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المؤلفون: Cong Que Dinh, Seiji Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Soichiro Okada, Seiji Fujimoto, Shinichiro Kawakami, Satoru Shimura, Makoto Muramatsu, Kayoko Cho, Xiang Liu, Kathleen Nafus, Michael A. Carcasi, Ankur Agarwal, Mark H. Somervell, Lior Huli, Kanzo Kato, Michael Kocsis, Peter De Schepper, Stephen T. Meyers, Lauren McQuade, Kazuki Kasahara, Jara Garcia Santaclara, Rik Hoefnagels, Chris Anderson, Patrick Naulleau
المصدر: Advances in Patterning Materials and Processes XL.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::26d02b85b13ca6ca4e771ca40caaaa86
https://doi.org/10.1117/12.2655928 -
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المؤلفون: Peter De Schepper, Stephen T. Meyers, Alan J. Telecky, Amrit K. Narasimhan, Benjamin L. Clark, Andrew Grenville, Philippe Foubert, Shu Hao Chang, Jan Doise, Geert Vandenberghe, Yannick Feurprier, Poulomi Das, Danilo De Simone, Michael Kocsis, Christophe Beral, Jason K. Stowers, Onitsuka Tomoya
المصدر: Extreme Ultraviolet (EUV) Lithography XII.
مصطلحات موضوعية: chemistry.chemical_compound, Resist, chemistry, Computer science, Extreme ultraviolet lithography, Oxide, Nanotechnology, Process design, MOX fuel
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fb12a253b39e85382606c9a252e2079d
https://doi.org/10.1117/12.2584769 -
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المؤلفون: Harold Stokes, Brian Cardineau, Jason K. Stowers, Chang Shu-Hao, Stephen T. Meyers, Michael Kocsis, Moeen Ghafoor, Masahiko Harumoto, Pieter Vanelderen, Saika Muntaha Bari
المصدر: Extreme Ultraviolet (EUV) Lithography XI.
مصطلحات موضوعية: Stack (abstract data type), Computer science, Cleanroom, Extreme ultraviolet lithography, Process (computing), Process changes, Engineering physics
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::aebe27eb547b8169761eb6ebd424cc86
https://doi.org/10.1117/12.2552918 -
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المؤلفون: Peter De Schepper, Lawrence S. Melvin, Joren Severi, Amrit K. Narasimhan, Danilo De Simone, Craig D. Needham, Ulrich Welling, Stephen T. Meyers, Joren Wouters
المصدر: Extreme Ultraviolet (EUV) Lithography XI.
مصطلحات موضوعية: Materials science, Resist, business.industry, Computational lithography, Extreme ultraviolet lithography, Optoelectronics, Context (language use), Process optimization, Photoresist, business, Lithography, MOX fuel
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fa21e87a00d8ca7c1ec3ddf0e56dcae1
https://doi.org/10.1117/12.2552151 -
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المؤلفون: Stephen T. Meyers, Jason K. Stowers, Michael Greer, Andrew Grenville, Craig D. Needham, Peter De Schepper, Michael Kocsis
المصدر: Extreme Ultraviolet (EUV) Lithography IX.
مصطلحات موضوعية: Scanner, Materials science, Optics, Resist, business.industry, Extreme ultraviolet lithography, Pillar, Surface finish, business, MOX fuel, Lithography, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3f1c2490221efa2de196c98e7e3a4597
https://doi.org/10.1117/12.2299968 -
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المصدر: Chemistry of Materials. 25:210-214
مصطلحات موضوعية: Diffraction, Materials science, Aqueous solution, Annealing (metallurgy), General Chemical Engineering, Nanotechnology, General Chemistry, Dielectric, law.invention, Titanium oxide, Chemical engineering, law, Transmission electron microscopy, Materials Chemistry, Crystallization, Thin film
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المؤلفون: Kai Jiang, Benjamin L. Clark, Werner Gillijns, Edson Joseph B, Michael Greer, Peter De Schepper, Danilo De Simone, Stephen T. Meyers, Michael Kocsis, Jeremy T. Anderson, Geert Vandenberghe, Andrew Grenville, Alan J. Telecky, Brian Cardineau, Jason K. Stowers
المصدر: SPIE Proceedings.
مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Extreme ultraviolet lithography, Shot noise, Oxide, 02 engineering and technology, Photoresist, 021001 nanoscience & nanotechnology, 01 natural sciences, chemistry.chemical_compound, Optics, Resist, chemistry, 0103 physical sciences, Node (circuits), 0210 nano-technology, business, Electron-beam lithography, Block (data storage)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::248a2a8fdc82db1edcbe8b0d707f5a52
https://doi.org/10.1117/12.2219527 -
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المؤلفون: Peter De Schepper, Jason K. Stowers, Fumiko Yamashita, Geert Vandenberghe, Andrew Grenville, Danilo De Simone, Stephen T. Meyers, Vinh Luong, Benjamin L. Clark, Frederic Lazzarino, Michael Kocsis, Doni Parnell, Ming Mao
المصدر: Extreme Ultraviolet (EUV) Lithography VII.
مصطلحات موضوعية: Materials science, Extreme ultraviolet lithography, Oxide, Nanotechnology, 02 engineering and technology, Photoresist, 021001 nanoscience & nanotechnology, 01 natural sciences, law.invention, 010309 optics, Back end of line, chemistry.chemical_compound, Resist, chemistry, law, 0103 physical sciences, X-ray lithography, Photolithography, 0210 nano-technology, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7b64ec91a9dccc9328858ce4c82dcbc0
https://doi.org/10.1117/12.2220051 -
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المؤلفون: Stephen T. Meyers, Douglas A. Keszler, Dirk N. Weiss
المصدر: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 28:823-828
مصطلحات موضوعية: Materials science, Annealing (metallurgy), Process Chemistry and Technology, Soft lithography, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Amorphous solid, chemistry.chemical_compound, Nanolithography, Resist, chemistry, Thermal, Materials Chemistry, Tetrafluoroethylene, Electrical and Electronic Engineering, Composite material, Instrumentation, Shrinkage
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المؤلفون: Jeremy T. Anderson, John F. Wager, Douglas A. Keszler, John F. Thompson, Celia M. Hung, Stephen T. Meyers
المصدر: Journal of the American Chemical Society. 130:17603-17609
مصطلحات موضوعية: Fabrication, Aqueous solution, Precipitation (chemistry), Chemistry, business.industry, Nanotechnology, General Chemistry, Dielectric, Biochemistry, Catalysis, Colloid and Surface Chemistry, Semiconductor, Chemical engineering, Crystallite, business, Dissolution, Wurtzite crystal structure