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المؤلفون: Scott Jessen, James Walter Blatchford, Steven L. Prins, Ki-Ho Baik, Linyong Pang, Bob Gleason, Thuc Dam
المصدر: ECS Transactions. 27:449-454
مصطلحات موضوعية: Set (abstract data type), Scheme (programming language), Computer science, Hardware_INTEGRATEDCIRCUITS, Wafer, Node (circuits), Function (mathematics), Topology, computer, Scaling, computer.programming_language
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المؤلفون: Xin Wang, James J. Chambers, Deborah J. Riley, Steven L. Prins, Wei Ze Xiong, Brian K. Kirkpatrick
المصدر: Solid State Phenomena. :245-248
مصطلحات موضوعية: Materials science, CMOS, Semiconductor technology, Process control, New materials, General Materials Science, Nanotechnology, Node (circuits), Condensed Matter Physics, Metal gate, Engineering physics, Atomic and Molecular Physics, and Optics
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::90d94fd42cc7a7a75f5d05e1523ddeaa
https://doi.org/10.4028/www.scientific.net/ssp.145-146.245 -
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المؤلفون: Qi-Zhong Hong, Oluwamuyiwa Oluwagbemiga Olubuyide, James Walter Blatchford, Li Lin, Ricardo Borges, Steven L. Prins, T. S. Kim, Deborah J. Riley, Simon Chang
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Standard cell, Resolution enhancement technologies, Computer science, business.industry, Transistor, Process (computing), Context (language use), law.invention, Variable (computer science), Optics, Strain engineering, law, Logic gate, Electronic engineering, Cmos process, business, Lithography, Scaling
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cb495412ea5ac987bfae30e49a5e1d31
https://doi.org/10.1117/12.814947 -
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المؤلفون: Shaofeng Yu, Brian K. Kirkpatrick, O'brien Corey Rollin, Larry Liu, Rajesh Khamankar, Oluwamuyiwa Oluwagbemiga Olubuyide, Deborah J. Riley, Anand T. Krishnan, I. Fujii, C. Machala, Clinton L. Montgomery, Brian Hornung, H. Bu, Yiming Gu, Steven L. Prins, T. Lowry, K. Kirmse, James Walter Blatchford, Tad Grider, C. Bowen, G. Shinn, D. Corum, C. Lin, Tony Tae-Hyoung Kim
المصدر: 2008 Symposium on VLSI Technology.
مصطلحات موضوعية: Surface-mount technology, Materials science, business.industry, Silicon-germanium, PMOS logic, chemistry.chemical_compound, chemistry, Logic gate, Electronic engineering, Optoelectronics, System on a chip, Process optimization, Static random-access memory, business, NMOS logic
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e24ec331746ae0843044248c5da8aaa5
https://doi.org/10.1109/vlsit.2008.4588608 -
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المؤلفون: Steven L. Prins, Alan C. Barron, William C. Herrmann, John R. McNeil
المصدر: Applied optics. 43(3)
مصطلحات موضوعية: Materials Science (miscellaneous), Business and International Management, Industrial and Manufacturing Engineering
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::acc6301dc906500efea1acbb10d77756
https://pubmed.ncbi.nlm.nih.gov/14765924 -
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المؤلفون: Alan C. Barron, William C. Herrmann, Steven L. Prins, J. R. McNeil
المصدر: Applied optics. 43(3)
مصطلحات موضوعية: Materials science, business.industry, Materials Science (miscellaneous), Industrial and Manufacturing Engineering, Wavelength, Optics, Band-pass filter, Filter (video), Sputtering, Distortion, Wavelength-division multiplexing, Business and International Management, Optical filter, business, Passband
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4e829950ab39cb266a05784d158ac9aa
https://pubmed.ncbi.nlm.nih.gov/14765923 -
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المؤلفون: Steven L. Prins, Christopher J. Raymond, Michael R. Murnane, S. Sohail H. Naqvi, Jimmy W. Hosch, John R. McNeil
المصدر: Metrology, Inspection, and Process Control for Microlithography X.
مصطلحات موضوعية: Materials science, business.industry, Repeatability, Metrology, law.invention, Micrometre, Laser linewidth, Optics, Resist, law, Microelectronics, Photolithography, business, Diffraction grating
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a6136e6bd81d22dd3e5d2c4354a26fa2
https://doi.org/10.1117/12.240121 -
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المؤلفون: John R. McNeil, Steven L. Prins, Jimmy W. Hosch, S. Sohail H. Naqvi
المصدر: Metrology, Inspection, and Process Control for Microlithography X.
مصطلحات موضوعية: Diffraction, Laser linewidth, Latent image, Optics, Materials science, Resist, business.industry, Grating, business, Diffraction grating, Critical dimension, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0078c14dfee1a326a542ef4b8cc10b16
https://doi.org/10.1117/12.240122 -
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المؤلفون: Steven L. Prins, John R. McNeil, S. Sohail H. Naqvi, Babar K. Minhas
المصدر: Metrology, Inspection, and Process Control for Microlithography X.
مصطلحات موضوعية: Diffraction, Materials science, business.industry, Physics::Optics, Grating, Polarization (waves), Metrology, Micrometre, Laser linewidth, Wavelength, Optics, Optoelectronics, Physics::Atomic Physics, business, Diffraction grating
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f008ce06dd2a1598cd8a328ea5595bad
https://doi.org/10.1117/12.240134 -
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المؤلفون: S. Sohail, John R. McNeil, Steven L. Prins, Christopher J. Raymond, S. Sohail H. Naqvi, Michael R. Murnane
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Diffraction, Materials science, business.industry, engineering.material, Metrology, Laser linewidth, Optics, Coating, Resist, Ellipsometry, engineering, Microelectronics, Wafer, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::208e8aaa8c02b6ae7d7add15e5e27779
https://doi.org/10.1117/12.221213