.org/10.1117/12.2613709 -
6
المؤلفون: Martin Freitag, En Chuan Lio, Hsiao Lin Hsu, Bill Lin, Rex H. Liu, Stefan Buhl, Tang Chun Weng, Patrick Lomtscher, Jia Hung Chang, Junjin Lin
المصدر: Optical Microlithography XXXIV.
مصطلحات موضوعية: Semiconductor device fabrication, Computer science, business.industry, Process (computing), ComputerApplications_COMPUTERSINOTHERSYSTEMS, Hardware_PERFORMANCEANDRELIABILITY, Overlay, Planar, Distortion, Hardware_INTEGRATEDCIRCUITS, Key (cryptography), Wafer, business, Lithography, Computer hardware
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5c838c878bf1cc9ce86db521eec61812
https://doi.org/10.1117/12.2583620 -
7
المؤلفون: Philip Groeger, Ranjan Khurana, Aayush Mitra, Mycahya Eggleston, Stefan Buhl, Wan-Soo Kim, Xaver Thrun
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
مصطلحات موضوعية: Reduction (complexity), Computer science, Robustness (computer science), Process (computing), Process control, Process window, Process optimization, Dram, Reliability engineering, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e83a66bd15d3f8505c25014ee3f8f13f
https://doi.org/10.1117/12.2583928 -
8
المؤلفون: Stefan Buhl, Patrick Lomtscher, Holger Bald, Boris Habets, Tobias Hoeer, Wan-Soo Kim
المصدر: Optical Microlithography XXXIII.
مصطلحات موضوعية: Polynomial, Computer science, Sampling (statistics), Wafer, Overlay, Edge (geometry), Lithography, Algorithm, Field (computer science), Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2c8ea14aefe263da8b329caf6add6b1d
https://doi.org/10.1117/12.2552714 -
9
المؤلفون: Stefan Buhl, Chanha Park, Steffen Guhlemann, Hongoo Lee, Seop Kim, MinGyu Kim, Ahlin Choi, Philip Groeger, Dongyoung Lee, Wan-Soo Kim
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII.
مصطلحات موضوعية: Set (abstract data type), Computer science, Fingerprint (computing), Value (computer science), Limit (mathematics), Focus (optics), Representation (mathematics), Algorithm, Throughput (business), Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0e6e91c70bac832651b3d4f5139d56b7
https://doi.org/10.1117/12.2514975 -
10
المؤلفون: David Daniel, Steven Tottewitz, Corey Mellegaard, Stefan Buhl, Boris Habets, Xaver Thrun, Marshall Overcast, Steffen Guhlemann, Georg Erley
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII.
مصطلحات موضوعية: Computer science, business.industry, Control (management), Process (computing), Context (language use), Overlay, Artificial intelligence, Machine learning, computer.software_genre, business, Lithography, computer
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e21bbab4a31405aca30b237901e60b06
https://doi.org/10.1117/12.2303487